David F Witman, 7223 Burts Path, East Fishkill, NY 12533

5098816, Mar 24, 1992

Apr 11, 1991

7/683778

Edward D. Babich - Chappaqua NY
Jeffrey D. Gelorme - Plainville CT
Michael Hatzakis - Chappaqua NY
Jane M. Shaw - Ridgefield CT
Kevin J. Stewart - Lake Peekskill NY
David F. Witman - Pleasantville NY

International Business Machines Corporation - Armonk NY

G03F 7075
G03F 726

430325

An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: ##STR1## wherein X is CH. dbd. CH. sub. 2 or --(--CH. sub. 2 --)--. sub. n O--(--R) with R being H or ##STR2## wherein each R. sup. I, R. sup. II and R. sup. III individually is selected from the group of alkyl, alkenyl, aryl, ##STR3## wherein each R. sup. IV, R. sup. V and R. sup. VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.

4840923, Jun 20, 1989

Oct 19, 1988

7/262208

Donis G. Flagello - Ridgefield CT
Janusz S. Wilczynski - Ossining NY
David F. Witman - Pleasantville NY

International Business Machine Corporation - Armonk NY

H01L 21312

437189

A system of establishing a conductive via path between spaced interlevel conductors. Successive layers of metallization separated by a dielectric are built. The vias are opened in one step to eliminate interlevel mashing. The system employs annular pads at locations where contact may be established to another wiring level. The vias are self-aligned and taper from top metal to first level contact. The system is applicable both chip-wise and carrier-wise.

4744615, May 17, 1988

Jan 29, 1986

6/823554

Bunsen Fan - Peekskill NY
Raymond E. Tibbetts - Mahopac NY
Janusz S. Wilczynski - Ossining NY
David F. Witman - Ossining NY

International Business Machines Corporation - Armonk NY

G02B 600
H01S 310
F21V 704

350 9610

A coherent laser beam having a possibly non-uniform spatial intensity distribution is transformed into an incoherent light beam having a substantially uniform spatial intensity distribution by homogenizing the laser beam with a light tunnel (a transparent light passageway having flat internally reflective side surfaces). It has been determined that when the cross-section of the tunnel is a polygon (as preferred) and the sides of the tunnel are all parallel to the axis of the tunnel (as preferred), the laser light at the exit of the light tunnel (or alternatively at any image plane with respect thereto) will have a substantially uniform intensity distribution and will be incoherent only when the aspect ratio of the tunnel (length divided by width) equals or exceeds the contangent of the input beam divergence angle. theta. and when W. sub. min =L. sub. coh (R+(1+R. sup. 2). sup.

5258236, Nov 2, 1993

May 3, 1991

7/695368

Gnanalingam Arjavalingam - Yorktown Heights NY
Alina Deutsch - Chappaqua NY
Fuad E. Doany - Katonah NY
Bruce K. Furman - Beacon NY
Donald J. Hunt - Pine Bush NY
Chandrasekhar Narayan - Hopewell Junction NY
Modest M. Oprysko - Mahopac NY
Sampath Purushothaman - Yorktown Heights NY
Vincent Ranieri - Tarrytown NY
Stephen Renick - Mahopac NY
Jane M. Shaw - Ridgefield CT
Janusz S. Wilczynski - Ossining NY
David F. Witman - Pleasantville NY

IBM Corporation - Armonk NY

B32B 1504
H01L 2912

428626

A method and apparatus for releasing a workpiece from a substrate including providing a substrate which is transparent to a predetermined wavelength of electromagnetic radiation; forming, on the substrate, a separation layer which degrades in response to the predetermined radiation; providing the workpiece on the separation layer; and directing the predetermined radiation at the separation layer through the transparent substrate so as to degrade the separation layer and to separate the workpiece from the substrate.

5110711, May 5, 1992

Apr 11, 1991

7/683729

Edward D. Babich - Chappaqua NY
Jeffrey D. Gelorme - Plainville CT
Michael Hatzakis - Chappaqua NY
Jane M. Shaw - Ridgefield CT
Kevin J. Stewart - Lake Peekskill NY
David F. Witman - Pleasantville NY

International Business Machines Corporation - Armonk NY

G03F 7075
G03F 726

430296

An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: ##STR1## wherein X is CH. dbd. CH. sub. 2 or --(--CH. sub. 2 --)--. sub. n O--(--R) with R being H or ##STR2## wherein each R. sup. I, R. sup. II and R. sup. III individually is selected from the group of alkyl, alkenyl, aryl, ##STR3## wherein each R. sup. IV, R. sup. V and R. sup. VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.

4770947, Sep 13, 1988

Jan 2, 1987

7/000212

Donis G. Flagello - Ridgefield CT
Jane M. Shaw - Ridgefield CT
David F. Witman - Pleasantville NY

International Business Machines Corporation - Armonk NY

B32B 1500

428630

A multi-layer structure that includes a transparent dielectric substrate, a layer of a nickel-containing steel alloy, and a layer of copper and/or chrome.

4981909, Jan 1, 1991

Sep 7, 1988

7/241281

Edward D. Babich - Ridgefield CT
Michael Hatzakis - Chappaqua NY
Scott L. Jacobs - Fishkill NY
Jane M. Shaw - Ridgefield CT
David F. Witman - Ossining NY

International Business Machines Corporation - Armonk NY

G03C 842
B05D 304
C08F 842

525102

Plasma-resistant polymeric materials are prepared by reacting a polymeric material containing reactive hydrogen functional groups with a multifunctional organometallic material containing at least two functional groups which are reactive with the reactive hydrogen functional groups of the polymeric material, such as hexamethylcyclotrisilazane.

5059512, Oct 22, 1991

Oct 10, 1989

7/419047

Edward D. Babich - Chappaqua NY
Jeffrey D. Gelorme - Plainville CT
Michael Hatzakis - Chappaqua NY
Jane M. Shaw - Ridgefield CT
Kevin J. Stewart - Lake Peekskill NY
David F. Witman - Pleasantville NY

International Business Machines Corporation - Armonk NY

G03F 7029
C08F 818

430280

An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: ##STR1## wherein X is CH. dbd. CH. sub. 2 or --(--CH. sub. 2 --)--. sub. n O--(--R) with R being H or ##STR2## wherein each R. sup. I, R. sup. II and R. sup. III individually is selected from the group of alkyl, alkenyl, aryl, ##STR3## wherein each R. sup. IV, R. sup. V and R. sup. VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.