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David Eric Hoglund, 6017 Henderson St, Arlington, MA 02474

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17 Henderson St, Arlington, MA 02474    781-6465988   

15 Henderson St, Arlington, MA 02474   

2005 E Beverly Rd, Milwaukee, WI 53211    978-2394117   

63 Dimick St, Somerville, MA 02143    617-6230764    617-6236351   

63 Dimick St #2, Somerville, MA 02143    617-6230764   

Toledo, OH   

17 Henderson St, Arlington, MA 02474    978-2394117   

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Resumes

David Hoglund Photo 18

Software Control Engineer

Location:
Milwaukee, WI
Industry:
Semiconductors
Work:
Axcelis Technologies
Software Control Engineer
Johnson Controls
Building Efficiency Engineer at Johnson Controls, Inc
Advanced Ion Beam Technology Dec 2012 - Dec 2014
Beamline Systems Engineer
Varian Semiconductor Sep 2010 - Dec 2012
Principal Systems Engineer
Renault 1996 - 1996
Marketing Intern
Education:
Harvard University 1988 - 1996
Doctorates, Doctor of Philosophy, Applied Physics
Virginia Tech 1983 - 1988
Bachelors, Bachelor of Science, Electrical Engineering
Skills:
Design of Experiments, Data Analysis, Semiconductors, Characterization, Simulations, Materials Science, Physics, Semiconductor Industry, Electronics, Materials, Silicon, Cmos, Ion Implantation, Vacuum, Process Simulation, Sputtering, Systems Engineering, Photolithography, Failure Analysis, Metrology, Thin Films, Optics, Engineering Management
Languages:
French
David Hoglund Photo 19

David Hoglund

David Hoglund Photo 20

David Hoglund

David Hoglund Photo 21

Beamline Systems Engineer At Advanced Ion Beam Technology, Inc.

Position:
Beamline Systems Engineer at Advanced Ion Beam Technology, Inc.
Location:
Greater Boston Area
Industry:
Semiconductors
Work:
Advanced Ion Beam Technology, Inc. - Danvers, Mass since Dec 2012
Beamline Systems Engineer
Varian Semiconductor Equipment Associates (VSEA) - Gloucester, Mass Sep 2010 - Dec 2012
Principal Systems Engineer
Axcelis Technologies Jul 2003 - Sep 2010
Principal Software Engineer
Axcelis Technologies 1996 - Jul 2003
Senior Applications Engineer
Renault 1996 - 1996
marketing intern
Education:
Harvard University 1988 - 1996
PhD, Applied Physics
Virginia Polytechnic Institute and State University 1983 - 1988
BS, Electrical Engineering
Skills:
Design of Experiments, Data Analysis, Semiconductors, Characterization, Simulations, Materials Science, Physics

Publications & IP owners

Us Patents

Controlled Dose Ion Implantation

US Patent:
2006005, Mar 16, 2006
Filed:
Sep 14, 2004
Appl. No.:
10/940263
Inventors:
Aditya Agarwal - Newburyport MA, US
Robert Rathmell - Murphy TX, US
David Hoglund - Arlington MA, US
International Classification:
C23C 14/00
H01J 7/24
US Classification:
427523000, 315111810, 118729000, 118722000
Abstract:
An ion implanter for creating a ribbon or ribbon-like beam by having a scanning device that produces a side to side scanning of ions emitting by a source to provide a thin beam of ions moving into an implantation chamber. A workpiece support positions a workpiece within the implantation chamber and a drive moves the workpiece support up and down through the thin ribbon beam of ions perpendicular to the plane of the ribbon to achieve controlled beam processing of the workpiece. A control includes a first control output coupled to said scanning device to limit an extent of side to side scanning of the ion beam to less than a maximum amount and thereby limit ion processing of the workpiece to a specified region of the workpiece and a second control output coupled to the drive simultaneously limits an extent of up and down movement of the workpiece to less than a maximum amount and to cause the ion beam to impact a controlled portion of the workpiece.

Systems And Methods For Automatically Configuring An Ip Network

US Patent:
2020007, Mar 5, 2020
Filed:
Jan 11, 2019
Appl. No.:
16/246396
Inventors:
- Auburn Hills WI, US
David E. Hoglund - Shorewood WI, US
Xin Zhang - Hartland WI, US
Assignee:
Johnson Controls Technology Company - Auburn Hills WI
International Classification:
H04L 12/24
H04L 12/46
H04L 12/935
H04L 12/28
H04L 29/12
Abstract:
Systems and methods for automatically configuring an Internet Protocol (IP) network are provided. The system can receive inputs including information specific to a building automation system (BAS) and information specific to the IP network. The system can identify network controllers and BAS devices supervised by the network controllers. The system can allocate BAS devices supervised by the network controllers to subnets and access switches. The system can consolidate two or more subnets under the same switch when determining that the two or more subnets can be consolidated under the same switch. The system can perform IP planning for the IP network and can generate a tailored configuration file for each access switch and aggregation switch in the IP network.

Systems And Methods Related To Diagnostics For Ethernet Rings Based On Media Redundancy Protocol

US Patent:
2018016, Jun 14, 2018
Filed:
Dec 12, 2016
Appl. No.:
15/376565
Inventors:
- Plymouth MI, US
David E. Hoglund - Shorewood WI, US
Assignee:
Johnson Controls Technology Company - Plymouth MI
International Classification:
H04L 12/26
H04L 12/43
H04L 12/733
Abstract:
A system and method of identifying faulted devices in an Ethernet network of a building management system (BMS). The system includes a network manager device, a first client device, and a second client device. A first port of the first client device is connected to a first port of the network manager device, a first port of the second client device is connected to a second port of the first client device and a second port of the second client device is connected to a second port of the network manager device. The network manager device is configured to transmit a frame having a count field. The first client device is configured to increment the count field once based on a successful transmission of the frame to the second client device and increment the count field twice based on a failed transmission to the second client device.

Medium Current Ribbon Beam For Ion Implantation

US Patent:
2015010, Apr 16, 2015
Filed:
Sep 18, 2014
Appl. No.:
14/490253
Inventors:
- Hsinchu, TW
Charles M. FREE - Rowley MA, US
David HOGLUND - Arlington MA, US
Wilhelm P. PLATOW - Salem MA, US
Kourosh SAADATMAND - Merrimac MA, US
International Classification:
H01J 37/08
H01J 37/317
US Classification:
250424, 250423 R
Abstract:
A method of setting up a medium current ribbon beam for ion implantation is provided. It includes providing an ion source fed with a process gas and a support gas. The process ion beam is separated from the support gas beam with a mass analyzing magnet, and the intensity of the process ion beam is controlled by varying the ratio of process gas to support gas in the ion source gas feed. Process beam intensity may also be controlled with one or more mechanical current limiting devices located downstream of the ion source. An ion beam system is also provided. This method may control the total ribbon beam intensity at the target between approximately 3 uA to about 3 mA.

Isbn (Books And Publications)

Human Detection And Positive Identification :Methods And Technologies: 19, 21 November 1996, Boston, Massachusetts

Author:
David E. Hoglund
ISBN #:
0819423343

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