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Gregg B Monjeau, 36New Hamburg, NY

Gregg Monjeau Phones & Addresses

Wappingers Falls, NY   

Hamburg, NY   

New Haven, CT   

Preston Hollow, NY   

44 Ridge Rd, Wallkill, NY 12589    845-5647069   

Mentions for Gregg B Monjeau

Publications & IP owners

Us Patents

Uv-Curable Compositions And Method Of Use Thereof In Microelectronics

US Patent:
6682872, Jan 27, 2004
Filed:
Jan 22, 2002
Appl. No.:
10/056245
Inventors:
Krishna G. Sachdev - Hopewell Junction NY
Michael Berger - New Paltz NY
Rebecca Y. Gorrell - Lagrangeville NY
Gregg B. Monjeau - Wallkill NY
Bernadette H. Perry - Wappingers Falls NY
Thomas A. Wassick - Lagrangeville NY
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G03C 500
US Classification:
430311, 4302701, 430905, 430913, 4284247, 4284248, 428522
Abstract:
Radiation-curable compositions are provided for use in the fabrication of electronic components as passivation coatings; for defect repair in ceramic and thin film products by micropassivation in high circuit density electronic modules to allow product recovery; as a solder mask in electronic assembly processes; for use as protective coatings on printed circuit board (PCB) circuitry and electronic devices against mechanical damage and corrosion from exposure to the environment. The compositions are solvent-free, radiation-curable, preferably uv-curable, containing a polymer binder, which is a pre-formed thermoplastic or elastomeric polymer/oligomer, a monofunctional and/or bifunctional acrylic monomer, a multifunctional (more than 2 reactive groups) acrylated/methacrylated monomer, and a photoinitiator, where all the constituents are mutually miscible forming a homogeneous viscous blend without the addition of an organic solvent. The compositions may also contain inorganic fillers and/or nanoparticle fillers.

Polyimide Compositions And Use Thereof In Ceramic Product Defect Repair

US Patent:
7608295, Oct 27, 2009
Filed:
Mar 12, 2007
Appl. No.:
11/684679
Inventors:
Krishna G Sachdev - Hopewell Junction NY, US
Michael Berger - New Paltz NY, US
Gregg Monjeau - Wallkill NY, US
Robert A. Rita - Manlius NY, US
Kathleen M Wiley - Wappingers Falls NY, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
B05D 7/00
B32B 43/00
US Classification:
427140
Abstract:
A method to repair ceramic substrates is disclosed using a novel polyimide polymer which has high thermal stability, resistance to fluxes and flux residue cleaning solvents and processes, good mechanical properties, good adhesion to all contacting surfaces with low moisture uptake and good flow properties suitable for repairing chipped ceramic, filling deep trench or vias and writing passivation lines with automated process The polyimide polymer is made by reacting aromatic dianhydride and aromatic diamine monomers with a stoichiometric offset and end capping the resulting polymer when the reaction is completed. The preferred polyimide is made using a molar excess of diamine which is end-capped using an anhydride.

Fixture To Constrain Laminate And Method Of Assembly

US Patent:
8188597, May 29, 2012
Filed:
Sep 22, 2010
Appl. No.:
12/887809
Inventors:
Thomas E. Lombardi - Poughkeepsie NY, US
Donald Merte - Yorktown Heights NY, US
Gregg B. Monjeau - Wallkill NY, US
David L. Questad - Hopewell Junction NY, US
Son K. Tran - Endwell NY, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
H01L 23/34
US Classification:
257727, 257726, 257716, 257699, 257687, 257E23084
Abstract:
A fixture assembly and method of forming a chip assembly is provided. The fixture assembly includes a first plate having an opening sized to accommodate a chip mounted on a laminate. The fixture assembly further includes a second plate mated to the first plate by at least one mechanical fastening mechanism. The fixture assembly further includes a space defined by facing surfaces of the first plate and the second plate and confined by a raised stepped portion of at least one of the first plate and the second plate. The space is coincident with the opening. The space is sized and shaped such that the laminate is confined within the space and directly abuts the stepped portion and the facing surfaces of the first plate and the second plate to be confined in X, Y and Z directions.

Reliability Enhancement Of Metal Thermal Interface

US Patent:
8232636, Jul 31, 2012
Filed:
Jan 26, 2010
Appl. No.:
12/693646
Inventors:
James N Humenik - Hopewell Junction NY, US
Sushumna Iruvanti - Hopewell Junction NY, US
Richard Langlois - Granby, CA
Hsichang Liu - Hopewell Junction NY, US
Govindarajan Natarajan - Hopewell Junction NY, US
Kamal K Sikka - Hopewell Junction NY, US
Hilton T Toy - Hopewell Junction NY, US
Jiantao Zheng - Hopewell Junction NY, US
Gregg B Monjeau - Hopewell Junction NY, US
Mark Kapfhammer - Hopewell Junction NY, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
H01L 23/10
H01L 23/34
US Classification:
257707, 257706, 438122
Abstract:
A frontside of a chip is bonded to a top surface of a chip carrier. Seal material is dispensed at a periphery of the top surface of the chip carrier. A solder TIM having a first side and a second side is provided. The first side of the TIM contacts a backside of the chip. A reflow is performed to melt the TIM. The second side of the TIM is bonded to a lid. The seal material is cured. The lid is attached to the top surface of the chip carrier. Backfill material is injected into a space between the top surface of the chip carrier and the lid. The backfill material abuts sides of the TIM. The backfill material is cured. TIM solder cracking and associated thermal degradation are mitigated.

Polyimide Compositions And Use Thereof In Ceramic Product Defect Repair

US Patent:
2004013, Jul 8, 2004
Filed:
Jan 8, 2003
Appl. No.:
10/338927
Inventors:
Krishna Sachdev - Hopewell Junction NY, US
Michael Berger - New Paltz NY, US
Gregg Monjeau - Wallkill NY, US
Robert Rita - Manlius NY, US
Kathleen Wiley - Wappingers Falls NY, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
B05D003/02
C08K003/00
US Classification:
524/606000, 427/140000, 427/385500
Abstract:
A method to repair ceramic substrates is disclosed using a novel polyimide polymer which has high thermal stability, resistance to fluxes and flux residue cleaning solvents and processes, good mechanical properties, good adhesion to all contacting surfaces with low moisture uptake and good flow properties suitable for repairing chipped ceramic, filling deep trench or vias and writing passivation lines with automated process The polyimide polymer is made by reacting aromatic dianhydride and aromatic diamine monomers with a stoichiometric offset and end capping the resulting polymer when the reaction is completed. The preferred polyimide is made using a molar excess of diamine which is end-capped using an anhydride.

Fixture To Constrain Laminate And Method Of Assembly

US Patent:
2012018, Jul 26, 2012
Filed:
Mar 16, 2012
Appl. No.:
13/422429
Inventors:
Thomas E. LOMBARDI - Poughkeepsie NY, US
Donald MERTE - Yorktown Heights NY, US
Gregg B. MONJEAU - Wallkill NY, US
David L. QUESTAD - Hopewell Junction NY, US
Son K. TRAN - Endwell NY, US
Assignee:
INTERNATIONAL BUSINESS MACHINES CORPORATION - Armonk NY
International Classification:
B23K 31/02
H01L 21/58
US Classification:
228135, 29 2501
Abstract:
A fixture assembly and method of forming a chip assembly is provided. The fixture assembly includes a first plate having an opening sized to accommodate a chip mounted on a laminate. The fixture assembly further includes a second plate mated to the first plate by at least one mechanical fastening mechanism. The fixture assembly further includes a space defined by facing surfaces of the first plate and the second plate and confined by a raised stepped portion of at least one of the first plate and the second plate. The space is coincident with the opening. The space is sized and shaped such that the laminate is confined within the space and directly abuts the stepped portion and the facing surfaces of the first plate and the second plate to be confined in X, Y and Z directions.

Method Of Performing Processes On Features With Electricity

US Patent:
5935404, Aug 10, 1999
Filed:
Jan 22, 1997
Appl. No.:
8/787071
Inventors:
Shaji Farooq - Hopewell Junction NY
Suryanarayana Kaja - Hopewell Junction NY
Hsichang Liu - Fishkill NY
Karen P. McLaughlin - Poughkeepsie NY
Gregg B. Monjeau - Wallkill NY
Kim Hulett Ruffing - Briarcliff Manor NY
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
C25D 502
US Classification:
205125
Abstract:
A method of performing electrochemistry processes on features and connectors of a substrate includes the application of a shorting layer across the connectors which are in electrical contact with the features, thereby shorting the features and creating an assemblage for which electricity is applied.

Porous Metal Block For Removing Solder Or Braze From A Substate And A Process For Making The Same

US Patent:
5284286, Feb 8, 1994
Filed:
Oct 31, 1991
Appl. No.:
7/786201
Inventors:
Peter J. Brofman - Hopewell Junction NY
Shaji Farooq - Hopewell Junction NY
Kathleen A. Lidestri - Hopewell Junction NY
Gregg B. Monjeau - Wallkill NY
Karl J. Puttlitz - Wappingers Falls NY
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
B23K 1018
US Classification:
228 19
Abstract:
A porous metal block for selectively removing solder or braze from a substrate is disclosed. The block comprises a plurality of protrusions which absorb solder or braze through capillary action. The number and dimensions of the protrusions vary depending on the application. Also disclosed is a process for making such a block involving a unique two steps sintering process.

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