Eric R Christenson, 7219090 Tualasaum Dr, Tualatin, OR 97062

4778233, Oct 18, 1988

Sep 19, 1986

6/909701

Eric Christenson - Portland OR
Paul Allen - Beaverton OR

ATEO Corporation - Beaverton OR

G02B 2610

350 66

A steering mirror for use with a laser pattern generator. A reflective surface is mounted on a pivotally mounted extended member. A piezo electric crystal abuts the extended member and voltage applied to the crystal causes deformation of the crystal and ultimately movement of the reflective surface. A differential impedence transducer is coupled to the extended member to detect movement of the steering mirror. In this manner, the position of the mirror can be accurately controlled.

5087927, Feb 11, 1992

Jan 31, 1990

7/472894

Tim Thomas - Beaverton OR
Eric Christenson - Portland OR
Bob Holstrom - Portland OR
Eugene Mino - Portland OR

Ateo Corporation - Beaverton OR

G01D 942
G01M 302

346108

A lithography tool having an improved focus system. The focus system comprises a lens mounted in a nosepiece which defines a chamber. The chamber defines an onifice through which the lens system may see a workpiece. An air supply is provided to supply a regulated and measured air flow to the chamber. By measuring the air flow into the chamber, the rate of air flow through the orifice may be determined. The rate of air flow through the orifice is proportional to the gap between the orifice and a workpiece.

2021013, May 6, 2021

Oct 23, 2020

17/078778

- Beaverton OR, US
Yu-Wen Huang - Tigardf OR, US
Gerald Lee Gisler - St. Paul OR, US
Eric Robert Christenson - Tualatin OR, US
Michael E. Simmons - Colton OR, US

G01R 1/07
G01R 31/308

Probe systems including imaging devices with objective lens isolators and related methods are disclosed herein. A probe system includes an enclosure with an enclosure volume for enclosing a substrate that includes one or more devices under test (DUTs), a testing assembly, and an imaging device. The imaging device includes an imaging device objective lens, an imaging device body, and an objective lens isolator. In examples, the probe system includes an electrical grounding assembly configured to restrict electromagnetic noise from entering the enclosure volume. In examples, methods of preparing the imaging device include assembling the imaging device such that the imaging device objective lens is at least partially electrically isolated from the imaging device body. In some examples, utilizing the probe system includes testing the one or more DUTs while restricting electrical noise from propagating from the imaging device to the substrate.

2021009, Apr 1, 2021

Sep 15, 2020

17/021288

- Beaverton OR, US
Kazuki Negishi - Hillsboro OR, US
Michael E. Simmons - Colton OR, US
Eric Robert Christenson - Tualatin OR, US
Daniel Rishavy - Austin TX, US

G01R 31/28
G01R 1/067

Probe systems for optically probing a device under test (DUT) and methods of operating the probe systems. The probe systems include a probing assembly that includes an optical probe that defines a probe tip and a distance sensor. The probe systems also include a support surface configured to support a substrate, which defines a substrate surface and includes an optical device positioned below the substrate surface. The probe systems further include a positioning assembly configured to selectively regulate a relative orientation between the probing assembly and the DUT. The probe systems also include a controller programmed to control the operation of the probe systems. The methods include methods of operating the probe systems.

2020037, Dec 3, 2020

May 27, 2020

16/884921

- Beaverton OR, US
Michael E. Simmons - Colton OR, US
Christopher Anthony Storm - Hillsboro OR, US
Joseph George Frankel - Beaverton CO, US
Eric Robert Christenson - Tualatin OR, US
Mario René Berg - Dresden, DE

G01N 21/27
G01B 11/02

Calibration chucks for optical probe systems, optical probe systems including the calibration chucks, and methods of utilizing the optical probe systems. The calibration chucks include a calibration chuck body that defines a calibration chuck support surface. The calibration chucks also include at least one optical calibration structure that is supported by the calibration chuck body. The at least one optical calibration structure includes a horizontal viewing structure. The horizontal viewing structure is configured to facilitate viewing of a horizontally viewed region from a horizontal viewing direction that is at least substantially parallel to the calibration chuck support surface. The horizontal viewing structure also is configured to facilitate viewing of the horizontally viewed region via an imaging device of the optical probe system that is positioned vertically above the calibration chuck support surface.

2020021, Jul 9, 2020

Dec 30, 2019

16/730584

- Beaverton OR, US
Joseph George Frankel - Beaverton OR, US
Eric Robert Christenson - Tualatin OR, US

G01B 7/06

Probe systems and methods for calibrating capacitive height sensing measurements. A probe system includes a probe assembly with a probe support body that supports a capacitive displacement sensor that terminates in a sensing tip relative to a substrate and that is configured to generate an uncalibrated capacitive height measurement. A method of utilizing the probe system to generate a calibrated capacitive height measurement includes receiving a height calibration structure architecture; calculating a layer impedance magnitude of each substrate layer of the height calibration structure; and calculating a total layer impedance magnitude of the height calibration structure. The method further includes measuring a measured impedance magnitude and calculating the calibrated capacitive height measurement.