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Anne Cecelia Miller, 38Olympia, WA

Known as:
Anne C Miller Anne Cecilia Miller Anne C Meyers Anne Myers
Related to:
Denise E Baker 47 Philip A Meyers 76 Karen S Bolda 58 Stephen T Meyers 43 Kimberly D Meyers 43 Kathryn E Meyers 45 Teresa A Meyers 75 Christine M Meyers 47 Rachel C Meyers 48 Matthew J Miller 39 Paul J Meyers 41 Michael J Miller 48

Anne Miller Phones & Addresses

Olympia, WA   

Shelton, WA   

Seattle, WA   

Spokane, WA   

Vancouver, WA   

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Career records & work history

Lawyers & Attorneys

Anne Miller Photo 1

Anne Penney Miller - Lawyer

Licenses:
Virginia - Authorized to practice law 1993
Anne Miller Photo 2

Anne Miller - Lawyer

ISLN:
919815726
Admitted:
2005
University:
Indiana University, B.A., 1999
Law School:
Wake Forest University, J.D., 2005
Anne Miller Photo 3

Anne Miller - Lawyer

Office:
Jack B. Fishman & Associates
Specialties:
Bankruptcy & Debt, Estate Planning, Real Estate, Mediation, Corporate & Incorporation, Family Law, Real Estate, Criminal Law, Criminal Law
ISLN:
917132962
Admitted:
1999
University:
DePaul University, B.A.
Law School:
DePaul University, J.D., 1999
Anne Miller Photo 4

Anne Miller - Lawyer

Specialties:
Administrative Law, Appellate Practice, Human and Civil Rights, Constitutional Law, Contracts, Education Law, Labour and Employment, General Practice, Government, Juvenile Law, Lobbying, Litigation, Internet Law
ISLN:
924628120
Admitted:
2014
Anne Miller Photo 5

Anne Miller - Lawyer

Specialties:
Automobile Accidents, Breach of Contract, Civil Litigation, Collections, Elder Law, Estate Planning and Probate, Foreclosures, General Practice, Insurance Defense Law, Labor and Employment, Landlord and Tenant Law, Legal Malpractice, Loan Modification, Medical Malpractice, Property Damage, Wills and Probate, Wrongful Termination
ISLN:
900864603
Admitted:
1992
University:
Baylor University, B.A., 1989; University of Texas, B.S., 1980
Law School:
Southern Methodist University, J.D., 1991; Southern Methodist University, J.D., 1992
Anne Miller Photo 6

Anne Miller - Lawyer

Specialties:
Business, Estate Planning
ISLN:
1000700646
Admitted:
2013
Anne Miller Photo 7

Anne Miller - Lawyer

Office:
Medtronic, Inc.
Specialties:
FDA, Import and Export Law
ISLN:
912524960
Admitted:
1996
University:
Gustavus Adolphus College, B.A., 1990; Gustavus Adolphus College, B.A., 1990
Law School:
Hamline University, J.D., 1996
Anne Miller Photo 8

Anne Miller - Lawyer

ISLN:
904801284
Admitted:
1984
University:
Cornell University, B.A., 1972; University of Maryland, M.S., 1973
Law School:
Syracuse University, J.D., 1983

Medicine Doctors

Anne Miller Photo 9

Anne E Miller, Portland OR - LMFT

Specialties:
Marriage & Family Therapy
Address:
3550 Se Woodward St Suite P, Portland, OR 97202
503-9434994 (Fax)
Languages:
English
Anne Miller Photo 10

Anne E Miller, Wilsonville OR - PT (Physical therapy)

Specialties:
Physical Therapy
Address:
25117 Sw Parkway Ave Suite D, Wilsonville, OR 97070
503-5703665 (Phone)
Languages:
English

Anne C. Miller

Specialties:
Dermatology
Work:
Palo Alto Medical Foundation ClinicPalo Alto Medical Foundation
795 El Camino Real STE 2C, Palo Alto, CA 94301
650-3214121 (phone) 650-8535379 (fax)
Site
Palo Alto Medical Foundation ClinicPalo Alto Medical Foundation Dermatology
795 El Camino Real FL 2, Palo Alto, CA 94301
650-8532982 (phone) 650-3305968 (fax)
Site
Education:
Medical School
University of California, Davis School of Medicine
Graduated: 1978
Procedures:
Destruction of Benign/Premalignant Skin Lesions, Destruction of Skin Lesions, Skin Surgery, Skin Tags Removal
Conditions:
Rosacea, Skin Cancer, Acne, Alopecia Areata, Atopic Dermatitis, Candidiasis, Contact Dermatitis, Dermatitis, Melanoma, Plantar Warts, Psoriasis, Skin and Subcutaneous Infections, Tinea Pedis, Tinea Unguium, Varicose Veins
Languages:
Chinese, English
Description:
Dr. Miller graduated from the University of California, Davis School of Medicine in 1978. She works in Palo Alto, CA and 1 other location and specializes in Dermatology. Dr. Miller is affiliated with El Camino Hospital, Stanford Hospital and Washington Hospital.

Anne E. Miller

Specialties:
Ophthalmology
Work:
Cheyenne Eye Clinic
1300 E 20 St, Cheyenne, WY 82001
307-6347765 (phone) 307-6356510 (fax)
Education:
Medical School
University of Colorado School of Medicine at Denver
Graduated: 1996
Procedures:
Lens and Cataract Procedures, Ophthalmological Exam
Conditions:
Acute Conjunctivitis, Cataract, Diabetic Retinopathy, Glaucoma, Keratitis, Macular Degeneration, Primary Angle-Closure Glaucoma, Retinal Detachments
Languages:
English
Description:
Dr. Miller graduated from the University of Colorado School of Medicine at Denver in 1996. She works in Cheyenne, WY and specializes in Ophthalmology. Dr. Miller is affiliated with Cheyenne Regional Medical Center East.

Anne M. Miller

Specialties:
Psychiatry, Neurology
Work:
Pollak Mental Health Clinic
75 N Bath Ave, Long Branch, NJ 07740
732-9236500 (phone) 732-9235277 (fax)
Barnabas Medical GroupMonmouth Medical Group Psychiatry
300 2 Ave STE W107, Long Branch, NJ 07740
732-9236912 (phone) 732-2294562 (fax)
Robert R Angels MD
211 Essex St STE 102, Hackensack, NJ 07601
201-6461200 (phone) 201-6461206 (fax)
Education:
Medical School
Ohio University College of Osteopathic Medicine
Graduated: 1993
Procedures:
Psychiatric Diagnosis or Evaluation, Psychiatric Therapeutic Procedures
Conditions:
Anxiety Phobic Disorders, Attention Deficit Disorder (ADD), Depressive Disorders, Post Traumatic Stress Disorder (PTSD), Anxiety Dissociative and Somatoform Disorders, Bipolar Disorder, Obsessive-Compulsive Disorder (OCD), Schizophrenia
Languages:
English
Description:
Dr. Miller graduated from the Ohio University College of Osteopathic Medicine in 1993. She works in Hackensack, NJ and 2 other locations and specializes in Psychiatry and Neurology. Dr. Miller is affiliated with Hackensack University Medical Center and Monmouth Medical Center.

Anne Marie K. Miller

Specialties:
Pediatrics, Adolescent Medicine
Work:
Castle Rock Pediatrics
1001 S Perry St STE 101B, Castle Rock, CO 80104
303-6882228 (phone) 303-6630640 (fax)
Education:
Medical School
Loyola University Chicago Stritch School of Medicine
Graduated: 2003
Conditions:
Acute Bronchitis, Acute Conjunctivitis, Acute Pharyngitis, Acute Sinusitis, Acute Upper Respiratory Tract Infections, Allergic Rhinitis, Atopic Dermatitis, Attention Deficit Disorder (ADD), Bronchial Asthma, Croup, Otitis Media, Plantar Warts, Skin and Subcutaneous Infections
Languages:
English, German, Spanish
Description:
Dr. Miller graduated from the Loyola University Chicago Stritch School of Medicine in 2003. She works in Castle Rock, CO and specializes in Pediatrics and Adolescent Medicine. Dr. Miller is affiliated with Castle Rock Adventist Hospital and Sky Ridge Medical Center.

Anne H. Miller

Specialties:
Obstetrics & Gynecology
Work:
San Juan Womens Health
655 W Pinon St, Farmington, NM 87401
505-6092590 (phone) 505-6092595 (fax)
Languages:
English, Spanish
Description:
Ms. Miller works in Farmington, NM and specializes in Obstetrics & Gynecology. Ms. Miller is affiliated with San Juan Regional Medical Center.

Anne M. Miller

Specialties:
Psychiatry
Work:
St Agnes Outpatient Behavioral Health
430 E Division St, Fond du Lac, WI 54935
920-9264200 (phone)
Languages:
English
Description:
Dr. Miller works in Fond Du Lac, WI and specializes in Psychiatry. Dr. Miller is affiliated with St Agnes Hospital.

License Records

Anne L Miller

Licenses:
License #: DH01045 - Expired
Category: Dental
Issued Date: Jul 23, 1986
Expiration Date: Jan 1, 1993
Type: Dental Hygienist

Anne C Miller

Address:
4706 S Pittsburg, Spokane, WA
Phone:
253-2094092
Licenses:
License #: 488742 - Expired
Category: Health Care
Issued Date: Aug 1, 1969
Effective Date: Apr 29, 2016
Expiration Date: Apr 30, 2016
Type: Registered Nurse

Anne Miller resumes & CV records

Resumes

Anne Miller Photo 60

Anne Miller - Columbus, OH

Work:
mediu LLC Jan 2014 to 2000
User Experience Designer / Motion Graphics Artist Nationwide Insurance Jan 2013 to 2000
Specialist, User Experience Design Rocket Launcher Interactive May 2012 to 2000
Concept Artist/ Environment Artist MindLeaders E-Learning - Dublin, OH Oct 2011 to Dec 2012
Media Designer/Text Developer Microsoft Game Studios through VOLT - Redmond, WA Jun 2010 to Jun 2011
Video Editor, Software Tester Cleveland MOCA - Bowling Green, OH Jan 2009 to May 2009
Environment Artist / Concept Artist
Education:
Bowling Green State University - Bowling Green, OH 2005 to 2009
Bachelor of Fine Arts in Digital Arts Sylvania Southview High School - Sylvania, OH 2001 to 2005
Diploma
Skills:
Experience developing E-Learning videos for internal employees as well as other businesses around the world. Managing schedules and training new employees for entry level work. 6 years of creative work in Autodesk Maya developing 3D environment models, architectural models, texturing and lighting. 6+ years experience in Adobe After Effects, Bridge, Flash, Photoshop, and Illustrator. Experience in Audacity and Adobe Audition. Knowledge of HTML, Javascript, ActionScript 3.0, CSS, and some PHP. Skills in Autodesk Maya developing character rigging, animation, and rendering. Basic knowledge of particle animation 11 years of experience in landscape painting with acrylics and oils as well as drawing in graphite. 6 years of lighting and set design for a stage environment. Knowledge of the Spanish language.
Anne Miller Photo 61

Anne Miller - New Braunfels, TX

Work:
Owen Goodnight Middle School Aug 2010 to Present
6th Grade Math Interventionist Lyndon B Johnson Elementary - Odessa, TX Aug 2009 to May 2010
6th Grade Science Teacher Carino's Restaurant - Tyler, TX Jan 2009 to Aug 2009
Server State Farm Insurance - Tumwater, WA Sep 2007 to Dec 2008
Insurance Representative LeMay Mobile Shredding - Lacey, WA Mar 2007 to Sep 2007
Office Assistant
Education:
Martin's University - Lacey, WA Jul 2009 to Jun 2010
Bachelor's in Marketing Lamar University - Lamar, TX
Master's in School Counseling

Publications & IP owners

Wikipedia

Anne Miller Photo 68

Mary Alcock

… She nursed her parents through long illnesses until their deaths and cared for her seven nieces after the death of her sister Elizabeth Hughes in 1770. A widow by the early 1780s, she moved to Bath, Somerset, where she was part of the literary circle of Lady Anne Miller (17411781). She enga...

Us Patents

Method And Chemistry For Cleaning Of Oxidized Copper During Chemical Mechanical Polishing

US Patent:
6443814, Sep 3, 2002
Filed:
Sep 24, 2001
Appl. No.:
09/962428
Inventors:
Anne E. Miller - Portland OR
A. Daniel Feller - Portland OR
Kenneth C. Cadien - Portland OR
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
H01L 21302
US Classification:
451 41, 134 3, 134 28, 134902
Abstract:
Methods for the chemical-mechanical polishing (CMP) of copper layers on integrated circuits are described, along with the chemical compositions of various pre- and post-polishing solutions. In one embodiment, a pre-polish cleaning operation with a complexing organic acid buffer system is performed prior to the CMP of the copper. In alternative embodiments, a rinse operation is performed subsequent to the cleaning operation and prior to the CMP. In further alternatives, a post-polish cleaning operation with a chelating agent is performed. In still further alternatives, the pH of a pre-polish cleaner is ramped during the pre-polish cleaning operation to match the pH of the polish slurry which is used, subsequent to the cleaning operation, to remove excess portions of the copper layer to be polished.

Method And Chemistry For Cleaning Of Oxidized Copper During Chemical Mechanical Polishing

US Patent:
6464568, Oct 15, 2002
Filed:
Dec 4, 2000
Appl. No.:
09/729609
Inventors:
Anne E. Miller - Portland OR
A. Daniel Feller - Portland OR
Kenneth C. Cadien - Portland OR
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
H01L 21302
US Classification:
451 41, 134 3, 134 28, 134902
Abstract:
Methods for the chemical-mechanical polishing (CMP) of copper layers on integrated circuits are described, along with the chemical compositions of various pre- and post-polishing solutions. In one embodiment, a pre-polish cleaning operation with a complexing organic acid buffer system is performed prior to the CMP of the copper. In alternative embodiments, a rinse operation is performed subsequent to the cleaning operation and prior to the CMP. In further alternatives, a post-polish cleaning operation with a chelating agent is performed. In still further alternatives, the pH of a pre-polish cleaner is ramped during the pre-polish cleaning operation to match the pH of the polish slurry which is used, subsequent to the cleaning operation, to remove excess portions of the copper layer to be polished.

Method Of Forming A Raised Contact For A Substrate

US Patent:
6596640, Jul 22, 2003
Filed:
Jun 21, 2002
Appl. No.:
10/177539
Inventors:
Paul B. Fishcer - Portland OR
James A. Boardman - Hillsboro OR
Anne E. Miller - Portland OR
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
H01L 21302
US Classification:
438692, 438750, 438754, 438455, 438 7, 438 10, 438 16, 438 17
Abstract:
The present invention includes a method of providing a first substrate; forming an insulator over the first substrate; forming an opening in the insulator; forming a conductor over the insulator and in the opening; removing the conductor over the insulator with a first chemical-mechanical polish process to leave the conductor in the opening; and reducing thickness of the insulator with a second chemical-mechanical process to permit the conductor in the opening to protrude. The present invention further includes a structure having such a conductor that protrudes.

Method And Chemistry For Cleaning Of Oxidized Copper During Chemical Mechanical Polishing

US Patent:
6719614, Apr 13, 2004
Filed:
Jan 9, 2002
Appl. No.:
10/044378
Inventors:
Anne E. Miller - Portland OR
A. Daniel Feller - Portland OR
Kenneth C. Cadien - Portland OR
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
B24B 100
US Classification:
451 41, 451285, 510175, 252 791
Abstract:
Methods for the chemical-mechanical polishing (CMP) of copper layers on integrated circuits are described, along with the chemical compositions of various pre- and post-polishing solutions. In one embodiment, a pre-polish cleaning operation with a complexing organic acid buffer system is performed prior to the CMP of the copper. In alternative embodiments, a rinse operation is performed subsequent to the cleaning operation and prior to the CMP. In further alternatives, a post-polish cleaning operation with a chelating agent is performed. In still further alternatives, the pH of a pre-polish cleaner is ramped during the pre-polish cleaning operation to match the pH of the polish slurry which is used, subsequent to the cleaning operation, to remove excess portions of the copper layer to be polished.

Slurry For Polishing A Barrier Layer

US Patent:
6719920, Apr 13, 2004
Filed:
Nov 30, 2001
Appl. No.:
10/002855
Inventors:
Anne E. Miller - Portland OR
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
C09K 1300
US Classification:
252 791, 252 794, 438692
Abstract:
A slurry is described that comprises a mixture of between about 0. 01 mole and about 0. 1 mole per liter of an organic acid salt, between about 1% to about 20% by volume of an abrasive, and an oxidizer.

Slurry And Method For Chemical Mechanical Polishing Of Copper

US Patent:
6740591, May 25, 2004
Filed:
Nov 16, 2000
Appl. No.:
09/715282
Inventors:
Anne E. Miller - Portland OR
A. Daniel Feller - Portland OR
Kenneth C. Cadien - Portland OR
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
H01L 21302
US Classification:
438692, 438693, 252 791
Abstract:
A copper polish slurry, for chemical mechanical polishing of copper and copper diffusion barriers may be formed by combining a chelating, organic acid buffer system such as citric acid and potassium citrate; and an abrasive, such as for example colloidal silica. Alternative copper polish slurries, in accordance with the present invention, may be formed by further combining an oxidizer, such as hydrogen peroxide, and/or a corrosion inhibitor such as benzotriazole. Advantageous properties of slurries in accordance with the present invention include the enhancement of Cu removal rates to 3000 angstroms per minute. This high polish rate is achieved while maintaining local pH stability and substantially reducing global and local corrosion as compared to prior art copper polish slurries. Local pH stability provides for reduced within-wafer non-uniformity and reduced corrosion defects. Furthermore, copper diffusion barriers such as tantalum or tantalum nitride may also be polished with such slurries wherein the oxidizer is not included.

Ceric-Ion Slurry For Use In Chemical-Mechanical Polishing

US Patent:
6752844, Jun 22, 2004
Filed:
Mar 29, 1999
Appl. No.:
09/280268
Inventors:
Anne E. Miller - Portland OR
A. Daniel Feller - Portland OR
Kenneth C. Cadien - Portland OR
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
C09C 168
US Classification:
51307, 51308, 51309, 438691, 438692, 438693
Abstract:
The invention provides a chemical-mechanical polishing slurry comprising a liquid, cerium ions as an oxidizer, an abrasive, and a pH increasing substance. The cerium ions are in the liquid in a quantity equal to the inclusion of at least 0. 02 molar ammonium cerium nitrate in the liquid. The abrasive is also included in the liquid. The liquid, the cerium ions and the abrasive jointly have a first pH value. The pH increasing substance increases the first pH value to a second pH value above 1. 5.

Copper Polish Slurry For Reduced Interlayer Dielectric Erosion And Method Of Using Same

US Patent:
6787061, Sep 7, 2004
Filed:
Nov 16, 2000
Appl. No.:
09/715690
Inventors:
Anne E. Miller - Portland OR
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
C09K 1300
US Classification:
252 791, 252 794, 438692
Abstract:
Slurries for use in the chemical mechanical polishing (CMP) of copper and copper diffusion barriers that reduce pattern sensitive erosion of an underlying dielectric layer include at least one surfactant. Inclusion of surfactants, such as cetyltrimethylammonium bromide in a slurry mixture can reduce pattern sensitive erosion of dielectric materials such as silicon oxide, and fluorinated oxides of silicon that would otherwise occur during CMP of copper and copper diffusion barriers as is typical in the formation of copper interconnect lines in integrated circuits.

Isbn (Books And Publications)

Demystifying Chipmaking

Author:
Anne K. Miller
ISBN #:
0750677600

365 Sales Tips For Winning Business

Author:
Anne Miller
ISBN #:
0399524193

Presentation Jazz: How To Make Your Sales Presentations $Ing!

Author:
Anne Miller
ISBN #:
0814479626

Checklist Of Nineteenth Century Australian Colonial Statistical Sources: Censuses, Blue Books, And Statistical Registers

Author:
Anne Miller
ISBN #:
0949776106

365 Trucos Para Vender Mas: Aumente Las Ventas Cada Dia Del Ano

Author:
Anne Miller
ISBN #:
8480883634

Labor Arbitrator Development: A Handbook

Author:
Anne Harmon Miller
ISBN #:
0871794306

Possible Relatives

Cynthia R Miller  David Miller  A J Miller  Cyril W Miller  Cyrilla D Miller  Cyrus W Miller  D E Miller  Anne C Johnson  Anne M Johnston  Anne L Stanfill 

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