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Jan R Hoekstra, 62164 Tomahawk St, Yorktown Hgts, NY 10598

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164 Tomahawk St, Yorktown Heights, NY 10598    914-2487675   

Yorktown Hts, NY   

Putnam Valley, NY   

Yorktown Hts, NY   

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Rein Jan Hoekstra

Rein Jan Hoekstra. From Wikipedia, the free encyclopedia. Jump to: navigation, search. Rein Jan Hoekstra (born 1941) was born in Dokkum. He graduated from ...

Us Patents

Part Locating, Mask Alignment And Mask Alignment Verification System

US Patent:
3989385, Nov 2, 1976
Filed:
Sep 16, 1974
Appl. No.:
5/506647
Inventors:
Frederick H. Dill - South Salem NY
Jan P. Hoekstra - Putnam Valley NY
Assignee:
International Business Machines Corporation - Yorktown Heights NY
International Classification:
G01B 1126
US Classification:
356152
Abstract:
A method and apparatus for locating target patterns with reference to a fixed axis. The apparatus includes a collimated light source providing a light beam to a rotating prism and optical flat producing a rotating light beam. A lens whose axis is the fixed axis focuses the beam to a spot on a surface containing a pattern comprising regularly spaced light scattering surfaces. A light sensor detects light from the rotating beam scattered by the target. An incremental shaft encoder provides a real time indication of spot position. The light sensor output provides a measure of target location and orientation with reference to the lens axis. The encoder can be used to control sampling apparatus and an A/D converter to provide regular digital samples of the light sensor output. The method includes providing a target with regularly spaced light scattering areas, rotating a light beam about an axis, detecting the scattered light and determining from the relative radial spot position at the time scattered light is detected the relationship between the beam axis and the target axis and orientation. The basic apparatus and method referred to above is useful in the manufacture of integrated circuits.

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