BackgroundCheck.run
Search For

Arthur G Lam, 4533 Musket Ln, Pittsford, NY 14534

Known as:
Arthur L Lam
Related to:
Chung F Lam 88 Angel Huang

Arthur Lam Phones & Addresses

33 Musket Ln, Pittsford, NY 14534   

Oakland, CA   

West Henrietta, NY   

Berkeley, CA   

Castro Valley, CA   

Buffalo, NY   

Rochester, NY   

San Pablo, CA   

151 Lakeside Dr APT 213, Oakland, CA 94612   

Work

Company: Merlin magic corporation Address: 520 E. Weddell Drive Suite 10, Sunnyvale, CA 94089 Phones: 408-9807078 Position: Coo Industries: Elementary and Secondary Schools
Get Report
Control this profile

Mentions for Arthur G Lam

Arthur Lam resumes & CV records

Resumes

Arthur Lam Photo 34

Happy Golfer

Location:
San Francisco Bay Area
Industry:
Computer Networking
Arthur Lam Photo 35

Arthur Lam

Location:
San Francisco Bay Area
Industry:
Semiconductors
Skills:
Semiconductors, Process Integration, SPC, MEMS, Design of Experiments, Silicon, Failure Analysis, Characterization, Mixed Signal, Thin Films, Product Engineering, Semiconductor Industry, IC, Yield
Arthur Lam Photo 36

Arthur Lam

Publications & IP owners

Us Patents

Single Field Zero Mask For Increased Alignment Accuracy In Field Stitching

US Patent:
8440372, May 14, 2013
Filed:
Feb 3, 2011
Appl. No.:
13/020773
Inventors:
Arthur Lam - Fremont CA, US
Assignee:
Micrel, Inc. - San Jose CA
International Classification:
G03F 1/42
US Classification:
430 5, 430 22
Abstract:
A single field photomask includes a first set of targets formed on a first side of the photomask, and a second set of targets formed on a second side of the photomask, opposite the first side. In operation, the photomask is to be applied to a wafer without any alignment marks. The photomask forms a first set of alignment marks in the wafer from the first set of targets, and the photomask further forms a second set of alignment marks in the wafer from the second set of targets. The first set of alignment marks is used to align to a first field mask and the second set of alignment marks is used to align to a second field mask to stitch an image of the first field mask to an image of the second field mask.

Single Field Zero Mask For Increased Alignment Accuracy In Field Stitching

US Patent:
8563202, Oct 22, 2013
Filed:
Apr 17, 2013
Appl. No.:
13/864895
Inventors:
Arthur Lam - Fremont CA, US
Assignee:
Micrel, Inc. - San Jose CA
International Classification:
G03F 9/00
G03C 5/00
US Classification:
430 22, 430312, 430328, 430394
Abstract:
A method for stitching a first field mask to a second field mask on a wafer includes providing a photomask with a first set of targets and a second set of targets, printing images of the first set of targets and the second set of targets onto the wafer where the photomask is applied to the wafer having no previous alignment marks formed thereon for the photomask to align to. A first set of alignment marks is formed from the first set of targets and a second set of alignment marks is formed from the second set of targets. The method includes aligning a first field mask to the first set of alignment marks and aligning a second field mask to the second set of alignment marks. The images of the first field mask and the second field mask are thereby stitched together on the wafer.

Method And System To Provide A Polysilicon Capacitor With Improved Oxide Integrity

US Patent:
2009013, May 21, 2009
Filed:
Nov 20, 2007
Appl. No.:
11/942895
Inventors:
Arthur Lam - Fremont CA, US
Assignee:
Micrel, Inc. - San Jose CA
International Classification:
H01L 21/20
US Classification:
438381, 257E21008
Abstract:
A system and method in accordance with the present invention allows for an improved oxide integrity of a polysilicon capacitor compared to capacitors manufactured using conventional semiconductor processing techniques. This is accomplished by moving the capacitor implant step to a time after the deposition of the polysilicon. As an additional benefit, a separate capacitor oxide growth does not need to be performed.

Isbn (Books And Publications)

Anesthetic Management Of Acute Head Injury

Author:
Arthur M. Lam
ISBN #:
0070361274

Essentials Of Anesthesiology

Author:
Arthur M. Lam
ISBN #:
0721610420

Essentials Of Anesthesiology

Author:
Arthur M. Lam
ISBN #:
0721630847

Essentials Of Anesthesiology

Author:
Arthur M. Lam
ISBN #:
0721666752

Possible Relatives

Cynthia S Lam  David K Lam  Dean H Lam  Deborah T Lam  Danh Lam  Daniel M Lam  Deliris Lam  Arthur J Johnson  Arthur E Stamps  Arthur A Johnston 

NOTICE: You may not use BackgroundCheck or the information it provides to make decisions about employment, credit, housing or any other purpose that would require Fair Credit Reporting Act (FCRA) compliance. BackgroundCheck is not a Consumer Reporting Agency (CRA) as defined by the FCRA and does not provide consumer reports.