Eric W Prince, 39Rochester, NY

4811687, Mar 14, 1989

Dec 14, 1987

7/133113

Eric T. Prince - Fairport NY

Eastman Kodak Company - Rochester NY

C23C 1400

118666

Apparatus adapted for use in high vacuum, thin-film deposition system for controlling the temperature of moving substrate holder. Preferably, such temperature control apparatus comprises a fixed, temperature-controlled, thermally conductive member, and liquid heat transfer medium (preferably liquid gallium) for thermally coupling such member to the substrate holder as it moves through a vacuum chamber.

5058970, Oct 22, 1991

Sep 17, 1990

7/583118

Jay S. Schildkraut - Rochester NY
Joseph F. Revelli - Rochester NY
Eric T. Prince - Fairport NY

Eastman Kodak Company - Rochester NY

G02F 137

359328

A quasi-phase matching optical waveguide for producing a second harmonic of an internally propagated polarized laser beam having a wavelength in the range of from 700 to 1300 nm is disclosed. The waveguide is comprised of at least one array of laterally spaced transparent electrodes in direct contact with a transmission medium containing similarly polar aligned organic molecular dipoles in overlying areas. The transparent electrodes and overlying areas of the transmission medium are each of the same width and spacing.

5347377, Sep 13, 1994

Jun 17, 1992

7/899961

Joseph F. Revelli - Rochester NY
Eric T. Prince - Fairport NY
Steven C. Switalski - Rochester NY

Eastman Kodak Company - Rochester NY

G02F 11335
G02F 1137
G02F 101

359 42

A waveguide optical device having a guide member for propagation of light in a longitudinal direction. The guide member has upper and lower boundaries. A mass of birefringent material is disposed proximal to the guide member. The birefringent material has molecular dipoles subject to alignment by an imposed electrical field. The birefringent mass is overlapped by the optical field of the propagated light. An upper electrode is disposed in spaced relation to the birefringent mass. A lower electrode is disposed in spaced relation to the guide member. The electrodes have the capability of imposing an alternating current voltage across the birefringent mass to rotate the molecular dipoles of the birefringent mass in a plane defined by the normal to the guide member and the propagation vector of the light. The boundaries and the electrodes define an upper isolation zone between the upper electrode and the upper boundary, a guide path between the boundaries, and a lower isolation zone between the lower boundary and the lower electrode. The guide path has an effective index of refraction greater than the effective indexes of refraction of the isolation zones.

5431775, Jul 11, 1995

Jul 29, 1994

8/282677

Eric T. Prince - Fairport NY

Eastman Kodak Company - Rochester NY

H01L 21302

216 24

A method of forming optical light guides through silicon is disclosed wherein such light guides extend from a first (or front) surface along a preferred crystallographic direction to a second (or back) surface.

5185293, Feb 9, 1993

Apr 10, 1992

7/866716

Hans G. Franke - Hilton NY
Eric T. Prince - Fairport NY

Eastman Kodak Company - Rochester NY

H01L 21283
H01L 2131

437184

A method is described for forming patterns in deposited overlayers on GaAs and for aligning the formed patterns with etch features produced through dry processing. The deposited overlayers on GaAs are protected during pattern formation and subsequent processing by a durable, process integrable mask of hydrogenated amorphous carbon.

5378316, Jan 3, 1995

Jan 7, 1993

8/001432

Eric T. Prince - Fairport NY

Eastman Kodak Company - Rochester NY

H01L 2100

1566591

A mask is described which enables the fabrication of features in GaAs such as waveguides, channels, facets, mesas, and mirrors by dry etch processing in chlorine containing ambients. The mask consists of an amorphous form of carbon which may contain incorporated hydrogen. The mask can be applied, patterned and removed through dry processing techniques.

5235662, Aug 10, 1993

Jan 2, 1992

7/815779

Eric T. Prince - Fairport NY
Sebastian F. Prospero - Byron NY
Mark M. Romach - Rochester NY

Eastman Kodak Company - Rochester NY

G02B 600
C03B 2500
C03C 300

385129

The present invention provides a method of annealing optical glass layers, said method comprising the step of heating glass layers having an area greater than 0. 01 cm. sup. 2 to a temperature of between about 350 deg. C. and 1000 deg. C. in less than 10 minutes. The upper limit of the glass area that can be treated is limited only by the size of the quartz chamber. Current state-of-the-art chambers can accomodate glass areas of about 0. 01 cm. sup. 2 to about 324 cm. sup. 2. According to another aspect of the invention, there is also provided an optical waveguide glass layer, treated according to the method of this invention, disposed on an integrated optical device.

5510215, Apr 23, 1996

Jan 25, 1995

8/378211

Eric T. Prince - Fairport NY
Michael J. Hanrahan - Hilton NY
Sharlene A. Wilson - Seneca Falls NY

Eastman Kodak Company - Rochester NY

G03F 900

430 7

A method of patterning a multilayer, dielectric color filter is described. The method includes depositing a multilayer, dielectric color filter on a substrate having top, bottom and multiple intermediate layers; and applying a patternable mask onto the top layer to provide selected openings through the mask. The method further includes removing the top layer through the selected openings in the patterned mask using a first dry etch, the patterned mask and the multiple intermediate layers of the filter being resistant to this first dry etch, to provide openings to the multiple intermediate layers of the filter. It is a feature of the invention to remove the patterned mask using a second dry etch, the top layer and multiple intermediate layers of the filter being resistant to this second dry etch; and to remove through the openings in the top layer the multiple intermediate layers of the filter, down to the bottom layer, using a third dry etch, the top layer and bottom layer being resistant to this third dry etch.