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Gang Liu, 56Prior Lake, MN

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Shakopee, MN   

Atlanta, GA   

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Resumes

Gang Liu Photo 45

Gang Liu

Gang Liu Photo 46

Software Engineer

Work:
Zhou Brothers
Software Engineer
Gang Liu Photo 47

Gang Liu

Gang Liu Photo 48

Gang Liu

Gang Liu Photo 49

Gang Liu

Gang Liu Photo 50

Gang Liu

Location:
United States

Publications & IP owners

Us Patents

Spectrally And Temporally Engineered Processing Using Photoelectrochemistry

US Patent:
2018030, Oct 18, 2018
Filed:
May 22, 2018
Appl. No.:
15/986304
Inventors:
- Urbana IL, US
Kaiyuan Wang - Atlanta GA, US
Chris Edwards - Chandler AZ, US
Lonna Edwards - Louisville KY, US
Xin Yu - Urbana IL, US
Gang Logan Liu - Champaign IL, US
Samuel Washington - Urbana IL, US
Shailendra Srivastava - Urbana IL, US
Terry Koker - Gibson City IL, US
Julianne Lee - Savoy IL, US
Catherine Britt Carlson - Saint Joseph IL, US
International Classification:
H01L 21/306
H01L 31/0236
C25F 3/14
H01L 31/0232
H01L 21/66
G01B 11/24
Abstract:
Methods and apparatus for subtractively fabricating three-dimensional structures relative to a surface of a substrate and for additively depositing metal and dopant atoms onto the surface and for diffusing them into the bulk. A chemical solution is applied to the surface of the semiconductor substrate, and a spatial pattern of electron-hole pairs is generated by projecting a spatial pattern of illumination characterized by a specified intensity, wavelength and duration at each pixel of a plurality of pixels on the surface. Charge carriers are driven away from the surface of the semiconductor on a timescale short compared to the carrier recombination lifetime. Such methods are applied to creating a spatially varying doping profile in the semiconductor substrate, a photonic integrated circuit and an integrated photonic microfluidic circuit.

Spectrally And Temporally Engineered Processing Using Photoelectrochemistry

US Patent:
2016011, Apr 28, 2016
Filed:
Jan 6, 2016
Appl. No.:
14/988895
Inventors:
- Urbana IL, US
Kaiyuan Wang - Atlanta GA, US
Chris Edwards - Chandler AZ, US
Lonna Edwards - Louisville KY, US
Xin Yu - Urbana IL, US
Gang Logan Liu - Champaign IL, US
Samuel Washington - Urbana IL, US
Shailendra Srivastava - Urbana IL, US
Terry Koker - Gibson City IL, US
Julianne Lee - Savoy IL, US
Catherine Britt Carlson - Saint Joseph IL, US
International Classification:
H01L 21/306
H01L 31/0236
H01L 21/768
H01L 31/0232
Abstract:
Methods and apparatus for subtractively fabricating three-dimensional structures relative to a surface of a substrate and for additively depositing metal and dopant atoms onto the surface and for diffusing them into the bulk. A chemical solution is applied to the surface of the semiconductor substrate, and a spatial pattern of electron-hole pairs is generated by projecting a spatial pattern of illumination characterized by a specified intensity, wavelength and duration at each pixel of a plurality of pixels on the surface. An electrical potential is applied across the interface of the semiconductor and the solution with a specified temporal profile relative to the temporal profile of the spatial pattern of illumination. Such methods are applied to the fabrication of a photodetector integral with a parabolic reflector, cell size sorting chips, a three-dimensional photonic bandgap chip, a photonic integrated circuit, and an integrated photonic microfluidic circuit.

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