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Atul G Gupta, 69308 Hartford St, Islington, MA 02090

Atul Gupta Phones & Addresses

308 Hartford St, Westwood, MA 02090    781-6861046   

5 Bradford Rd, Natick, MA 01760    508-5450125    508-6559319   

331 Bolivar St, Canton, MA 02021    781-8282850   

Austin, TX   

8 Perry Rd, Auburndale, MA 02466    617-2443053   

North Andover, MA   

Braintree, MA   

Mentions for Atul G Gupta

Career records & work history

Medicine Doctors

Atul M. Gupta

Specialties:
Emergency Medicine
Work:
Lowcountry Neuropathy
55 Sheridan Park Cir STE A, Bluffton, SC 29910
843-8365111 (phone) 843-8365112 (fax)
Education:
Medical School
Wright State University Boonshoft School of Medicine
Graduated: 1999
Procedures:
Electrocardiogram (EKG or ECG)
Conditions:
Abnormal Vaginal Bleeding, Acne, Acute Bronchitis, Acute Conjunctivitis, Acute Pharyngitis, Acute Sinusitis, Acute Upper Respiratory Tract Infections, Allergic Rhinitis, Anxiety Phobic Disorders, Atopic Dermatitis, Attention Deficit Disorder (ADD), Autism, Bipolar Disorder, Bronchial Asthma, Burns, Calculus of the Urinary System, Candidiasis, Cardiac Arrhythmia, Cardiomyopathy, Carpel Tunnel Syndrome, Chronic Bronchitis, Chronic Sinusitis, Constipation, Contact Dermatitis, Dehydration, Dermatitis, Diabetes Mellitus (DM), Epilepsy, Fractures, Dislocations, Derangement, and Sprains, Gastroesophageal Reflux Disease (GERD), Heart Failure, HIV Infection, Hypertension (HTN), Hypothyroidism, Inflammatory Bowel Disease (IBD), Influenza, Intervertebral Disc Degeneration, Ischemic Stroke, Osteomyelitis, Otitis Media, Paroxysmal Supreventricular Tachycardia (PSVT), Peripheral Nerve Disorders, Pneumonia, Poisoning by Drugs, Meds, or Biological Substances, Schizophrenia, Septicemia, Skin and Subcutaneous Infections, Substance Abuse and/or Dependency, Urinary Tract Infection (UT)
Languages:
English
Description:
Dr. Gupta graduated from the Wright State University Boonshoft School of Medicine in 1999. He works in Bluffton, SC and specializes in Emergency Medicine.

Atul Gupta

Specialties:
Infectious Disease
Work:
Midwest Infectious Disease Specialist
19550 E 39 St S STE 400, Independence, MO 64057
816-2542552 (phone) 816-8330398 (fax)
Education:
Medical School
Jawaharlal Nehru Med Coll, Univ Rajasthan, Ajmer, Rajasthan, India
Graduated: 1999
Conditions:
Septicemia, Acute Bronchitis, Acute Pancreatitis, Acute Pharyngitis, Acute Renal Failure, Acute Sinusitis, Alcohol Dependence, Anemia, Anxiety Phobic Disorders, Aortic Valvular Disease, Appendicitis, Atopic Dermatitis, Bacterial Pneumonia, Bell's Palsy, Benign Prostatic Hypertrophy, Calculus of the Urinary System, Candidiasis, Candidiasis of Vulva and Vagina, Chickenpox, Cholelethiasis or Cholecystitis, Chronic Renal Disease, Cirrhosis, Contact Dermatitis, Dermatitis, Diabetes Mellitus (DM), Disorders of Lipoid Metabolism, Diverticulitis, Diverticulosis, Endocarditis, Esophagitis, Fractures, Dislocations, Derangement, and Sprains, Gastritis and Duodenitis, Gout, Heart Failure, Herpes Genitalis, Herpes Simplex, Herpes Zoster, HIV Infection, Hypertension (HTN), Hyperthyroidism, Infectious Diseases of the Brain or Spinal Cord, Infectious Liver Disease, Infectious Mononucleosis, Inflammatory Bowel Disease (IBD), Influenza, Intervertebral Disc Degeneration, Ischemic Bowel Disease, Keratitis, Lateral Epicondylitis, Lyme Disease, Meningitis, Mitral Valvular Disease, Orbital Infection, Osteomyelitis, Overweight and Obesity, Parkinson's Disease, Pelvic Inflammatory Disease (PID), Peptic Ulcer Disease, Peripheral Nerve Disorders, Phlebitis and Thrombophlebitis, Plantar Fascitis, Pneumonia, Poisoning by Drugs, Meds, or Biological Substances, Prostatitis, Sexually Transmitted Diseases (STDs), Skin and Subcutaneous Infections, Substance Abuse and/or Dependency, Thyroiditis, Transient Cerebral Ischemia, Urinary Incontinence, Urinary Tract Infection (UT), Valvular Heart Disease, Varicose Veins, Venous Embolism and Thrombosis, Viral Meningitis
Languages:
English
Description:
Dr. Gupta graduated from the Jawaharlal Nehru Med Coll, Univ Rajasthan, Ajmer, Rajasthan, India in 1999. He works in Independence, MO and specializes in Infectious Disease. Dr. Gupta is affiliated with Centerpoint Medical Center.

Atul N. Gupta

Specialties:
Infectious Disease
Work:
Southwest Infectious Disease Associates
1051 Essington Rd STE 210, Joliet, IL 60435
815-7261818 (phone) 815-7260232 (fax)
Education:
Medical School
All India Inst of Med Sci, Ansari Nagar, New Delhi, India
Graduated: 1989
Languages:
English, Spanish
Description:
Dr. Gupta graduated from the All India Inst of Med Sci, Ansari Nagar, New Delhi, India in 1989. He works in Joliet, IL and specializes in Infectious Disease. Dr. Gupta is affiliated with Presence Saint Joseph Hospital and Silver Cross Hospital.

Atul K. Gupta

Specialties:
Diagnostic Radiology
Work:
Rochester Radiology AssociatesRochester General Imaging
1255 Portland Ave, Rochester, NY 14621
585-9223220 (phone) 585-3365025 (fax)
Site
Education:
Medical School
SUNY Upstate Medical University
Graduated: 1991
Languages:
English, Spanish
Description:
Dr. Gupta graduated from the SUNY Upstate Medical University in 1991. He works in Rochester, NY and specializes in Diagnostic Radiology. Dr. Gupta is affiliated with Newark-Wayne Community Hospital and Rochester General Hospital.

License Records

Atul Gupta

Licenses:
License #: 28315 - Active
Issued Date: Jun 4, 2010
Renew Date: Dec 1, 2015
Expiration Date: Nov 30, 2017
Type: Certified Public Accountant

Atul Gupta

Licenses:
License #: MT033823T - Expired
Category: Medicine
Type: Graduate Medical Trainee

Publications & IP owners

Us Patents

Technique For Ion Beam Angle Process Control

US Patent:
7348576, Mar 25, 2008
Filed:
Jun 7, 2005
Appl. No.:
11/146064
Inventors:
Atul Gupta - Beverly MA, US
Joseph C. Olson - Beverly MA, US
Assignee:
Varian Semiconductor Equipment Associates, Inc. - Gloucester MA
International Classification:
G21K 5/10
H01J 37/08
US Classification:
25049221, 25044211, 250396, 2504923, 250300, 250311, 250307
Abstract:
A technique for ion beam angle process control is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for ion beam angle process control in an ion implanter system. The method may comprise directing one or more ion beams at a substrate surface. The method may also comprise determining an average spread of incident angles at which the one or more ion beams strike the substrate surface. The method may further comprise adjusting the one or more ion beams based at least in part on the average spread of incident angles to produce a desired spread of ion beam incident angles.

Technique For Ion Beam Angle Spread Control For Advanced Applications

US Patent:
7394078, Jul 1, 2008
Filed:
Jun 7, 2005
Appl. No.:
11/146072
Inventors:
Atul Gupta - Beverly MA, US
Joseph C. Olson - Beverly MA, US
Assignee:
Varian Semiconductor Equipment Associates, Inc. - Gloucester MA
International Classification:
G21K 5/10
US Classification:
25049221, 250397, 2504922, 2504923, 250396, 25044211, 250307, 250310, 250311
Abstract:
A technique for ion beam angle spread control for advance applications is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for ion beam angle spread control for advanced applications. The method may comprise directing one or more ion beams at a substrate surface at two or more different incident angles. The method may also comprise varying an ion beam dose associated with at least one of the one or more ion beams based at least in part on the two or more incident angles, thereby exposing the substrate surface to a controlled ion beam angle-dose distribution.

Technique For Boron Implantation

US Patent:
7397048, Jul 8, 2008
Filed:
Sep 16, 2005
Appl. No.:
11/227079
Inventors:
Vikram Singh - North Andover MA, US
Edmund J. Winder - Waltham MA, US
Harold M. Persing - Rockport MA, US
Timothy Jerome Miller - South Hamilton MA, US
Ziwei Fang - Beverly MA, US
Atul Gupta - Beverly MA, US
Assignee:
Varian Semiconductor Equipment Associates, Inc. - Gloucester MA
International Classification:
H05H 1/42
US Classification:
25049221, 250424, 250425, 250426, 250423 R, 438510, 438513, 438514, 438515, 438516, 423289, 423294, 423276
Abstract:
A technique for boron implantation is disclosed. In one particular exemplary embodiment, the technique may be realized by an apparatus for boron implantation. The apparatus may comprise a reaction chamber. The apparatus may also comprise a source of pentaborane coupled to the reaction chamber, wherein the source is capable of supplying a substantially pure form of pentaborane into the reaction chamber. The apparatus may further comprise a power supply that is configured to energize the pentaborane in the reaction chamber sufficiently to produce a plasma discharge having boron-bearing ions.

Methods And Apparatus For Beam Density Measurement In Two Dimensions

US Patent:
7453070, Nov 18, 2008
Filed:
Jun 29, 2006
Appl. No.:
11/477335
Inventors:
Atul Gupta - Beverly MA, US
Joseph C. Olson - Beverly MA, US
Gregg A. Norris - Rockport MA, US
Assignee:
Varian Semiconductor Associates, Inc. - Gloucester MA
International Classification:
G01K 1/08
US Classification:
250397, 25049221, 2504911, 427523, 362284, 362324, 353 97
Abstract:
A beam density measurement system includes a shield, a beam sensor, and an actuator. The beam sensor is positioned downstream from the shield in a direction of travel of a beam. The beam sensor is configured to sense an intensity of the beam, and the beam sensor has a long dimension and a short dimension. The actuator translates the shield relative to the beam sensor, wherein the shield blocks at least a portion of the beam from the beam sensor as the shield is translated relative to the beam sensor, and wherein measured values of the intensity associated with changes in a position of the shield relative to the beam sensor are representative of a beam density distribution of the beam in a first direction defined by the long dimension of the beam sensor.

Conformal Doping Apparatus And Method

US Patent:
7524743, Apr 28, 2009
Filed:
Oct 13, 2005
Appl. No.:
11/163307
Inventors:
Atul Gupta - Waltham MA, US
Vikram Singh - North Andover MA, US
Timothy Miller - South Hamilton MA, US
Edmund Jacques Winder - Waltham MA, US
Assignee:
Varian Semiconductor Equipment Associates, Inc. - Gloucester MA
International Classification:
H01L 21/423
H01L 21/425
US Classification:
438514, 438525, 438563, 25049221, 2504923
Abstract:
A method of doping includes depositing a layer of dopant material on nonplanar and planar features of a substrate. Inert ions are generated from an inert feed gas. The inert ions are extracted towards the substrate where they physically knock the dopant material into both the planar and nonplanar features of the substrate.

Technique For Improving Uniformity Of A Ribbon Beam

US Patent:
7525103, Apr 28, 2009
Filed:
Sep 29, 2006
Appl. No.:
11/537011
Inventors:
Kenneth H. Purser - Lexington MA, US
Atul Gupta - Beverly MA, US
Assignee:
Varian Semiconductor Equipment Associates, Inc. - Gloucester MA
International Classification:
H01L 21/425
US Classification:
250396ML, 25049221, 25049223, 2504923
Abstract:
A technique for improving uniformity of a ribbon beam is disclosed. In one particular exemplary embodiment, an apparatus may comprise a first corrector-bar assembly and a second corrector-bar assembly, wherein the second corrector-bar assembly is located at a predetermined distance from the first corrector-bar assembly. Each of a first plurality of coils in the first corrector-bar assembly may be individually excited to deflect at least one beamlet in the ribbon beam, thereby causing the beamlets to arrive at the second corrector-bar assembly in a desired spatial spread. Each of a second plurality of coils in the second corrector-bar assembly may be individually excited to further deflect one or more beamlets in the ribbon beam, thereby causing the beamlets to exit the second corrector-bar assembly at desired angles.

Technique For Improving Ion Implantation Based On Ion Beam Angle-Related Information

US Patent:
7561983, Jul 14, 2009
Filed:
Sep 29, 2006
Appl. No.:
11/537033
Inventors:
Atul Gupta - Beverly MA, US
Jonathan Gerald England - Horsham, GB
Assignee:
Varian Semiconductor Equipment Associates, Inc. - Gloucester MA
International Classification:
G06F 19/00
US Classification:
702134, 702123
Abstract:
A technique for improving ion implantation based on ion beam angle-related information is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for improving ion implantation. The method may comprise obtaining angle-related information associated with an ion beam. The method may also comprise calculating, based on the angle-related information, an ion beam angle distribution over a wafer for one or more potential scanning modes. The method may further comprise selecting a desired scanning mode from the one or more potential scanning modes based on an evaluation of performance metric caused by the ion beam angle distribution.

Method Of Determining Angle Misalignment In Beam Line Ion Implanters

US Patent:
7642529, Jan 5, 2010
Filed:
Sep 29, 2006
Appl. No.:
11/541373
Inventors:
Atul Gupta - Beverly MA, US
Joseph C. Olson - Beverly MA, US
Assignee:
Varian Semiconductor Equipment Associates, Inc. - Gloucester MA
International Classification:
H01J 37/317
US Classification:
25049221
Abstract:
A method includes directing an ion beam at a plurality of differing incident angles with respect to a target surface of a substrate to implant ions into a plurality of portions of the substrate, wherein each one of the plurality of differing incident angles is associated with a different one of the plurality of portions, measuring angle sensitive data from each of the plurality of portions of the substrate, and determining an angle misalignment between the target surface and the ion beam incident on the target surface from the angle sensitive data. A method of determining a substrate miscut is also provided.

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