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Joseph T Verdeyen, 92Savoy, IL

Known as:
Jos T Verdeyen Joseph N
Related to:
Kristen Sanks Alexandria G Verdeyen 32

Joseph Verdeyen Phones & Addresses

Savoy, IL   

10200 W Blue Mound Rd APT 630, Milwaukee, WI 53226   

Wauwatosa, WI   

Champaign, IL   

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Joseph Verdeyen resumes & CV records

Resumes

Joseph Verdeyen Photo 13

Professor

Location:
Savoy, IL
Industry:
Higher Education
Work:
University of Illinois at Urbana-Champaign
Professor
Joseph Verdeyen Photo 14

Small Business Sales Manager

Location:
2750 Brady Dr, Bloomfield Hills, MI 48304
Industry:
Transportation/Trucking/Railroad
Work:
Fca Fleet & Business
Small Business Sales Manager Fca Fiat Chrysler Automobiles
Small Business Sales Manager Fca Fleet & Business
Regional Account Executive Penske Truck Leasing Feb 1, 2014 - May 2016
Lease Sales Representative Penske Truck Leasing May 1, 2013 - Feb 1, 2014
Rental Sales Representative Penske Truck Leasing Jan 2012 - Apr 2013
Management Trainee Menards Jan 2009 - Jan 2012
Cabinet and Appliance Department Manager Raynor Garage Doors Aug 2006 - Dec 2009
Sales Manager
Education:
Western Michigan University 2001 - 2005
Bachelors, Bachelor of Business Administration, Human Resources Management
Skills:
Sales, Customer Satisfaction, Customer Service, Negotiation, Cold Calling, Management, New Business Development, Sales Operations, Sales Presentations, Pricing, Sales Management, Team Leadership, B2B, Sales Process, Account Management, Sales Prospecting, Leadership, Prospecting New Accounts, Business Development, Sales Growth and Business Development, Problem Solving, Client Consulting and Solutions, Business To Business Sales

Publications & IP owners

Us Patents

Method, System And Apparatus For An Electrically Assisted Chemical Oxygen Iodine Laser

US Patent:
6501780, Dec 31, 2002
Filed:
Apr 10, 2001
Appl. No.:
09/829835
Inventors:
David L. Carroll - Urbana IL
Wayne S. Solomon - Champaign IL
Joseph T. Verdeyen - Savoy IL
Assignee:
CU Aerospace - Urbana IL
International Classification:
H01S 322
US Classification:
372 55, 372 89, 372 90
Abstract:
A method, apparatus and system are provided herein for an electrically assisted chemical oxygen iodine laser. The preferred system, in accordance with the present invention, includes a laser resonator with a laser-active gas mixture of at least excited oxygen and dissociated iodine. A first electrical generator in which a primary flow of at least excited oxygen is electrically generated from a first gas that includes at least ground state oxygen. A second electrical generator in which a secondary flow of at least dissociated iodine atoms is electrically generated from a second gas that includes at least diatomic iodine. The system further includes a means to inject the secondary flow into the primary flow to generate the laser-active gas mixture.

Electron Density Measurement And Control System Using Plasma-Induced Changes In The Frequency Of A Microwave Oscillator

US Patent:
6573731, Jun 3, 2003
Filed:
Apr 9, 2002
Appl. No.:
10/030947
Inventors:
Joseph T. Verdeyen - Savoy IL
Wayne L. Johnson - Phoenix AZ
Murray D. Sirkis - Tempe AZ
Assignee:
Tokyo Electron Limited - Tokyo
International Classification:
G01R 2732
US Classification:
324639, 324629, 324647, 438714, 438 17, 216 59, 15634528, 31511121, 31511181
Abstract:
A method and system for measuring at least one of a plasma density and an electron density (e. g. , in a range of 10 to 10 electrons/cm ) using plasma induced changes in the frequency of a microwave oscillator. Measurement of at least one of the plasma density and the electron density enables plasma-assisted processes, such as depositions or etches, to be controlled using a feedback control. Both the measurement method and system generate a control voltage that in turn controls a plasma generator to maintain at least one of the plasma density and the electron density at a pre-selected value.

Stabilized Oscillator Circuit For Plasma Density Measurement

US Patent:
6646386, Nov 11, 2003
Filed:
Apr 25, 2002
Appl. No.:
10/031373
Inventors:
Murray D. Sirkis - Tempe AZ
Joseph T. Verdeyen - Savoy IL
Assignee:
Tokyo Electron Limited - Tokyo
International Classification:
H01J 724
US Classification:
31511171, 31511121, 118723
Abstract:
A method and system for controlling electron densities in a plasma processing system. By applying a dither voltage and a correction voltage to a voltage-controlled oscillator, electron (plasma) density of a plasma processing system (acting as an open resonator) may be measured and controlled as part of a plasma-based process.

Electron Density Measurement And Plasma Process Control System Using A Microwave Oscillator Locked To An Open Resonator Containing The Plasma

US Patent:
6741944, May 25, 2004
Filed:
May 22, 2002
Appl. No.:
10/031374
Inventors:
Joseph T. Verdeyen - Savoy IL
Wayne L. Johnson - Phoenix AZ
Murray D. Sirkis - Tempe AZ
Assignee:
Tokyo Electron Limited - Tokyo
International Classification:
H01S 313
US Classification:
702 76, 702 22, 702 31, 702 47, 702108, 702127, 702189
Abstract:
A system for measuring plasma electon densities (e. g. , in the range of 10 to 10 cm ) and for controlling a plasma generator ( ). Measurement of the plasma density is essential if plasma-assisted processes, such depositions or etches, are to be adequately controlled using a feedback control. Both the plasma measurement method and system generate a control voltage that in turn controls the plasma generator ( ) to maintain the plasma electron density at a pre-selected value. The system utilizes a frequency stabilization system to lock the frequency of a local oscillator ( ) to the resonant frequency of an open microwave resonator ( ) when the resonant frequency changes due to the introduction of a plasma within the open resonator. The amplified output voltage of a second microwave discriminator may be used to control a plasma generator ( ).

System And Method For Generating A Discharge In High Pressure Gases

US Patent:
6791280, Sep 14, 2004
Filed:
Apr 1, 2002
Appl. No.:
10/112349
Inventors:
Ju Gao - Champaign IL
Joseph T. Verdeyen - Savoy IL
Assignee:
Advanced Lighting Technologies, Inc. - Solon OH
International Classification:
H05B 4136
US Classification:
315224R, 315 39
Abstract:
A method of generating an electrical discharge in a high pressure gas contained in a sealed enclosure. The method includes driving a helical coil resonator at an RF frequency to generate an RF electric-magnetic field sufficient to generate an electrical discharge in the high pressure gas. The electrical discharge produces an emission spectrum that may be spectroscopically analyzed to determine the composition and impurity content of the gas.

Stabilized Oscillator Circuit For Plasma Density Measurement

US Patent:
6799532, Oct 5, 2004
Filed:
Aug 29, 2003
Appl. No.:
10/650802
Inventors:
Murray D. Sirkis - Tempe AZ
Joseph T. Verdeyen - Savoy IL
Assignee:
Tokyo Electron Limited - Tokyo
International Classification:
C23C 1600
US Classification:
118723MW, 118723 R, 15634524, 15634526, 15634528
Abstract:
A method and system for controlling electron densities in a plasma processing system. By applying a dither voltage and a correction voltage to a voltage-controlled oscillator, electron (plasma) density of a plasma processing system (acting as an open resonator) may be measured and controlled as part of a plasma-based process.

Electron Density Measurement And Plasma Process Control System Using Changes In The Resonant Frequency Of An Open Resonator Containing The Plasma

US Patent:
6861844, Mar 1, 2005
Filed:
Jul 20, 2000
Appl. No.:
10/031570
Inventors:
Joseph T. Verdeyen - Savoy IL, US
Wayne L. Johnson - Phoenix AZ, US
Murray D. Sirkis - Tempe AZ, US
Assignee:
Tokyo Electron Limited - Tokyo
International Classification:
G01N027/64
US Classification:
324464
Abstract:
A system for measuring plasma electron densities (e. g. , in the range of 1010 to 1012 cm−3) and for controlling a plasma generator. Measurement of the plasma electron density is used as part of a feedback control in plasma-assisted processes, such as depositions or etches. Both the plasma measurement method and system generate a control voltage that in turn controls the plasma generator. A programmable frequency source sequentially excites a number of the resonant modes of an open resonator placed within the plasma processing apparatus. The resonant frequencies of the resonant modes depend on the plasma electron density in the space between the reflectors of the open resonator. The apparatus automatically determines the increase in the resonant frequency of an arbitrarily chosen resonant mode of the open resonator due to the introduction of a plasma and compares that measured frequency to data previously entered. The comparison is by any one of (1) dedicated circuitry, (2) a digital signal processor, and (3) a specially programmed general purpose computer. The comparator calculates a control signal which is used to modify the power output of the plasma generator as necessary to achieve the desired plasma electron density.

System And Method For Generating A Discharge In High Pressure Gases

US Patent:
7126283, Oct 24, 2006
Filed:
Sep 14, 2004
Appl. No.:
10/939338
Inventors:
Ju Gao - Champaign IL, US
Joseph T. Verdeyen - Savoy IL, US
Assignee:
Advanced Lighting Technologies, Inc. - Solon OH
International Classification:
H01J 7/24
H01J 65/00
US Classification:
31511141, 313234
Abstract:
A method of generating an electrical discharge in a high pressure gas contained in a sealed enclosure. The method includes driving a helical coil resonator at an RF frequency to generate an RF electric-magnetic field sufficient to generate an electrical discharge in the high pressure gas. The electrical discharge produces an emission spectrum that may be spectroscopically analyzed to determine the composition and impurity content of the gas.

Isbn (Books And Publications)

Laser Electronics

Author:
Joseph T. Verdeyen
ISBN #:
0135236304

Public records

Vehicle Records

Joseph Verdeyen

Address:
8 Azalea Ct, Savoy, IL 61874
Phone:
217-3526149
VIN:
1G4HC5EMXAU120297
Make:
BUICK
Model:
LUCERNE
Year:
2010

Possible Relatives

Daniel W Verdeyen  Andrew E Verdeyen  Joseph J Johnson  Joseph D Stamps  Joseph N Stancil  Joseph A Stanco  Joseph B Stanczak  Joseph Stanczyk  Joseph H Standeven  Joseph A Standish 

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