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Xiang J Xue, 5211 Mohawk St, Boston, MA 02127

Known as:
Jia X Xue Jia Xiang Xue Xiang Xue Jia Tia X Xue Jia Xjang

Xiang Xue Phones & Addresses

Boston, MA   

Raynham, MA   

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Xiang Xue resumes & CV records

Resumes

Xiang Xue Photo 25

Technician Lead

Location:
Westwood, MA
Industry:
Chemicals
Work:
Nano-C, Inc.
Technician Lead Nano-C, Inc.
Project Manager Nano-C, Inc.
Senior Research Development Scientist Boston College May 2003 - Apr 2008
Research Assistant Nanjing University Sep 1999 - Jun 2002
Research Assistant
Education:
Boston College 2002 - 2008
Doctorates, Doctor of Philosophy, Philosophy, Organic Chemistry Nanjing University 南京大学 1995 - 2002
Masters, Chemistry
Skills:
Chemistry, Characterization, R&D, Nmr, Organic Chemistry, Materials, Materials Science, Organic Synthesis, Spectroscopy, Hplc, Research, Uv/Vis, Nanotechnology, Research and Development, Organometallic Chemistry, Catalysis, Mass Spectrometry, Analytical Chemistry, Nanomaterials, Lc Ms, Chromatography, Scanning Electron Microscopy, Purification, Science, Ir, Polymer Chemistry, Powder X Ray Diffraction, Surface Chemistry, Polymers, Ftir, Gas Chromatography, Gc Ms, Thin Films, Nanoparticles, Column Chromatography, Afm, Coatings, Inorganic Chemistry, Design of Experiments, Tga, Chemdraw, Electrochemistry, Ir Spectroscopy, Synthetic Organic Chemistry, Scifinder, X Ray Crystallography, Physical Chemistry, Computational Chemistry, Tem, Nmr Spectroscopy
Languages:
Mandarin
English
Xiang Xue Photo 26

Xiang Xue

Location:
Medford, MA
Industry:
Investment Management
Education:
Tufts University 2006 - 2007
Xiang Xue Photo 27

Xiang Dong Xue

Xiang Xue Photo 28

Associate Consultant / Analyst

Location:
Greater Boston Area
Industry:
Management Consulting

Publications & IP owners

Us Patents

Composition Of Matter And Molecular Resist Made Therefrom

US Patent:
2015014, May 21, 2015
Filed:
Oct 21, 2014
Appl. No.:
14/520037
Inventors:
Alex Philip Graham Robinson - Northfield, GB
Dongxu Yang - Selly Oak Birmingham, GB
Andreas Frommhold - Anger, DE
Thomas Lada - Somerville MA, US
John L. Roth - Cohasset MA, US
Xiang Xue - Winchester MA, US
International Classification:
G03F 7/027
G03F 7/004
C07D 245/02
C07D 487/14
C07D 498/14
US Classification:
4302701, 540579, 540578, 540470, 540567, 546 84, 544250
Abstract:
Disclosed and claimed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV);wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein Ris a saturated or unsaturated group having from 1-4 carbon atoms, Ris chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, Ris a saturated or unsaturated group having from 1-4 carbon atoms, and Ris a saturated or unsaturated group having from 1-4 carbon atoms.

Composition Of Matter And Molecular Resist Made Therefrom

US Patent:
2015014, May 21, 2015
Filed:
Oct 21, 2014
Appl. No.:
14/519924
Inventors:
Alex Philip Graham Robinson - Northfield, GB
Dongxu Yang - Selly Oak Birmingham, GB
Andreas Frommhold - Anger, DE
Thomas Lada - Somerville, MA, US
John L. Roth - Cohasset MA, US
Xiang Xue - Winchester MA, US
International Classification:
G03F 7/027
US Classification:
4302851
Abstract:
Disclosed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); at least one photo acid generator; at least one crosslinker; and at least one solvent;wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein Ris a saturated or unsaturated group having from 1-4 carbon atoms, Ris chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, Ris a saturated or unsaturated group having from 1-4 carbon atoms, and Ris a saturated or unsaturated group having from 1-4 carbon atoms.

Possible Relatives

David T Xue  Fang C Xue  Fei Y Xue  Haihui Xue  Jian Z Xue  Jun Xue  Kevin Xue  Xiang U Meng  Xiang G Liu  Xiang Xu 

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