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Jian Rong Ma, 60579 Hearst Ave, San Francisco, CA 94112

Known as:
Jian R Ma Jian Rong Te Ma Jian Rong Rong Ma Joanna Rong Ma Jianrong R Ma Joanna J Ma Jian R Ho Jian Sheng Ho Jian Rong
Related to:
Barney G Lee 48

Jian Ma Phones & Addresses

579 Hearst Ave, San Francisco, CA 94112   

Dayton, OH   

Pensacola, FL   

Hayward, CA   

Camanche, IA   

San Leandro, CA   

San Lorenzo, CA   

Elrosa, MN   

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Mentions for Jian Rong Ma

Career records & work history

Lawyers & Attorneys

Jian Ma Photo 1

Jian Ma - Lawyer

Address:
The Law Offices of Jiahe
108-5865188 (Office)
Licenses:
New York - Currently registered 2002
Education:
Franklin Pierce
Peking University
Jian Ma Photo 2

Jian Ma - Lawyer

ISLN:
924295330
Admitted:
2002

Medicine Doctors

Jian Ma Photo 3

Jian Ma

Specialties:
Internal Medicine
Rheumatology
Education:
Shanghai Railway Medical University (1982)

License Records

Jian Ma

Licenses:
License #: 065037359 - Expired
Issued Date: Jul 12, 2010
Expiration Date: Sep 30, 2015
Type: Licensed Certified Public Accountant
License #: 239025348 - Expired
Issued Date: Feb 18, 2011
Expiration Date: Sep 30, 2015
Type: Registered Certified Public Accountant

Jian Ma

Licenses:
License #: 239025348 - Expired
Issued Date: Feb 18, 2011
Expiration Date: Sep 30, 2015
Type: Registered Certified Public Accountant
License #: 065037359 - Expired
Issued Date: Jul 12, 2010
Expiration Date: Sep 30, 2015
Type: Licensed Certified Public Accountant

Jian Ma

Licenses:
License #: DH13136 - Expired
Category: DENTISTRY
Issued Date: Sep 12, 2004
Renew Date: Mar 31, 2007
Expiration Date: Mar 31, 2007
Type: Dental Hygienist

Resumes & CV records

Resumes

Jian Ma Photo 41

Principal Engineer - Director Of Engineering

Location:
San Francisco, CA
Industry:
Telecommunications
Work:
Qualcomm
Principal Engineer - Director of Engineering
Education:
University of California, San Diego - Jacobs School of Engineering 1990 - 1992
University of Washington 1983 - 1989
Doctorates, Doctor of Philosophy, Physics East China Normal University 1978 - 1982
Bachelors, Bachelor of Science, Physics
Skills:
Optics, Display Technologies, Lens Design, Optical Thin Film Design, Opto Mechanical Design, Photonic Packaging, R&D, Product Development, Electrical Engineering, Zemax, Code V, Non Sequential Ray Tracing, Lighttools, Asap, Optilayer, Fdtd, Rsoft, Color Science, Mems, Matlab, Fiber Optics, Nonlinear Optics, Project Management, Leadership, Characterization, Display
Languages:
Mandarin
Jian Ma Photo 42

Site Reliability Engineer

Location:
Palo Alto, CA
Industry:
Information Technology And Services
Work:
Google
Site Reliability Engineer
Education:
Xi'an Jiaotong University 1984 - 1988
Bachelors, Computer Science
Jian Ma Photo 43

Manager

Location:
San Francisco, CA
Industry:
Semiconductors
Work:
Intel Corporation
Manager Ibm Jan 1998 - Jan 2000
Staff Process Engineer Uc Berkeley Dec 1996 - Dec 1997
Postdoctoral Researcher University of Wisconsin-Madison Jun 1995 - Dec 1996
Research Associate South China Normal University Dec 1986 - Jul 1990
Lecturer
Education:
University of Wisconsin - Madison
Tsinghua University
Master of Science, Masters, Physics Yunnan University
Bachelors, Bachelor of Science, Physics
Skills:
Lithography, Thin Films, Semiconductors, Process Integration, Metrology, Sputtering, Silicon, Design of Experiments, Semiconductor Industry, Afm, Jmp, Semiconductor Process, Spectroscopy, Cmos, Surface Chemistry, Photolithography, Etching, Cvd, Uhv, Yield
Jian Ma Photo 44

Jian Ma

Location:
1466 Valcartier St, Sunnyvale, CA 94087
Industry:
Financial Services
Work:
Blackrock
Vice President Blackrock Aug 2008 - Nov 2009
Investment Analytics Officer Dci May 2005 - Aug 2009
Associate Moody's Kmv May 2000 - Apr 2005
Manager Ces Jun 1999 - Oct 1999
Software Engineer Blackrock Jun 1999 - Oct 1999
Investment Analytics Officer at Bgi, Cfa, Frm
Education:
Mayo Clinic School of Health Sciences 1997 - 2000
Masters, Computer Science, Informatics Peking University
Skills:
Equity Research, Portfolio Management, Financial Modeling, Java, Data Analysis, Investments, R, Machine Learning, Excel, Fixed Income, Has Errors, Sas, Great, Hedge Funds, Sql
Languages:
English
Jian Ma Photo 45

Deputy General Manager

Location:
San Francisco, CA
Industry:
Banking
Work:
Wing Lung Bank San Francisco Branch
Deputy General Manager
Jian Ma Photo 46

Jian Ma

Location:
San Francisco, CA
Industry:
Arts And Crafts
Education:
Huazhong University of Science and Technology
Associates, Chinese Language and Literature, Chinese Language, Literature Central China Normal University
Bachelors, Bachelor of Arts, Painting
Skills:
Chinese Writing, Painting, Mixed Media
Jian Ma Photo 47

Jian Ma

Jian Ma Photo 48

Arts And Crafts Professional

Location:
San Francisco Bay Area
Industry:
Arts and Crafts

Publications & IP owners

Us Patents

Advanced Mask Patterning With Patterning Layer

US Patent:
7460209, Dec 2, 2008
Filed:
Mar 28, 2005
Appl. No.:
11/092993
Inventors:
Jian Ma - San Jose CA, US
Phil Freiberger - Santa Clara CA, US
Karmen Yung - Sunnyvale CA, US
Frederick Chen - Cupertino CA, US
Chaoyang Li - San Jose CA, US
Steve Mak - Pleasanton CA, US
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
G03B 27/42
G03F 1/00
US Classification:
355 53, 430 5
Abstract:
An imaging structure such as a mask or reticle may be fabricated using a patterning layer on an imaging layer. The patterning layer may have substantially different etch properties than the imaging layer. A first etch process may be selective of the patterning layer with respect to a resist layer. A second etch process may be selective of the imaging layer with respect to the patterning layer.

Advanced Mask Patterning With Patterning Layer

US Patent:
2008030, Dec 18, 2008
Filed:
Aug 20, 2008
Appl. No.:
12/194689
Inventors:
JIAN MA - San Jose CA, US
Phil Freiberger - Santa Clara CA, US
Karmen Yung - Sunnyvale CA, US
Frederick Chen - Cupertino CA, US
Chaoyang Li - San Jose CA, US
Steve Mak - Pleasanton CA, US
Assignee:
INTEL CORPORATION - SANTA CLARA CA
International Classification:
B44C 1/22
B32B 7/02
US Classification:
216 47, 428212
Abstract:
An imaging structure such as a mask or reticle may be fabricated using a patterning layer on an imaging layer. The patterning layer may have substantially different etch properties than the imaging layer. A first etch process may be selective of the patterning layer with respect to a resist layer. A second etch process may be selective of the imaging layer with respect to the patterning layer.

Phase-Shift Photomask And Patterning Method

US Patent:
2011015, Jun 30, 2011
Filed:
Dec 30, 2009
Appl. No.:
12/655460
Inventors:
Bennett Olson - Livermore CA, US
Max Lau - San Ramon CA, US
Cheng-hsin Ma - San Jose CA, US
Jian Ma - San Jose CA, US
Andrew T. Jamieson - San Jose CA, US
International Classification:
G03F 1/00
G03F 7/20
US Classification:
430 5, 430322, 430323, 430324
Abstract:
A phase shift photomask blank has a quartz substrate, a lower chrome layer, a light-absorbing MoSi layer, and an upper chrome layer. This mask can be patterned in various ways to form a patterned photomask with both phase shift and binary areas.

Solid State Image Sensor With On-Chip Filter And Extended Spectral Response

US Patent:
2019009, Mar 28, 2019
Filed:
Sep 22, 2017
Appl. No.:
15/713217
Inventors:
- San Diego CA, US
Todor Georgiev GEORGIEV - Sunnyvale CA, US
Jian MA - San Diego CA, US
Sergiu GOMA - San Diego CA, US
International Classification:
H01L 27/146
H01L 31/0216
H04N 5/374
Abstract:
Various embodiments are directed to an image sensor that includes a first sensor portion and a second sensor portion. The second sensor portion may be positioned relative to the first sensor portion such that the second sensor portion may initially detect light entering the image sensor, and some of that light passes through the second sensor portion and may be detected by the first sensor portion. In some embodiments, one more optical filters may be disposed within the image sensor. The one or more optical filters may include at least one of a dual bandpass filter disposed above the second photodetector or a narrow bandpass filter disposed between the first photodetector and the second photodetector.

Protection Of Thin Film Transistors In A Display Element Array From Visible And Ultraviolet Light

US Patent:
2015034, Dec 3, 2015
Filed:
Sep 29, 2014
Appl. No.:
14/500690
Inventors:
- San Diego CA, US
Tsongming Kao - Sunnyvale CA, US
Jian Ma - Carlsbad CA, US
Lixia Zhou - Milpitas CA, US
Tallis Young Chang - San Diego CA, US
Shu-Jhih Chen - Taoyuan County, TW
John Hyunchul Hong - San Clemente CA, US
International Classification:
G02B 26/00
G02B 5/00
G02B 5/20
H01L 27/12
Abstract:
A display assembly includes an array of display elements disposed between a first substrate and a second substrate, the array of display elements including one or more thin film transistors (TFTs). A black mask arrangement is disposed between the first substrate and the second substrate, the black mask arrangement being configured to prevent light entering the display assembly from reaching the TFTs.

Embedded Surface Diffuser

US Patent:
2015010, Apr 23, 2015
Filed:
Oct 18, 2013
Appl. No.:
14/057975
Inventors:
- San Diego CA, US
Ion Bita - San Jose CA, US
Jian J. Ma - Carlsbad CA, US
Sapna Patel - Fremont CA, US
Lai Wang - Milpitas CA, US
Assignee:
QUALCOMM MEMS Technologies, Inc. - San Diego CA
International Classification:
G02B 3/00
G02B 1/12
G02B 1/11
US Classification:
359619, 216 26
Abstract:
A diffuser stack may include a first film with a first index of refraction and a second film proximate the first film. The second film may have a second index of refraction that is higher than the first index of refraction. An interface between the first film and the second film may include an array of microlenses of substantially randomized sizes. The microlenses may include sections of features that are substantially spherical, polygonal, conical, etc. The first and second films may be disposed between an array of pixels and a substantially transparent substrate. An anti-reflective layer may be disposed between the first film and the second film.

Illumination Device With Spaced-Apart Diffractive Media

US Patent:
2015009, Apr 9, 2015
Filed:
Oct 9, 2013
Appl. No.:
14/050030
Inventors:
- San Diego CA, US
Zhengwu Li - Milpitas CA, US
Jian J. Ma - Carlsbad CA, US
John H. Hong - San Clemente CA, US
Assignee:
QUALCOMM Mems Technologies, Inc. - San Diego CA
International Classification:
F21V 8/00
US Classification:
362606, 362611, 295272
Abstract:
This disclosure provides systems, methods and apparatus for an illumination system. In one aspect, the illumination system is a light guide that includes spaced-apart regions of medium containing diffractive features. For example, the medium may include holographic medium having holograms that are configured to redirect light, propagating through the light guide, out of the light guide. The spaces between the spaced-apart regions of media may be filled with a material having a lower refractive index than the light guide, thereby functioning as a reflective cladding in those spaces.

Color Performance And Image Quality Using Field Sequential Color (Fsc) Together With Single-Mirror Imods

US Patent:
2014012, May 8, 2014
Filed:
Nov 6, 2012
Appl. No.:
13/669671
Inventors:
- San Diego CA, US
Muhammed Ibrahim Sezan - Los Gatos CA, US
Tallis Young Chang - San Diego CA, US
Jian J. Ma - Carlsbad CA, US
John Hyunchul Hong - San Clemente CA, US
Assignee:
QUALCOMM MEMS TECHNOLOGIES, INC. - San Diego CA
International Classification:
G02B 26/00
G09G 5/10
US Classification:
345690, 359290
Abstract:
This disclosure provides systems, methods and apparatus, including computer programs encoded on computer storage media, for applying field-sequential color (FSC) methods to displays that include single-mirror interferometric modulators (IMODs), which may be multi-state IMODs or analog IMODs. In one aspect, grayscale levels may be provided by varying a mirror/absorber gap height between black and white states. In other implementations, grayscale levels may be obtained by varying the gap height between the black state and second-order color peaks.

Isbn (Books And Publications)

Soil, Fertilizer, And Plant Silicon Research In Japan

Author:
Jian Feng Ma
ISBN #:
0444511660

The Noodle Maker

Author:
Jian Ma
ISBN #:
0374223076

Stick Out Your Tongue

Author:
Jian Ma
ISBN #:
0374269882

The Noodle Maker

Author:
Jian Ma
ISBN #:
0701176059

Possible Relatives

David V Ma  D C Ma  Debbie N Ma  Danny K Ma  Dao N Ma  Derek T Ma  Dat J Ma  Jian H Lee  Jian M Li  Jian Q Lin 

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