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Charles R Keil, 6226322 Towne Centre Dr #416, El Toro, CA 92610

Charles Keil Phones & Addresses

26322 Towne Centre Dr #416, Foothill Ranch, CA 92610    949-8601685   

126 California Ct, Mission Viejo, CA 92692    949-8601685   

34542 Calle Cambio, Capistrano Beach, CA 92624   

33775 Mariana Dr #2, Dana Point, CA 92629    949-3181453   

Tustin, CA   

Rancho Santa Margarita, CA   

San Clemente, CA   

Redondo Beach, CA   

Laguna Beach, CA   

126 California Ct, Mission Viejo, CA 92692    949-3181453   

Work

Position: Administration/Managerial

Education

Degree: Associate degree or higher

Emails

Mentions for Charles R Keil

Career records & work history

Lawyers & Attorneys

Charles Keil Photo 1

Charles Keil - Lawyer

Specialties:
Family Law
ISLN:
905971641
Admitted:
1900
University:
University of Pennsylvania, 1955
Law School:
University of Pennsylvania, J.D., 1961

Charles Keil resumes & CV records

Resumes

Charles Keil Photo 24

Charles Keil

Charles Keil Photo 25

Chemist At Deft Inc.

Location:
Orange County, California Area
Industry:
Aviation & Aerospace

Publications & IP owners

Us Patents

Conveyorized Vacuum Applicator And Method Of Applying A Dry Film Resist To A Printed Circuit Board

US Patent:
6585837, Jul 1, 2003
Filed:
Aug 25, 2000
Appl. No.:
09/648445
Inventors:
Charles R. Keil - Foothill Ranch CA
Osvaldo Novello - Albazzate, IT
Assignee:
Shipley Company, L.L.C. - Marlborough MA
International Classification:
B29C 6500
US Classification:
156 64, 156286, 156285, 156299
Abstract:
An improved method of and apparatus that is continuously automatically operative in an in-line system is described for applying under heat, vacuum and mechanical pressure a dry film photoresist-forming layer to printed circuit boards ( ) that already have been prelaminated by the loose application thereto of the dry film resist as discrete cut sheets within the confines of the surface of the boards whereby a laminate without entrapped air bubbles and closely conforming to the raised circuit traces and irregular surface contours of the printed circuit board is obtained. Featured is a conveyorized vacuum laminator ( ) comprising heated upper and lower platens ( ) adapted to be moved into sealing engagement to form a vacuum lamination chamber ( ), and disposed between the platens are two independent belt conveyor systems ( ) that act as heat shields to prevent the printed circuit board and the loosely applied dry film from being heated up too rapidly in the vacuum chamber by the residual heat given off by the upper and lower platens before the film can be completely evacuated. This prevents premature tacking of the dry film to the board and enables all of the air entrapped between the film and the board surface to be drawn off before the application of heat and mechanical pressure, so as to ensure complete conformance of the dry film around the circuit traces and surface contours.

Conveyorized Vacuum Applicator And Method Of Applying A Dry Film Resist To A Printed Circuit Board

US Patent:
6610459, Aug 26, 2003
Filed:
Aug 25, 2000
Appl. No.:
09/648428
Inventors:
Charles R. Keil - Foothill Ranch CA
Osvaldo Novello - Albazzate, IT
Roberto Stanich - Milan, IT
Assignee:
Shipley Company, L.L.C. - Marlborough MA
International Classification:
G03F 716
US Classification:
430311, 430319, 428901
Abstract:
An improved method of and apparatus that is continuously automatically operative in an in-line system is described for applying under vacuum, heat and mechanical pressure a dry film photoresist-forming layer to printed circuit boards ( ) that already have been prelaminated by the loose application thereto of the dry film resist as discrete cut sheets within the confines of the surface of the boards whereby a laminate without entrapped air bubbles and closely conforming to the raised circuit traces and irregular surface contours of the printed circuit board is obtained. Featured is a conveyorized vacuum applicator ( ) comprising two independent vacuum lamination chambers ( ) in end-to-end relation. The first vacuum chamber operates at ambient temperature to draw off all of the air entrapped between the dry film resist and the surface of the printed circuit board at conditions that do not result in premature tacking of the dry film to the surface of the board. Then, in the second vacuum chamber, the photoresist-forming layer is immediately laminated to the printed circuit board under heat and mechanical pressure.

Conveyorized Vacuum Applicator And Method Of Applying A Dry Film Resist To A Printed Circuit Board

US Patent:
6679307, Jan 20, 2004
Filed:
Jul 3, 2002
Appl. No.:
10/190384
Inventors:
Charles R. Keil - Foothill Ranch CA
Osvaldo Novello - Albazzate, IT
Assignee:
Shipley Company, L.L.C. - Marlborough MA
International Classification:
B32B 3100
US Classification:
156351, 156358, 156359, 156361, 156367, 156368
Abstract:
An improved method of and apparatus that is continuously automatically operative in an in-line system is described for applying under heat, vacuum and mechanical pressure a dry film photoresist-forming layer to printed circuit boards ( ) that already have been prelaminated by the loose application thereto of the dry film resist as discrete cut sheets within the confines of the surface of the boards whereby a laminate without entrapped air bubbles and closely conforming to the raised circuit traces and irregular surface contours of the printed circuit board is obtained. Featured is a conveyorized vacuum laminator ( ) comprising heated upper and lower platens ( ) adapted to be moved into sealing engagement to form a vacuum lamination chamber ( ), and disposed between the platens are two independent belt conveyor systems ( ) that act as heat shields to prevent the printed circuit board and the loosely applied dry film from being heated up too rapidly in the vacuum chamber by the residual heat given off by the upper and lower platens before the film can be completely evacuated. This prevents premature tacking of the dry film to the board and enables all of the air entrapped between the film and the board surface to be drawn off before the application of heat and mechanical pressure, so as to ensure complete conformance of the dry film around the circuit traces and surface contours.

Conveyorized Vacuum Applicator And Method Of Applying A Dry Film Resist To A Printed Circuit Board

US Patent:
6971429, Dec 6, 2005
Filed:
Dec 11, 2002
Appl. No.:
10/316316
Inventors:
Charles R Keil - Foothill Ranch CA, US
Osvaldo Novello - Albazzate, IT
Roberto Stanich - Milan, IT
Assignee:
Shipley Company, L.L.C. - Marlborough MA
International Classification:
B32B031/20
US Classification:
156382, 156351, 156362, 156363, 156367, 156538, 156556, 156566, 156580, 1565831, 1565833
Abstract:
An improved method of and apparatus that is continuously automatically operative in an in-line system is described for applying under vacuum, heat and mechanical pressure a dry film photoresist-forming layer to printed circuit boards () that already have been prelaminated by the loose application thereto of the dry film resist as discrete cut sheets within the confines of the surface of the boards whereby a laminate without entrapped air bubbles and closely conforming to the raised circuit traces and irregular surface contours of the printed circuit board is obtained. Featured is a conveyorized vacuum applicator () comprising two independent vacuum lamination chambers () in end-to-end relation. The first vacuum chamber operates at ambient temperature to draw off all of the air entrapped between the dry film resist and the surface of the printed circuit board at conditions that do not result in premature tacking of the dry film to the surface of the board. Then, in the second vacuum chamber, the photoresist-forming layer is immediately laminated to the printed circuit board under heat and mechanical pressure.

Functionalized Polymer

US Patent:
2003016, Aug 28, 2003
Filed:
Feb 15, 2003
Appl. No.:
10/368985
Inventors:
Robert Barr - Shrewsbury MA, US
Charles Keil - Mission Viejo CA, US
Steven Luboviski - Anaheim CA, US
Assignee:
Shipley Company, L.L.C. - Marlborough MA
International Classification:
G03F007/038
US Classification:
430/270100, 430/284100
Abstract:
A functionalized polymer containing a main chain derived from polyerizable monomers and pendent functional groups derived from isocyanates terminated with or ethylenically or acetyenically unsaturated groups. The functionalized polymer forms a good film and may be employed in industries where film forming polymers are used. Such industries include lithography, adhesives, electrophotoimaging, and the like. The functionalized polymers are self cross-linking and are suitable for use as polymer binders in both primary and secondary photoimaging compositions.

Method Of Producing A Resist Pattern By Contact Imaging A Photoimageable Composition Providing A Tack-Free Surface

US Patent:
5698376, Dec 16, 1997
Filed:
Mar 20, 1996
Appl. No.:
8/618873
Inventors:
James J. Briguglio - Balboa CA
Charles R. Keil - Rancho Santa Margarita CA
Vinai Ming Tara - Anaheim CA
Edward J. Reardon - Laguna Nigel CA
Randall W. Kautz - Irvine CA
Assignee:
Morton International, Inc. - Chicago IL
International Classification:
G03C 500
US Classification:
430325
Abstract:
In a method of providing a resist pattern on a substrate surface, a layer of photoimageable composition is applied to a substrate, which photoimageable composition provides a tack-free surface. The photoimageable composition comprises: A) between about 25 and about 75 wt % of a binder polymer, B) between about 20 and about 60 wt % of a photopolymerizeable material which is a multifunctional photopolymerizeable monomer or short chain oligomer, and C) between about 2 and about 20 wt % of a photoinitiator chemical system (the weight percentages are based on the total weight of components A)-C)). The binder polymer A) comprises a backbone formed of between about 45 and about 65 mole percent of monomers which are selected from the group i) consisting of styrene, C. sub. 1 14 C. sub. 6 -substituted styrene and mixtures thereof and between about 35 and about 55 mole percent of monomers which are selected from the group ii) consisting of maleic anhydride, alkyl-substituted maleic anhydride, aromatic-substituted maleic anhydride and mixtures thereof. Monomers of group ii) provide anhydride groups to the backbone of the polymer.

Esterified Styrene/Maleic Anhydride Polymer

US Patent:
5773518, Jun 30, 1998
Filed:
Aug 15, 1997
Appl. No.:
8/911890
Inventors:
Charles R. Keil - Foothill Ranch CA
Randall William Kautz - Irvine CA
Assignee:
Morton International, Inc. - Chicago IL
International Classification:
C08F 814
US Classification:
5253277
Abstract:
A binder polymer is a styrene/maleic anhydride copolymer in which the maleic anhydride residues are mono-esterified to between about 50 and about 65 mole percent of an alkyl, aryl, cycloalkyl, alkaryl, or arylalkyl alcohol having a molecular weight greater than 100, to between about 15 and about 50 mole percent of a C. sub. 1 -C. sub. 3 -alkyl alcohol, and to at least about 80 mole percent total. The polymer has between about 45 and about 65 mole percent styrene residues and between about 35 and about 55 mole percent maleic anhydride residues, a weight average molecular weight of between about 80,000 and about 200,000, and an acid number of between about 170 and about 220.

Photoimageable Composition Having Improved Alkaline Process Resistance And Tack-Free Surface For Contact Imaging

US Patent:
5609991, Mar 11, 1997
Filed:
Aug 3, 1995
Appl. No.:
8/510836
Inventors:
James J. Briguglio - Balboa CA
Charles R. Keil - Rancho Santa Margarita CA
Vinai M. Tara - Anaheim CA
Edward J. Reardon - Laguna Nigel CA
Randall W. Kautz - Irvine CA
Assignee:
Morton International, Inc. - Chicago IL
International Classification:
G03C 173
US Classification:
4302811
Abstract:
A photoimageable composition, useful as a photoresist for forming a printed circuit board, is both alkaline aqueous developable but, subsequent to exposure and development, is processable in highly alkaline environments, such as additive plating baths and ammoniacal etchants. The photoimageable composition is tack-free and is resistance to polymerization inhibition by oxygen, and is therefore particularly suitable for contact printing. The photoimageable composition comprises A) between about 25 and about 75 wt % of a binder polymer, B) between about 20 and about 60 wt % of a photopolymerizeable material which is a multifunctional photopolymerizeable monomer or short chain oligomer, and C) between about 2 and about 20 wt % of a photoimageable chemical system, the weight percentages being based on the total weight of components A)-C). The improvement is the use in the photoimageable composition of a binder polymer A) which is a styrene/maleic anhydride copolymer in which the incorporated maleic anhydride units are mono-esterified to between about 50 and about 65 mole percent of an alkyl, aryl, cycloalkyl, alkaryl, or arylalkyl alcohol having a molecular weight greater than 100, to between about 15 and about 50 mole percent of a C. sub. 1 -C. sub. 3 -alkyl alcohol, and to at least about 80 mole percent total.

Isbn (Books And Publications)

Mathematical Models For Estimating Occupational Exposure To Chemicals

Author:
Charles B. Keil
ISBN #:
0932627994

Music Grooves: Essays And Dialogues

Author:
Charles Keil
ISBN #:
0226429563

Urban Blues

Author:
Charles Keil
ISBN #:
0226429601

The Tiv Song: The Sociology Of Art In A Classless Society

Author:
Charles Keil
ISBN #:
0226429628

Music Grooves: Essays And Dialogues

Author:
Charles Keil
ISBN #:
0226429571

Tiv Song: The Sociology Of Art In A Classless Society

Author:
Charles Keil
ISBN #:
0226429636

My Music

Author:
Charles Keil
ISBN #:
0819552577

My Music

Author:
Charles Keil
ISBN #:
0819562645

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