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Alex N Anderson, 35Lehi, UT

Known as:
Alexander N Anderson Alexander Nicholas Anderson Alexander N Anderso
Related to:
Kara L Reno 37 Jackie L Anderson 61 Dustin L Anderson Dustin Anderson 33 D C Anderson Jonathan T Anderson 34 John G Anderson 78 Jacki Anderson 69 Susie K Anderson Mariann Darrington 59 Jerrline M Andersen 90 Cassandra L Ward 68 Sharma Anderson Alyssa Ann Anderson John G Andersen 92

Alex Anderson Phones & Addresses

Lehi, UT   

Burley, ID   

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Us Patents

Multi-Layer Deposition System And Process

US Patent:
2018023, Aug 23, 2018
Filed:
Aug 30, 2017
Appl. No.:
15/691593
Inventors:
- Draper UT, US
Max Sorensen - Harriman UT, US
Chien-Lan Hsueh - Draper UT, US
Tining Su - Draper UT, US
Jim Dempster - Reno NV, US
Alex Anderson - Draper UT, US
Layton Baker - Draper UT, US
International Classification:
C23C 16/455
H01L 21/67
H01L 21/677
C23C 16/52
Abstract:
A modular multilayer deposition system includes a plurality of modular deposition chambers, including at least one parylene deposition chamber and at least one ALD deposition chamber. The parylene deposition chamber is connected in series with the ALD deposition chamber. Substrates are automatically moved from within the parylene deposition chamber to within the ALD deposition chamber or from within the ALD deposition chamber to the parylene deposition chamber.

Masking And De-Masking Systems And Processes

US Patent:
2018011, May 3, 2018
Filed:
Jul 7, 2017
Appl. No.:
15/644610
Inventors:
- Draper UT, US
Joshua Su - Draper UT, US
David Melon - Draper UT, US
Alex Anderson - Draper UT, US
Wei Li - Shenzhen, CN
Wan-Man Liu - Shenzhen, CN
Zhi-Guang Chen - Shenzhen, CN
Assignee:
HZO, Inc. - Draper UT
International Classification:
B32B 37/00
B05C 5/00
B05C 9/06
B32B 7/12
B05C 13/00
B32B 37/02
Abstract:
An automated masking system includes a substrate loading apparatus designed to hold a plurality of substrates, a first masking material application station designed to automatically apply a first masking material to a portion of the substrate, and a second masking material application station designed to automatically apply a second masking material to a portion of the substrate, the second masking material being different than the first masking material. The system includes a first dispensing apparatus and a second dispensing apparatus that move relative to the substrate in a repeatable motion. The substrate moves automatically from the first masking material application station to the second masking material application station.

Possible Relatives

Cynthia M Anderson  David R Anderson  A J Anderson  Cyril C Anderson  Cyrus E Anderson  D D Anderson  Davin Anderson  Alex Johnson  Alex H Stanford  Alex L White 

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