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August J Fischer, 851527 Baguette Dr, Castle Rock, CO 80108

August Fischer Phones & Addresses

1527 Baguette Dr, Castle Rock, CO 80108    206-2013206   

6395 Windfield Ave, Parker, CO 80134    303-8411709    303-8412065   

Bainbridge Island, WA   

Dallas, TX   

Plano, TX   

Addison, TX   

Mentions for August J Fischer

Career records & work history

License Records

August J Fischer

Licenses:
License #: 32WI00486500 - Expired
Category: Cosmetology and Hairstyling
Issued Date: Jan 1, 1902
Expiration Date: Sep 20, 1996
Type: Barber

August J Fischer

Licenses:
License #: 32WI00486500 - Expired
Category: Cosmetology and Hairstyling
Issued Date: Jan 1, 1902
Expiration Date: Sep 20, 1996
Type: Barber

August Fischer resumes & CV records

Resumes

August Fischer Photo 19

August Fischer

Skills:
Microsoft Office, Management, Leadership, Microsoft Excel
August Fischer Photo 20

August Fischer

Publications & IP owners

Us Patents

Bi-Layer Etch Stop Process For Defect Reduction And Via Stress Migration Improvement

US Patent:
7199047, Apr 3, 2007
Filed:
May 28, 2004
Appl. No.:
10/857150
Inventors:
Tae S. Kim - Dallas TX, US
Jin Zhao - Plano TX, US
Nathan J. Kruse - McKinney TX, US
August J. Fischer - Dallas TX, US
Ralf B. Willecke - Dallas TX, US
Assignee:
Texas Instruments Incorporated - Dallas TX
International Classification:
H01L 21/4763
US Classification:
438637, 438638, 438672, 438700
Abstract:
A method of forming a film stack in an integrated circuit, said method comprising depositing a layer of silicon carbide adjacent a first layer of dielectric material, depositing a layer of silicon nitride adjacent the layer of silicon carbide, and depositing a second layer of dielectric material adjacent the layer of silicon nitride.

Bi-Layer Etch Stop Process For Defect Reduction And Via Stress Migration Improvement

US Patent:
7423344, Sep 9, 2008
Filed:
Feb 26, 2007
Appl. No.:
11/678967
Inventors:
Tae S. Kim - Dallas TX, US
Jin Zhao - Plano TX, US
Nathan J. Kruse - Colorado Springs CO, US
August J. Fischer - Dallas TX, US
Ralf B. Willecke - Dallas TX, US
Assignee:
Texas Instruments Incorporated - Dallas TX
International Classification:
H01L 23/48
US Classification:
257754, 257755, 257756
Abstract:
A method of forming a film stack in an integrated circuit, said method comprising depositing a layer of silicon carbide adjacent a first layer of dielectric material, depositing a layer of silicon nitride adjacent the layer of silicon carbide, and depositing a second layer of dielectric material adjacent the layer of silicon nitride.

Methods For Chemical Vapor Deposition Of Tungsten On Silicon Or Dielectric

US Patent:
6641867, Nov 4, 2003
Filed:
Mar 25, 1999
Appl. No.:
09/276043
Inventors:
August J. Fischer - Dallas TX
Assignee:
Texas Instruments Incorporated - Dallas TX
International Classification:
B05D 512
US Classification:
427255392, 427 99, 4274191, 4274197
Abstract:
In situ nitridation of a thin layer of either silicon or tungsten provides an adhesive layer for bulk deposition of tungsten. Alternatively, a thin layer of silicon can be deposited directly on a dielectric, then reacted with WF6 to replace the silicon with tungsten, which provides a nucleation layer for bulk tungsten deposition.

Isbn (Books And Publications)

Arabische Chrestomathie Aus Prosaschriftstellern

Author:
August Fischer
ISBN #:
3447024488

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