Carlos Caminos resumes & CV records
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Carlos B Caminos, 83820 Kossuth St, Freemansburg, PA 18017
Carlos Caminos Phones & Addresses
820 Kossuth St, Bethlehem, PA 18017 610-8073570
Freemansburg, PA
Allentown, PA
26 Katz Ave, Paterson, NJ 07522
Prospect Park, NJ
Clifton, NJ
Rutherford, NJ
Lyndhurst, NJ
1245 Highland Ave, Bethlehem, PA 18018
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Carlos B Caminos
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Graduate or professional degree
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Publications & IP owners
Us Patents
Process For Fabricating A Projection Electron Lithography Mask And A Removable, Reusable Cover For Use Therein
US Patent:
6372393, Apr 16, 2002
Filed:
May 15, 2001
Appl. No.:
09/854753
Inventors:
Carlos G. Caminos - Lyndhurst NJ
Chester S. Knurek - Linden NJ
Anthony E. Novembre - Martinsville NJ
Chester S. Knurek - Linden NJ
Anthony E. Novembre - Martinsville NJ
Assignee:
Agere Systems Guardian Corp. - Orlando FL
International Classification:
G03F 900
US Classification:
430 5, 359511
Abstract:
A removable, reusable cover constructed such that its geometry matches the geometry of the active region of a projection electron lithography mask to be protected and does not etch in the plasma environment used to remove a photoresist. The cover protects the active region of the projection electron lithography mask, but does not contact the active region. A technique for fabricating a projection electron lithography mask utilizing the removable, reusable cover, where the geometry of the cover is matched to the geometry of an active region of the projection electron lithography mask to be protected. During fabrication of the projection electron lithography mask, the cover protects the active region of the projection electron lithography mask from the plasma environment, but does not contact the active region.
Process For Fabricating A Projection Electron Lithography Mask And A Removable Reusable Cover For Use Therein
US Patent:
6251543, Jun 26, 2001
Filed:
Jun 14, 1999
Appl. No.:
9/332061
Inventors:
Carlos G. Caminos - Lyndhurst NJ
Chester S. Knurek - Linden NJ
Anthony E. Novembre - Martinsville NJ
Chester S. Knurek - Linden NJ
Anthony E. Novembre - Martinsville NJ
Assignee:
Agere Systems Guardian Corp. - Miami Lakes FL
International Classification:
G03F 900
US Classification:
430 5
Abstract:
A removable, reusable cover constructed such that its geometry matches the geometry of the active region of a projection electron lithography mask to be protected and does not etch in the plasma environment used to remove a photoresist. The cover protects the active region of the projection electron lithography mask, but does not contact the active region. A technique for fabricating a projection electron lithography mask utilizing the removable, reusable cover, where the geometry of the cover is matched to the geometry of an active region of the projection electron lithography mask to be protected. During fabrication of the projection electron lithography mask, the cover protects the active region of the projection electron lithography mask from the plasma environment, but does not contact the active region.
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