Inventors:
- Urbana IL, US
Kaiyuan Wang - Atlanta GA, US
Chris Edwards - Chandler AZ, US
Lonna Edwards - Louisville KY, US
Xin Yu - Urbana IL, US
Gang Logan Liu - Champaign IL, US
Samuel Washington - Urbana IL, US
Shailendra Srivastava - Urbana IL, US
Terry Koker - Gibson City IL, US
Julianne Lee - Savoy IL, US
Catherine Britt Carlson - Saint Joseph IL, US
International Classification:
H01L 21/306
H01L 31/0236
C25F 3/14
H01L 31/0232
H01L 21/66
G01B 11/24
Abstract:
Methods and apparatus for subtractively fabricating three-dimensional structures relative to a surface of a substrate and for additively depositing metal and dopant atoms onto the surface and for diffusing them into the bulk. A chemical solution is applied to the surface of the semiconductor substrate, and a spatial pattern of electron-hole pairs is generated by projecting a spatial pattern of illumination characterized by a specified intensity, wavelength and duration at each pixel of a plurality of pixels on the surface. Charge carriers are driven away from the surface of the semiconductor on a timescale short compared to the carrier recombination lifetime. Such methods are applied to creating a spatially varying doping profile in the semiconductor substrate, a photonic integrated circuit and an integrated photonic microfluidic circuit.