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Guohua Hua Zhang, 6111 Thayer St, Quincy, MA 02169

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Quincy, MA   

Dorchester Center, MA   

Watertown, MA   

Somerville, MA   

Malden, MA   

Gardner, MA   

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Company: OPNET, Security

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School / High School: Arlington, Informix Software, Texas Aug 2008 Specialities: computer science

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Us Patents

Abrasive Tool With Flat And Consistent Surface Topography For Conditioning A Cmp Pad And Method For Making

US Patent:
2012012, May 17, 2012
Filed:
Jul 16, 2010
Appl. No.:
13/384331
Inventors:
Jianhui Wu - Ashland MA, US
Guohua Zhang - Northborough MA, US
Richard W.J. Hall - Southborough MA, US
Assignee:
Saint-Gobain Abrasifs - Conflans-Sainte-Honorine
Saint-Gobain Abrasives, Inc. - Worcester MA
International Classification:
B24B 53/00
B24B 53/12
B24D 18/00
B24D 3/06
US Classification:
451 56, 51309, 51298
Abstract:
An abrasive tool with flat and consistent surface topography for conditioning a CMP pad and method for making are disclosed. The abrasive tool includes abrasive grains coupled to a low coefficient of thermal expansion (CTE) substrate through a metal bond. There is an overall CTE mismatch that ranges from about 0.1 μm/m- C. to about 5.0 μm/m- C. The overall CTE mismatch is the difference between the CTE mismatch of the abrasive grains and the metal bond and the CTE mismatch of the low CTE substrate and the metal bond.

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