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Hugh H Y Li23 Kingsbury Ct, Alameda, CA 94501

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23 Kingsbury Ct, Alameda, CA 94501   

Berkeley, CA   

Fremont, CA   

101 Lombard St, San Francisco, CA 94111    415-7887247   

101 Lombard St #409E, San Francisco, CA 94111   

121 Tiffany Ave, San Francisco, CA 94110    415-5193229   

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Hugh H Y Li

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Position: Clerical/White Collar

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Degree: High school graduate or higher

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Hugh Li

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Us Patents

Bond Pad And Wire Bond

US Patent:
6610601, Aug 26, 2003
Filed:
Jan 4, 2002
Appl. No.:
10/038980
Inventors:
Hugh Li - Santa Clara CA
Diane J. Hymes - San Jose CA
Assignee:
Lam Research Corporation - Fremont CA
International Classification:
H01L 2144
US Classification:
438687, 438681, 438688
Abstract:
A method is described comprising removing an oxide from a surface and then commencing application of a passivation layer to the surface within 5 seconds of the oxide removal. The surface may be a copper surface which may further comprise a bonding pad surface. Removing the oxide may further comprise applying a solution comprising citric acid or hydrochloric acid. Applying the passivation layer may further comprise applying a solution comprising a member of the azole family where the azole family member may further comprise BTA. The method may also further comprise completely applying the passivation layer 35 seconds after commencing its application.

Method For Enabling Conventional Wire Bonding To Copper-Based Bond Pad Features

US Patent:
6358847, Mar 19, 2002
Filed:
Mar 31, 1999
Appl. No.:
09/282596
Inventors:
Hugh Li - Santa Clara CA
Diane J. Hymes - San Jose CA
Assignee:
Lam Research Corporation - Fremont CA
International Classification:
H01L 2144
US Classification:
438687, 438692, 438693, 438745, 438747, 438754
Abstract:
A method is described comprising removing an oxide from a surface and then commencing application of a passivation layer to the surface within 5 seconds of the oxide removal. The surface may be a copper surface which may further comprise a bonding pad surface. Removing the oxide may further comprise applying a solution comprising citric acid or hydrochloric acid. Applying the passivation layer may further comprise applying a solution comprising a member of the azole family where the azole family member may further comprise BTA. The method may also further comprise completely applying the passivation layer 35 seconds after commencing its application.

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