Billy Jack Stanbery, 725404 Abilene Trl, Austin, TX 78749

6500733, Dec 31, 2002

Sep 20, 2001

09/957132

Billy J. Stanbery - Austin TX

HelioVolt Corporation - Austin TX

H01L 2130

438459, 438455, 438763, 156289, 419 45

Systems and methods are described for synthesis of films, coatings or layers using precursor exerted pressure containment. A method includes exerting a pressure between a first precursor layer that is coupled to a first substrate and a second precursor layer that is coupled to a second substrate; forming a composition layer; and moving the first substrate relative to the second substrate, wherein the composition layer remains coupled to the second substrate.

6559372, May 6, 2003

Sep 20, 2001

09/957121

Billy J. Stanbery - Austin TX

Heliovolt Corporation - Austin TX

H01L 310256

136252, 136264, 136265, 136262, 136256, 257431, 257184

Systems and methods are described for compositions, apparatus and/or electronic devices. A composition, includes a composition layer defining a first surface and a second surface, the composition layer including a collection layer that is located closer to the first surface than to the second surface. An apparatus, includes a semiconductor absorber layer defining a first surface and a second surface; and an electrode layer coupled to the first surface of the semiconductor absorber layer, wherein the semiconductor absorber layer includes a collection layer that is located closer to the first surface than to the second surface. A electronic device includes a semiconductor structure for absorbing, the semiconductor structure for absorbing defining a first surface and a second surface; and an electrode structure for conducting coupled to the second surface of the semiconductor structure, where the semiconductor structure includes a collection layer that is located closer to the first surface than to the second surface.

6593213, Jul 15, 2003

Sep 20, 2001

09/957207

Billy J. Stanbery - Austin TX

Heliovolt Corporation - Austin TX

H01L 2120

438478, 438102, 438103, 438455, 438459, 438604, 438603, 438466, 438468

Systems and methods are described for synthesis of films, coatings or layers using electrostatic fields. A method includes applying an electrostatic field across a first precursor layer that is coupled to a first substrate and a second precursor layer that is coupled to a second substrate; forming a composition layer; and moving the first substrate relative to the second substrate, wherein the composition layer remains coupled to the second substrate.

6720239, Apr 13, 2004

Jul 17, 2002

10/197052

Billy J. Stanbery - Austin TX

Heliovoit Corporation - Austin TX

H01L 2130

438459, 1563063, 156344

Systems and methods are described for synthesis of films, coatings or layers using precursor exerted pressure containment. A method includes exerting a pressure between a first precursor layer that is coupled to a first substrate and a second precursor layer that is coupled to a second substrate; forming a composition layer; and moving the first substrate relative to the second substrate, wherein the composition layer remains coupled to the second substrate.

6736986, May 18, 2004

Sep 20, 2001

09/957050

Billy J. Stanbery - Austin TX

Heliovolt Corporation - Austin TX

H01B 1300

216 13, 438459, 438455, 438763, 427516, 427574, 2041921

Systems and methods are described for a chemical reaction synthesis of films, coatings or layers using surfactants. A method includes providing a surfactant as an impurity within at least one of a first precursor layer that is coupled to a first substrate and a second precursor layer that is coupled to a second substrate; forming a composition layer; and moving the first substrate relative to the second substrate, wherein the composition layer remains coupled to the second substrate. The first precursor layer includes a first chemical reactant, the second precursor layer includes a second chemical reactant, and the composition layer includes a chemical product yielded by a chemical reaction between the first chemical reactant and the second chemical reactant.

6787012, Sep 7, 2004

Sep 20, 2001

09/957125

Billy J. Stanbery - Austin TX, 78749-2334

C23C 1434

20429824, 20429823, 20429825, 118715, 118718, 118719

Systems and methods are described for synthesis of films, coatings or layers. An apparatus includes a first holder; a second holder coupled to the first holder; a linkage coupled to the first holder and the second holder to move the first holder relative to the second holder; a reusable tool coupled to the first holder, the reusable tool including a raised patterned surface; and a release layer coupled to the raised patterned surface of the reusable tool.

6797874, Sep 28, 2004

Jul 17, 2002

10/197051

Billy J. Stanbery - Austin TX

Heliovolt Corporation - Austin TX

H01L 3100

136252, 136264, 257184, 257431, 156285

Systems and methods are described for synthesis of films, coatings or layers using precursor exerted pressure containment. A method includes exerting a pressure between a first precursor layer that is coupled to a first substrate and a second precursor layer that is coupled to a second substrate; forming a composition layer; and moving the first substrate relative to the second substrate, wherein the composition layer remains coupled to the second substrate.

6881647, Apr 19, 2005

Sep 20, 2001

09/957123

Billy J. Stanbery - Austin TX, US

HelioVolt Corporation - Austin TX

H01L021/30

438455

Systems and methods are described for synthesis of films, coatings or layers using templates. A method includes locating a template within at least one of a first precursor layer that is coupled to a first substrate and a second precursor layer that is coupled to a second substrate; forming a composition layer; and moving the first substrate relative to the second substrate, wherein the composition layer remains coupled to the second substrate.