BackgroundCheck.run
Search For

Carrie L Guthrie, 561107 30Th Street Rd UNIT A10, Greeley, CO 80631

Known as:
Carrie Lee Guthrie Carrie Guthre Isidra Carrillo
Related to:
Mariana Carrillo 30

Carrie Guthrie Phones & Addresses

2810 Clay St, Alameda, CA 94501   

2103 Alameda Ave, Alameda, CA 94501   

1321 Webster St #D219, Alameda, CA 94501   

Greeley, CO   

Oakland, CA   

3027 Hillegass Ave, Berkeley, CA 94705   

25 Kerr Ave, Berkeley, CA 94707    510-5283995   

2615 Shasta Rd, Berkeley, CA 94708   

Kensington, CA   

Chicago, IL   

Education

Degree: High school graduate or higher

Languages

English
Get Report
Control this profile

Mentions for Carrie L Guthrie

Career records & work history

Medicine Doctors

Carrie Guthrie Photo 1

Carrie L Guthrie, Berkeley CA - LCSW

Specialties:
Social Work
Clinical Social Work
Address:
2222 Bancroft Way Suite 4300, Berkeley, CA 94720
510-6429334 (Phone)
Languages:
English

Carrie Guthrie resumes & CV records

Resumes

Carrie Guthrie Photo 13

Carrie Guthrie

Skills:
Microsoft Office, Microsoft Excel, Management
Carrie Guthrie Photo 14

Carrie Guthrie

Carrie Guthrie Photo 15

Carrie Guthrie

Carrie Guthrie Photo 16

Carrie Guthrie

Location:
United States

Publications & IP owners

Us Patents

Fbar Mass Loading Process Using Selective Dry Etching

US Patent:
2004018, Sep 30, 2004
Filed:
Mar 31, 2003
Appl. No.:
10/403368
Inventors:
David Hula - Fort Collins CO, US
Carrie Guthrie - Fort Collins CO, US
Ronnie Varghese - Fort Collins CO, US
Stephen Miller - Fort Collins CO, US
Jennifer Bradford - Corvallis OR, US
International Classification:
H03H009/54
US Classification:
333/188000, 333/189000, 310/312000
Abstract:
A method and apparatus is presented. The method produces a Film Bulk Acoustic Resonator (FBAR) structure. A piezoelectric layer is provided and a series of manufacturing steps are performed to deposit a thin mass-load layer above the piezoelectric layer. Further, an electrode material is deposited on the thin mass-load layer after portions of the thin mass-load layer have been removed. The electrode material includes a non-mass-loaded region positioned above the piezoelectric layer and a mass-loaded region positioned above the mass-load layer.

Possible Relatives

Cynthia F Guthrie  David W Guthrie  Dea C Guthrie  Dale L Guthrie  Debbie Guthrie  Dallas J Guthrie  Dan R Guthrie  Carrie A Johnson  Carrie D Johnston  Carrie L Stanford 

NOTICE: You may not use BackgroundCheck or the information it provides to make decisions about employment, credit, housing or any other purpose that would require Fair Credit Reporting Act (FCRA) compliance. BackgroundCheck is not a Consumer Reporting Agency (CRA) as defined by the FCRA and does not provide consumer reports.