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Peter W Ewing, 61380 Arah St, Manchester, NH 03104

Peter Ewing Phones & Addresses

380 Arah St, Manchester, NH 03104   

31 Buckingham Way, Bedford, NH 03110    603-4710031    603-4717157   

15 Lancaster Ave, Bedford, NH 03110    603-4717157   

Warren, VT   

59 Oakmont Dr, Concord, NH 03301    603-7155854   

Penacook, NH   

Londonderry, NH   

Quincy, MA   

Mentions for Peter W Ewing

Resumes & CV records

Resumes

Peter Ewing Photo 39

General Manager

Industry:
Building Materials
Work:
Flooring Direct Maui
General Manager
Peter Ewing Photo 40

Managing Partner

Location:
Bedford, NH
Industry:
Insurance
Work:
American Emerald Group
Managing Partner
Core-Programs of New England Nov 2011 - Feb 2013
Managing Partner
Breed's Hill Insurance Agency Aug 1996 - Oct 2011
Senior Vice President
Skills:
Property and Casualty Insurance, Insurance, Commercial Insurance, Underwriting, Professional Liability, Liability, Casualty, Reinsurance, Legal Liability, Workers Compensation, Brokers, General Insurance, Umbrella Insurance, D&O, Commercial Lines, Claim, Excess, Captives, Employment Practices Liability, Risk Management, Insurance Brokerage, Liability Analysis
Peter Ewing Photo 41

Peter Ewing

Peter Ewing Photo 42

Peter Ewing

Peter Ewing Photo 43

Peter Ewing

Peter Ewing Photo 44

Peter Ewing

Peter Ewing Photo 45

Peter Ewing

Peter Ewing Photo 46

Peter Ewing

Location:
United States

Publications & IP owners

Us Patents

Geh4/Ar Plasma Chemistry For Ion Implant Productivity Enhancement

US Patent:
2021000, Jan 7, 2021
Filed:
Sep 17, 2020
Appl. No.:
17/023879
Inventors:
- Santa Clara CA, US
Ajdin Sarajlic - Bedford NH, US
Ronald Johnson - Gloucester MA, US
Nunzio V. Carbone - Hamilton MA, US
Peter Ewing - South Berwick ME, US
Mervyn Deegan - South Hamilton MA, US
International Classification:
H01J 37/08
H01J 37/317
Abstract:
A method for improving the beam current for certain ion beams, and particularly germanium and argon, is disclosed. The use of argon as a second gas has been shown to improve the ionization of germane, allowing the formation of a germanium ion beam of sufficient beam current without the use of a halogen. Additionally, the use of germane as a second gas has been shown to improve the beam current of an argon ion beam.

Geh4/Ar Plasma Chemistry For Ion Implant Productivity Enhancement

US Patent:
2020014, May 7, 2020
Filed:
Nov 1, 2018
Appl. No.:
16/178167
Inventors:
- Santa Clara CA, US
Ajdin Sarajlic - Bedford NH, US
Ronald Johnson - Gloucester MA, US
Nunzio V. Carbone - Hamilton MA, US
Peter Ewing - South Berwick ME, US
Mervyn Deegan - South Hamilton MA, US
International Classification:
H01J 37/08
Abstract:
A method for improving the beam current for certain ion beams, and particularly germanium and argon, is disclosed. The use of argon as a second gas has been shown to improve the ionization of germane, allowing the formation of a germanium ion beam of sufficient beam current without the use of a halogen. Additionally, the use of germane as a second gas has been shown to improve the beam current of an argon ion beam.

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