Carl A Chiulli, 42Warwick, RI

6485839, Nov 26, 2002

May 12, 2000

09/570074

Pradnya V. Nagarkar - Newton MA
James T. Richard - Upton MA
Linda S. Heath - Acton MA
Carl A. Chiulli - Randolph MA
Radha Sen - Foxboro MA
Jyothsna Ram - Ormskirk, GB
David W. McCarthy - Woburn MA

3M Innovative Properties Company - St. Paul MN

B32B 1508

428461, 428469, 428689, 204193

An ablatable laminar imaging medium useful in the manufacture of a substantially transparent electrode assembly is disclosed. The laminar imaging medium comprises a substrate, a high-index metal oxide layer, an ablatable metallic conductive layer, a high-index conductive metal oxide layer, and an ablation enhancement layer. The ablation enhancement layer has an IR-absorption greater than the IR-absorption of said high-index conductive metal oxide layer and an IR-reflectivity less than the IR-reflectivity of said high-index conductive metal oxide layer. Presence in the laminar imaging medium of the ablation enhancement layer lowers the exposure threshold of the medium and improves ablation accuracy, bothâwhen occasioned in the manufacture of LCD electrode patternsâresulting collectively and ultimately in a more reliably formed electrical architecture, less susceptible to unwanted âshortingâ.

5059500, Oct 22, 1991

Oct 10, 1990

7/595211

Christopher R. Needham - Beverly MA
Carl A. Chiulli - Randolph MA
Stephen F. Clark - North Andover MA

Polaroid Corporation - Cambridge MA

G03F 900
G03C 1825

430 7

A filter is formed on a substrate, such as a solid state imager, by providing successively on the substrate a layer of an absorber material, a layer of a barrier material, and a layer of a photoresist material. The photoresist is patternwise exposed and developed, thereby baring regions of the barrier layer underlying selected regions of the photoresist layer. The coated substrate is reactive ion etched under a first set of etching conditions to etch away the bared regions of the barrier layer and to bare but not substantially etch the underlying regions of the absorber layer, and then reactive ion etched under a second set of etching conditions, thereby etching away the remaining regions of the photoresist layer and the bared regions of the absorber layer, so forming a filter on the substrate. To form multi-colored filters, the process may be repeated with a different dye, or additional dyes may be deposited by other processes, such as that described in U. S. Pat. No. 4,808,501.

5652612, Jul 29, 1997

Feb 12, 1996

8/599871

Carl A. Chiulli - Randolph MA
Yalan Mao - Lexington MA
William T. Plummer - Concord MA

Polaroid Corporation - Cambridge MA

B41J 247
G01D 1534
G02B 2600
G02B 2700

347256

Apparatus and methods for exposing multilayered thermal imaging by proper optimization of the exposing radiation angle of incidence of a coherent radiation source to eliminate "cloud" or "woodgrain" artifacts stemming from local differences in printing efficiency across a sheet of the multilayered imaging media. A media is mounted to an exposure surface and exposed with a scanning coherent Gaussian laser beam at an angle other than normal incidence. The angle of incidence of the exposing beam is intentionally made large enough so that all rays with high reflectance loss are paired with equally many with low reflectance loss to increase printing efficiency. This efficiency occurs over a range of angles between 21 and 25 degrees, with some benefit beginning at 16 degrees.

4808501, Feb 28, 1989

May 15, 1987

7/050743

Carl A. Chiulli - Randolph MA

Polaroid Corporation, Patent Dept. - Cambridge MA

G03F 900

430 7

A color filter is formed on a support, such as a charge coupled device, by (a) forming a layer on a support with a composition comprising a positive photoresist and a dye; said dye being soluble in the solvent of said photoresist; (b) exposing predetermined portions of said layer to radiation adapted to increase the solubility of said coating in the exposed areas; (c) developing said exposed areas to form a pattern of filter elements; and (d) repeating said steps with a different color dye in said composition; wherein said dye constitutes in excess of 10% by weight, dry basis of said composition, is substantially non-absorptive in the exposure wavelength of said composition, and provides predetermined absorptive characteristics for the specified filter element and said dye possessing substantially the same polarity as said composition.

4652412, Mar 24, 1987

Jun 14, 1985

6/744540

Carl A. Chiulli - Randolph MA

Polaroid Corporation - Cambridge MA

C08J 926
B29C 5902

264 49

A surface-type microporous filter is prepared by embossing substantially uniform holes in an embossable polymer carried on a porous support wherein the pores are filled with a soluble filler. Subsequent to the embossing step, the filler is removed by dissolution.

5137844, Aug 11, 1992

Apr 5, 1991

7/681146

Carl A. Chiulli - Randolph MA

Polaroid Corporation - Cambridge MA

H01L 2120
H01L 21268

437129

The electromagnetic radiation output from a solid-state radiation emitter is adjusted by covering at least part of the emission surface with an absorber material which absorbs the radiation emitted from the emitter, and directing a beam of radiation from outside the radiation emitter on to the absorber material so as to ablate at least part of the absorber material from the emission surface, or render at least part of the absorber material transmissive of the electromagnetic radiation from the emitter. The process is especially useful for equalizing the outputs from an array of emitters, such as a bar of light emitting diodes.

5667920, Sep 16, 1997

Mar 11, 1996

8/613849

Carl A. Chiulli - Randolph MA
John E. MacLatchy - Dover NH
Harris R. Miller - Boston MA

Polaroid Corporation - Cambridge MA

G02B 520
G02F 11335
G03F 700

430 7

A substrate (typically a solid state imager or a liquid crystal display device) is provided with a filter by forming a layer of photoresist on the substrate, and exposing and developing the photoresist to produce filter elements from the portions of the layer of photoresist remaining after the development. After development of the layer of photoresist, the substrate is treated with a silylation compound capable of cross-linking the photoresist and of promoting adhesion of the photoresist to the substrate. A preferred silylation compound is hexamethylcyclotrisilizane.

5900902, May 4, 1999

Jul 28, 1997

8/901707

Carl A. Chiulli - Randolph MA
Yalan Mao - Lexington MA
William T. Plummer - Concord MA

Polaroid Corporation - Cambridge MA

B41J 247
G01D 1534

347256

Apparatus and methods for exposing multilayered thermal imaging media to eliminate "cloud" or "woodgrain" artifacts by proper optimization of the exposing radiation angle of incidence. The exposure angle of incidence is large enough so that all rays with high reflectance loss are paired with equally many with low reflectance loss to increase printing efficiency.