Benjamin John Murray, 483677 NW Poehler Ter, Portland, OR 97229

2018027, Sep 27, 2018

Dec 29, 2017

15/858264

- Milpitas CA, US
Benjamin Murray - Portland OR, US
Shishir Suman - Bihar, IN
Lisheng Gao - Saratoga CA, US

G06T 7/00
G06T 7/73
G06F 17/50

Systems and methods of a two-pass inspection methodology that dynamically creates micro care areas for inspection of repeater defects. Micro care areas can be formed around each location of a repeater defect. After inspection, additional repeater defects in the micro care areas can be identified. Attributes of the repeater defects can be compared and any repeater defects with attributes that deviate from an expected group attribute distribution can be classified as nuisance.

2018013, May 10, 2018

Nov 6, 2017

15/804980

- Milpitas CA, US
Eugene Shifrin - Sunnyvale CA, US
Ashok Mathew - Fremont CA, US
Chetana Bhaskar - San Jose CA, US
Lisheng Gao - Saratoga CA, US
Santosh Bhattacharyya - San Jose CA, US
Hucheng Lee - Cupertino CA, US
Benjamin Murray - Portland OR, US

G06T 7/00
G01N 21/95

Systems and methods for detecting defects on a reticle are provided. One system includes computer subsystem(s) that include one or more image processing components that acquire images generated by an inspection subsystem for a wafer, a main user interface component that provides information generated for the wafer and the reticle to a user and receives instructions from the user, and an interface component that provides an interface between the one or more image processing components and the main user interface. Unlike currently used systems, the one or more image processing components are configured for performing repeater defect detection by applying a repeater defect detection algorithm to the images acquired by the one or more image processing components, and the repeater defect detection algorithm is configured to detect defects on the wafer using a hot threshold and to identify the defects that are repeater defects.