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Daniel J Heenan, 721 Balsam Ct, Clifton, NJ 07014

Known as:
Daniel Irrevocable Heenan Daniel P Heenan Dan J Heenan Daniel J Villanova

Daniel Heenan Phones & Addresses

1 Balsam Ct, Clifton, NJ 07014    973-7772356   

New City, NY   

5 Roosevelt Pl, Montclair, NJ 07042    973-7447963   

Wilmington, NC   

Nanuet, NY   

233 N Main St, New City, NY 10956   

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Mentions for Daniel J Heenan

Career records & work history

License Records

Daniel P Heenan

Licenses:
License #: 129 - Expired
Category: Registered Alcohol and Other Drug Abuse Counselor
Issued Date: Apr 14, 2003
Expiration Date: Apr 30, 2007

Daniel Heenan resumes & CV records

Resumes

Daniel Heenan Photo 15

Independent Information Technology And Services Professional

Location:
Greater New York City Area
Industry:
Information Technology and Services
Daniel Heenan Photo 16

Daniel Heenan

Location:
United States
Daniel Heenan Photo 17

Daniel Heenan

Publications & IP owners

Wikipedia

Daniel Heenan Photo 18

Daniel Heenan

Daniel Heenan (born 17 November 1981) is an Australian rugby union footballer. His usual position is at flanker/lock. He used to play for the Brumbies in the Super 14
Daniel Heenan Photo 19

Gps Rugby

Based at Ashgrove in Brisbane, Queensland, Jeeps has produced 29 Wallabies including Ben Tune, Daniel Herbert, Matt Cockbain, and Daniel Heenan, along

Us Patents

Planarization System And Method Using A Carbonate Containing Fluid

US Patent:
7214623, May 8, 2007
Filed:
Oct 13, 2003
Appl. No.:
10/605610
Inventors:
Donald J. Delehanty - Wappingers Falls NY, US
James W. Hannah - Ossining NY, US
Daniel M. Heenan - Lagrangeville NY, US
Fen F. Jamin - Wappingers Falls NY, US
Laertis Economikos - Wappingers Falls NY, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
H01L 21/302
US Classification:
438691, 438692, 438693, 51308, 451 36
Abstract:
Disclosed herein are a system and method of polishing a layer of a substrate. The disclosed method includes providing a polishing apparatus adapted to impart relative movement between a polishing pad and a substrate having a first layer to be polished; providing a liquid medium having a pH between 4 and 11 to an interface between the substrate and the polishing pad, the liquid medium including a pH controlling substance including at least one of an acid and a base, a carbonate and a stabilizer additive comprising at least one selected from the group consisting of amino acids and polyacrylic acid; and moving at least one of the substrate and the polishing pad relative to the other to polish the layer of the substrate.

Possible Relatives

Debra J Heenan  Dianne M Heenan  Edward J Heenan  Ernestine M Heenan  Evelyn A Heenan  Francis J Heenan  James M Heenan  Daniel G Last  Daniel J Johnson  Daniel W Stamps 

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