Eric M Simms, 426890 County Road 409, Mckinney, TX 75071

2005023, Oct 27, 2005

Jun 23, 2005

11/159772

Nilesh Doke - Dallas TX, US
Chad Kaneshige - McKinney TX, US
John Campbell - Plano TX, US
Eric Simms - Rowlett TX, US
Manoj Jain - Plano TX, US

H01L021/302
B44C001/22

438692000, 216088000, 134002000

Post chemical mechanical polishing (CMP) cleaning methods are disclosed which reduce integrated circuit defects. A corrosion inhibitor is preferably applied during the post-CMP cleaning steps after application of a first chemistry. Subsequent to the application of the corrosion inhibitor a rinsing step using deionized water is employed. In this manner, the corrosion inhibitor applied during the post-CMP clean fills voids created in previous passivation layers by previous chemistries. Also, existing post-CMP equipment may be used to implement the preferred embodiments of the present invention. Preferably the corrosion inhibitor applied during the post-CMP clean is benzotriazole (BTA).

2004026, Dec 30, 2004

Jun 30, 2003

10/610414

Nilesh Doke - Dallas TX, US
Chad Kaneshige - McKinney TX, US
John Campbell - Plano TX, US
Eric Simms - Rowlett TX, US
Manoj Jain - Plano TX, US

Texas Instruments Incorporated - Dallas TX

H01L021/302
H01L021/461

438/689000

Post chemical mechanical polishing (CMP) cleaning methods are disclosed which reduce integrated circuit defects. A corrosion inhibitor is preferably applied during the post-CMP cleaning steps after application of a first chemistry. Subsequent to the application of the corrosion inhibitor a rinsing step using deionized water is employed. In this manner, the corrosion inhibitor applied during the post-CMP clean fills voids created in previous passivation layers by previous chemistries. Also, existing post-CMP equipment may be used to implement the preferred embodiments of the present invention. Preferably the corrosion inhibitor applied during the post-CMP clean is benzotriazole (BTA).