George D Vakerlis, 713 Elsie St, Malden, MA 02148
George Vakerlis Phones & Addresses
3 Elsie St, Malden, MA 02148 781-3223347
Palm Coast, FL
Medford, MA
Everett, MA
3 Elsie St, Malden, MA 02148 781-8669278
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Professional/Technical
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Graduate or professional degree
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Us Patents
Radio Frequency Plasma Enhanced Chemical Vapor Deposition Process And Reactor
US Patent:
5052339, Oct 1, 1991
Filed:
Oct 16, 1990
Appl. No.:
7/598500
Inventors:
George Vakerlis - Malden MA
Ward D. Halverson - Cambridge MA
Diwakar Garg - Macungie PA
Paul N. Dyer - Allentown PA
Ward D. Halverson - Cambridge MA
Diwakar Garg - Macungie PA
Paul N. Dyer - Allentown PA
Assignee:
Air Products and Chemicals, Inc. - Allentown PA
International Classification:
C23C 1650
US Classification:
118723
Abstract:
An improved capacitively coupled radio frequency-plasma enhanced chemical vapor deposition (PECVD) apparatus and process are disclosed for depositing a uniform coating of material on substrates. The apparatus includes a secondary electrode defining a reaction zone within an outer chamber and an RF electrode in concert with the secondary electrode for generating a plasma within the reaction zone. The electrode comprising a base and a finger extending through the reaction zone for distributing a plasma field uniformly throughout the reaction zone. The process comprises heating a substrate to a deposition temperature in the range of about 300. degree. to 650. degree. C. Reactant gases are introduced into the PECVD reactor and a coating of about 0. 2 to about 20. mu. m is deposited onto the heated substrate.
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