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Jane Ni Chang, 7615972 115Th St, Scottsdale, AZ 85255

Known as:
Jane N Chang Jane Fam Tr Chang Jane Tr Chang Jane M Chang Jane K Chang Jane C Anderson Janae Chang Sinh Vo Janae Perez
Related to:
Raymond A Wilson 57

Jane Chang Phones & Addresses

15972 115Th St, Scottsdale, AZ 85255    480-3933527    480-5638097   

Sugar Land, TX   

Boca Raton, FL   

Chandler, AZ   

Phoenix, AZ   

Maricopa, AZ   

Ranks

Licence: Virginia - Authorized to practice law Date: 2001
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Mentions for Jane Ni Chang

Career records & work history

Real Estate Brokers

Jane Chang Photo 1

Jane Chang

Specialties:
Buyer's Agent, Listing Agent
Work:
Anderson & Anderson Real Estate
15972 N. 115Th Way, Scottsdale, AZ 85255
480-2295989 (Office)

Lawyers & Attorneys

Jane Chang Photo 2

Jane Euna Chang - Lawyer

Licenses:
Virginia - Authorized to practice law 2001

Medicine Doctors

Jane Chang

Specialties:
Pediatrics
Work:
Weill Cornell PhysiciansPediatric Primary Care
505 E 70 St FL 5, New York, NY 10021
212-7463303 (phone) 212-7468458 (fax)
Site
Education:
Medical School
University of Vermont COM
Graduated: 1999
Conditions:
Acne, Overweight and Obesity, Acute Pharyngitis, Acute Upper Respiratory Tract Infections, Allergic Rhinitis, Anemia, Bacterial Pneumonia, Bronchial Asthma, Congenital Anomalies of the Heart, Croup, Disorders of Lipoid Metabolism, Fractures, Dislocations, Derangement, and Sprains, Gingival and Periodontal Diseases, Iron Deficiency Anemia, Meningitis, Otitis Media, Plantar Warts, Pneumonia, Polycystic Ovarian Syndrome (PCOS), Sexually Transmitted Diseases (STDs), Sickle-Cell Disease, Skin and Subcutaneous Infections, Thyroiditis, Vitamin D Deficiency
Languages:
English, Spanish
Description:
Dr. Chang graduated from the University of Vermont COM in 1999. She works in New York, NY and specializes in Pediatrics. Dr. Chang is affiliated with New York Presbyterian Hospital Columbia University Medical Center and New York Presbyterian Hospital Weill Cornell Medical Center.

Publications & IP owners

Us Patents

Uv/Halogen Metals Removal Process

US Patent:
5954884, Sep 21, 1999
Filed:
Mar 17, 1997
Appl. No.:
8/818890
Inventors:
Andrew Scott Lawing - Phoenix AZ
Robert T. Fayfield - St. Louis Park MN
Herbert H. Sawin - Chestnut Hill MA
Jane Chang - Cambridge MA
Assignee:
FSI International Inc. - Chaska MN
Massachusetts Institute of Technology - Cambridge MA
International Classification:
B08B 312
US Classification:
134 1
Abstract:
A chlorine based dry-cleaning system appropriate for removing metal contaminants from the surface of substrate is described in which the metal contaminant is chlorinated and reduced to a volatile metal chloride by UV irradiation. The process parameters of chlorine gas partial pressure, temperature, ultraviolet bandwidth, and/or the sequence of exposure of the substrate to the chlorine containing gas and to the ultraviolet radiation are selected so as to effect substantial removal of the metal without excessive substrate roughening.

Uv/Halogen Metals Removal Process

US Patent:
6183566, Feb 6, 2001
Filed:
Jun 1, 1999
Appl. No.:
9/323663
Inventors:
Andrew Scott Lawing - Phoenix AZ
Robert T. Fayfield - St. Louis Park MN
Herbert H. Sawin - Chestnut Hill MA
Jane Chang - Cambridge MA
Assignee:
FSI International, Inc. - Chaska MN
Massachusetts Institute of Technology - Cambridge MA
International Classification:
B08B 312
US Classification:
134 1
Abstract:
A chlorine based dry-cleaning system appropriate for removing metal contaminants from the surface of substrate is described in which the metal contaminant is chlorinated and reduced to a volatile metal chloride by UV irradiation. The process parameters of chlorine gas partial pressure, temperature, ultraviolet bandwidth, and/or the sequence of exposure of the substrate to the chlorine containing gas and to the ultraviolet radiation are selected so as to effect substantial removal of the metal without excessive substrate roughening.

Amazon

Jane Chang Photo 44

Lecture Notes On Principles Of Plasma Processing

Author:
Francis F. Chen, Jane P. Chang
Publisher:
Springer
Binding:
Paperback
Pages:
208
ISBN #:
0306474972
EAN Code:
9780306474972
Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts ...

Possible Relatives

Cynthia L Chang  David Chang  Dean A Chang  Deanna T Chang  Deborah Chang  Dana M Chang  Jane M Johnson  Jane E Johnston  Jane I Stanford 

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