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Daniel A Lev, 4717 Ivaloo St APT 7, Somerville, MA 02143

Daniel Lev Phones & Addresses

17 Ivaloo St APT 7, Somerville, MA 02143   

Belmont, MA   

Chicago, IL   

Cambridge, MA   

San Diego, CA   

San Clemente, CA   

Evanston, IL   

West Covina, CA   

Waltham, MA   

Work

Company: FastCAP Systems Address: 21 Drydock Ave # 8, Boston, MA 02210 Specialities: Patent Application - 60% • Intellectual Property - 40%

Education

Degree: JD School / High School: Northwestern University School of Law

Ranks

Licence: Massachusetts - Active Date: 2007

Mentions for Daniel A Lev

Career records & work history

Lawyers & Attorneys

Daniel Lev Photo 1

Daniel A. Lev, Boston MA - Lawyer

Address:
FastCAP Systems
21 Drydock Ave # 8, Boston, MA 02210
857-2397500 (Office)
Licenses:
Massachusetts - Active 2007
Education:
Northwestern University School of LawDegree JDGraduated 2007
Brandeis UniversityDegree BSGraduated 1998
Specialties:
Patent Application - 60%
Intellectual Property - 40%

Medicine Doctors

Daniel Lev Photo 2

Daniel Mathew Lev

Specialties:
Ophthalmology
Education:
Vanderbilt University (1961) Surgery
Daniel Lev Photo 3

Daniel M Lev

Specialties:
Ophthalmology

Daniel Lev resumes & CV records

Resumes

Daniel Lev Photo 31

Associate At Finnegan, Henderson, Farabow, Garrett & Dunner, Llp

Location:
Greater Boston Area
Industry:
Law Practice
Daniel Lev Photo 32

Daniel Lev

Daniel Lev Photo 33

Daniel Lev

Daniel Lev Photo 34

Daniel Lev

Location:
United States

Publications & IP owners

Us Patents

Method Of Restricted Purification Of Carbon Dioxide

US Patent:
2004007, Apr 22, 2004
Filed:
Oct 17, 2002
Appl. No.:
10/273810
Inventors:
Daniel Alvarez - San Diego CA, US
Jeffrey Spiegelman - San Diego CA, US
Russell Holmes - Santee CA, US
Daniel Lev - San Diego CA, US
International Classification:
C01B031/20
US Classification:
423/437100
Abstract:
A method for decontaminating fluid carbon dioxide for use in a product production process such as carbonated beverage production is disclosed. Contaminants, including those normally highly resistant to removal such as S, N, P and Si compounds (especially COS), are removed from the COby contact with a metal oxide decontamination agent. The metal oxide is one or more oxides of transition metal elements including lanthanides, the iron oxides being preferred. Decontamination of the COis interrupted at intervals for regeneration of the metal oxide agent by passage of COcontaining an oxygen-containing contaminant over the metal oxide in a countercurrent flow direction at higher temperature for a short time. The metal oxide decontaminant may also be mixed with a high-silica content zeolite, preferably a Zeolite Y or zeolite ZSM-5. The contaminated COand the COcontaining an oxygen-containing contaminant are preferably from the same source.

Hydride Gas Purification For The Semiconductor Industry

US Patent:
2006018, Aug 24, 2006
Filed:
Jul 21, 2004
Appl. No.:
10/565353
Inventors:
Daniel Alvarez - San Diego CA, US
Jeffrey Spiegelman - San Diego CA, US
Joshua Cook - Encinitas CA, US
Tram Nguyen - Westminster CA, US
Daniel Lev - San Diego CA, US
Troy Scoggins - San Diego CA, US
International Classification:
B01D 47/00
US Classification:
423210000
Abstract:
A method for hydride gas purification uses materials having at least one lanthanide metal or lanthanide metal oxide. The method reduces contaminants to less than 100 parts per billion (ppb), preferably 10 ppb, more preferably 1 ppb. The material can also include transition metals and transition metal oxides, rare earth elements and other metal oxides. The invention also includes materials for use in the method of the invention.

Compositions And Methods For Facilitating Reaction At Room Temperature

US Patent:
2007002, Feb 8, 2007
Filed:
Apr 2, 2004
Appl. No.:
10/552249
Inventors:
Douglas Grotjahn - San Diego CA, US
Daniel Lev - Chicago IL, US
Assignee:
San Diego State University Foundation - San Diego CA
International Classification:
H01B 1/12
US Classification:
252500000
Abstract:
Compositions and methods useful in facilitating or conducting a reaction at effective conditions, such as room temperature (e.g. about 70 degrees F.), utilize a compound including at least two different heteroatoms, and optionally a heterocycle, and a transition metal. The compound is effective in facilitating a variety of reactions including hydrolysis reactions, alcoholysis reactions, aminolysis reactions, carbon dioxide conversion reactions, hydroamination reactions, hydration reactions, and the like.

Apparatus And Method For Purification Of Corrosive Gas Streams

US Patent:
2007003, Feb 8, 2007
Filed:
Jun 23, 2004
Appl. No.:
10/559070
Inventors:
Daniel Alvarez - San Diego CA, US
Daniel Lev - Chicago IL, US
Jeffrey Spiegelman - San Diego CA, US
Tram Nguyen - Westminster CA, US
Russell Holmes - Santee CA, US
International Classification:
C01F 11/22
C01F 5/28
US Classification:
423490000, 423210000
Abstract:
A process, composition and apparatus for the removal of impurities from corrosive gases, particularly halogen-containing gases, down to about 100 ppb concentration are described. The critical component is zirconia (ZrO), which in a variety of physical forms is capable of dehydrating such gases. The zirconia can be in the form of a coating on a substrate, as a granular bulk material, or deposited within the pores of a porous body. The zirconia is retained in a simple container which is easily installed in a gas supply line, such as to a gas- or vapor-deposition manufacturing unit. The purification process can be operated for long periods of time in the presence of these gases. The invention provides final purification to gas streams intended for gas- or vapor-deposition formation of high purity electronic, prosthetic or similar products, and can be used in combination with a preliminary dehydration process or a solid particulate removal unit upstream.

Isbn (Books And Publications)

Legal Evolution And Political Authority In Indonesia: Selected Essays

Author:
Daniel Lev
ISBN #:
9041114211

Islamic Courts In Indonesia: A Study In The Political Bases Of Legal Institutions

Author:
Daniel S. Lev
ISBN #:
0520021738

Making Indonesia

Author:
Daniel S. Lev
ISBN #:
0877277192

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