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Ellen M Meeks, 624592 Country Ln, Livermore, CA 94550

Known as:
Ellen Meeks E Meeks
Related to:
Martha Meeks

Ellen Meeks Phones & Addresses

4592 Country Ln, Livermore, CA 94550    925-4430223   

3935 Princeton Way, Livermore, CA 94550    925-4430223   

Hamden, CT   

Pleasanton, CA   

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Ellen Meeks resumes & CV records

Resumes

Ellen Meeks Photo 31

Vice President, Engineering

Location:
San Francisco, CA
Industry:
Computer Software
Work:
Ansys, Inc.
Director of Development, Reaction Design Reaction Design
Vice President, Engineering Sandia National Laboratories 1987 - 1998
Principal Member of Technical Staff
Education:
Stanford University 1989 - 1994
Doctorates, Doctor of Philosophy, Mechanical Engineering Rensselaer Polytechnic Institute 1985 - 1986
Master of Science, Masters, Mechanical Engineering Swarthmore College 1981 - 1985
Bachelors, Bachelor of Science, Engineering
Skills:
Simulations, Cfd, Software Development, Fortran, Linux, Engineering, High Performance Computing, Software Engineering, Design of Experiments
Ellen Meeks Photo 32

Ellen Meeks

Ellen Meeks Photo 33

Ellen Hesler Meeks

Publications & IP owners

Us Patents

System And Method For Flame Blow-Off Determination

US Patent:
2010033, Dec 30, 2010
Filed:
Feb 23, 2010
Appl. No.:
12/660336
Inventors:
Cheng-Pang Chou - Irvine CA, US
Devin Hodgson - San Diego CA, US
Ellen Meeks - Livermore CA, US
International Classification:
G06G 7/58
G06F 7/60
US Classification:
703 2, 703 12
Abstract:
Systems and Methods for determining flame blow-off conditions are disclosed. These methods provide efficient and reliable tools for determining the lean blow-off conditions for a variety of combustion system. By utilizing localized characteristics within a flame-holding region a user is enabled to assess the likelihood of flame blow-off with fine granularity within a combustor. The flame blow-out determination may be carried out with the aid of an output representation that provides a contour of likely blow-off cells within a combustor region.

Sealable Stagnation Flow Geometries For The Uniform Deposition Of Materials And Heat

US Patent:
6242049, Jun 5, 2001
Filed:
Sep 8, 1994
Appl. No.:
8/302155
Inventors:
Kevin F. McCarty - Livermore CA
Robert J. Kee - Livermore CA
Andrew E. Lutz - Alamo CA
Ellen Meeks - Livermore CA
Assignee:
Sandia Corporation - Livermore CA
International Classification:
B05D 108
US Classification:
427446
Abstract:
The present invention employs a constrained stagnation flow geometry apparatus to achieve the uniform deposition of materials or heat. The present invention maximizes uniform fluxes of reactant gases to flat surfaces while minimizing the use of reagents and finite dimension edge effects. This results, among other things, in large area continuous films that are uniform in thickness, composition and structure which is important in chemical vapor deposition processes such as would be used for the fabrication of semiconductors.

Possible Relatives

Debbie Meeks  Estell Meeks  Heidi M Meeks  Acia Meeks  Jennifer A Meeks  Jerri B Meeks  Jimmy G Meeks  Ellen E Jonsson  Ellen D Keech  Ellen M Mclean 

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