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Daniel S Aubin, 521250 Lemonwood Ave, Deland, FL 32724

Daniel Aubin Phones & Addresses

1250 Lemonwood Ave, Deland, FL 32724    386-7369178    386-5478914   

612 New York Ave, Deland, FL 32720    904-8224674   

Peabody, MA   

Acushnet, MA   

Orlando, FL   

1250 Lemonwood Ave, Deland, FL 32724    386-7369178   

Work

Position: Administrative Support Occupations, Including Clerical Occupations

Education

Degree: Bachelor's degree or higher

Emails

Mentions for Daniel S Aubin

Daniel Aubin resumes & CV records

Resumes

Daniel Aubin Photo 37

Director Of Chat Operations

Location:
1000 Southern Blvd, West Palm Beach, FL 33405
Industry:
Automotive
Work:
Gubagoo Oct 2013 - May 2014
Director of Sales, Southeast Region
Gubagoo Oct 2013 - May 2014
Director of Chat Operations
Dmeautomotive Oct 2010 - Sep 2013
Director of Inside Account Management
Skills:
Account Management
Daniel Aubin Photo 38

Daniel Aubin

Location:
United States
Daniel Aubin Photo 39

Interim President, Pope John Paul Ii High School, Boca Raton, Florida

Position:
Interim President at Pope John Paul II High School
Location:
Boca Raton, Florida
Industry:
Education Management
Work:
Pope John Paul II High School - Boca Raton, Florida 33431 since Jul 2012
Interim President
Trinity Catholic High School - Ocala Jul 2009 - Jun 2012
President
Education:
Boston College 1994 - 1995
M.Ed.

Publications & IP owners

Us Patents

Using A Lewis Base To Control Molecular Weight Of Novolak Resins

US Patent:
5614349, Mar 25, 1997
Filed:
Dec 29, 1992
Appl. No.:
7/997942
Inventors:
M. Dalil Rahman - Warwick RI
Daniel P. Aubin - Rockville RI
Dana L. Durham - East Greenwich RI
Ralph R. Dammel - Coventry RI
Assignee:
Hoechst Celanese Corporation - Somerville NJ
International Classification:
G03F 7023
C08G 804
US Classification:
430169
Abstract:
The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a precise and consistent molecular weight, by adjusting the concentration of Lewis base. A method is also provided for producing photoresist composition from such novolak resins and for producing semiconductor devices using such photoresist compositions.

Metal Ion Reduction In The Raw Materials And Using A Lewis Base To Control Molecular Weight Of Novolak Resin To Be Used In Positive Photoresists

US Patent:
5476750, Dec 19, 1995
Filed:
Dec 29, 1992
Appl. No.:
7/999500
Inventors:
M. Dalil Rahman - Warwick RI
Ping-Hung Lu - Bridgewater NJ
Daniel P. Aubin - Rockville RI
Ralph R. Dammel - Coventry RI
Dana L. Durham - East Greenwich RI
Assignee:
Hoechst Celanese Corporation - Somerville NJ
International Classification:
G03F 700
G03C 172
C08G 804
C02F 142
US Classification:
430270
Abstract:
The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a very low level of metal ions and a substantially consistent molecular weight. A method is also provided for producing photoresist composition from such novolak resins and for producing semiconductor devices using such photoresist compositions.

Method Of Using A Lewis Base To Control Molecular Weight Of Novolak Resins

US Patent:
5688893, Nov 18, 1997
Filed:
Dec 20, 1996
Appl. No.:
8/771715
Inventors:
M. Dalil Rahman - Warwick RI
Daniel P. Aubin - Rockville RI
Dana L. Durham - East Greenwich RI
Ralph R. Dammel - Coventry RI
Assignee:
Hoechst Celanese Corporation - Somerville NJ
International Classification:
C08G 804
G03F 7023
US Classification:
528146
Abstract:
The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a precise and consistent molecular weight, by adjusting the concentration of Lewis base. A method is also provided for producing photoresist composition from such novolak resins and for producing semiconductor devices using such photoresist compositions.

Isbn (Books And Publications)

Plasticite: Poesie

Author:
Daniel Aubin
ISBN #:
2894231695

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