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Janusz K Nowak, 921913 Canterbury Cir, Fort Worth, TX 76112

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1913 Canterbury Cir, Fort Worth, TX 76112    817-4924371   

Montclair, NJ   

Somers, NY   

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Publications & IP owners

Us Patents

Spin Transistor With Ultra-Low Energy Base-Collector Barrier

US Patent:
7453084, Nov 18, 2008
Filed:
May 24, 2005
Appl. No.:
11/136282
Inventors:
Janusz J. Nowak - Mahopac NY, US
Brian W. Karr - Savage MN, US
David H. Olson - St. Paul MN, US
Eric S. Linville - Chanhassen MN, US
Paul E. Anderson - Eden Prairie MN, US
Assignee:
Seagate Technology LLC - Scotts Valley CA
International Classification:
H01L 43/00
US Classification:
257 30, 257295, 257423, 257E43004, 977935
Abstract:
A transistor has an emitter, a spin-selective base, a collector, a first barrier interposed between the spin-selective base and the emitter, a second barrier interposed between the spin-selective base and the collector, and a transfer ratio of more than 10.

Method And Apparatus For Repairing A Shorted Tunnel Device

US Patent:
7505337, Mar 17, 2009
Filed:
Jan 12, 2006
Appl. No.:
11/330493
Inventors:
Janusz Jozef Nowak - Highland Mills NY, US
Mark Curtis Hayes Lamorey - South Burlington VT, US
Yu Lu - Hopewell Junction NY, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G11C 29/00
US Classification:
365200, 365158, 36518502
Abstract:
A method for repairing a shorted tunnel device includes the step of applying a stressing signal to the tunnel device. The stressing signal has an amplitude that is greater than an amplitude of a bias signal applied to the device during normal operation. One or more characteristics of the stressing signal are selected so as to substantially optimize a repair of the device. The amplitude and/or the duration of the stressing signal are preferably selected so as to remove a conductive filament shorting the device via a thermal mechanism (e. g. , heating).

Magnetically De-Coupling Magnetic Memory Cells And Bit/Word Lines For Reducing Bit Selection Errors

US Patent:
7782660, Aug 24, 2010
Filed:
Mar 20, 2008
Appl. No.:
12/052326
Inventors:
Solomon Assefa - Ossining NY, US
Sivananda K. Kanakasabapathy - Niskayuna NY, US
Janusz Jozef Nowak - Highland Mills NY, US
Philip L Trouilloud - Norwood NJ, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G11C 11/00
US Classification:
365158, 365171, 365173
Abstract:
Techniques for shielding magnetic memory cells from magnetic fields are presented. In accordance with aspects of the invention, a magnetic storage element is formed with at least one conductive segment electrically coupled to the magnetic storage element. At least a portion of the conductive segment is surrounded with a magnetic liner. The magnetic liner is operative to divert at least a portion of a magnetic field created by a current passing through the conductive segment away from the magnetic storage element.

Spin-Torque Based Memory Device With Read And Write Current Paths Modulated With A Non-Linear Shunt Resistor

US Patent:
8270208, Sep 18, 2012
Filed:
Feb 8, 2010
Appl. No.:
12/701867
Inventors:
Michael C. Gaidis - Yorktown Heights NY, US
Janusz J. Nowak - Hopewell Junction NY, US
Jonathan Z. Sun - Yorktown Heights NY, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G11C 11/00
US Classification:
365158, 365171
Abstract:
A spin-torque based memory device includes a write portion including a fixed ferromagnetic spin-polarizing layer, a spin-transport layer having a spin accumulation region formed above the fixed ferromagnetic spin-polarizing layer. The memory device further includes a read portion in electrical contact with the spin-transport layer. The read portion includes a free layer magnet, a read non-magnetic layer, and a reference layer. The memory device further includes a metal contact region formed overlying the read portion and a nonlinear resistor formed between an upper surface of the spin transport layer and the metal contact region and modulating write and read current paths depending on an applied voltage, thereby creating different current paths for write and read processes.

Phase Change Memory Structure Having An Electrically Formed Constriction

US Patent:
2007020, Aug 30, 2007
Filed:
Feb 28, 2006
Appl. No.:
11/364315
Inventors:
Janusz Nowak - Highland Mills NY, US
Yu Lu - Hopewell Junction NY, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
H01L 29/12
US Classification:
257613000
Abstract:
A PCM structure configurable for use as a nonvolatile storage element includes a first electrode, a first phase change material layer formed on at least a portion of an upper surface of the first electrode, at least one insulating layer formed on an upper surface of the first phase change material layer, at least a second phase change material layer formed on an upper surface of the at least first insulating layer, and a second electrode formed on at least a portion of an upper surface of the at least second phase change material layer. The insulating layer is configurable for forming an aperture therethrough in response to a first signal of a prescribed level applied between the first and second electrodes, the aperture constricting a flow of current in the PCM structure to thereby create a region of localized heating in the first and second phase change material layers in response to a second signal applied between the first and second electrodes.

Magnetic Tunnel Junction With Iron Dusting Layer Between Free Layer And Tunnel Barrier

US Patent:
2012024, Sep 27, 2012
Filed:
Mar 24, 2011
Appl. No.:
13/071043
Inventors:
Guohan Hu - Yorktown Heights NY, US
Janusz J. Nowak - Highland Mills NY, US
Philip L. Trouilloud - Norwood NJ, US
Daniel C. Worledge - Cortlandt Manor NY, US
Assignee:
INTERNATIONAL BUSINESS MACHINES CORPORATION - Armonk NY
International Classification:
H01L 29/82
H01L 21/8239
US Classification:
257421, 438 3, 257E29323, 257E21665
Abstract:
A magnetic tunnel junction (MTJ) for a magnetic random access memory (MRAM) includes a magnetic free layer having a variable magnetization direction; an iron (Fe) dusting layer formed on the free layer; an insulating tunnel barrier formed on the dusting layer; and a magnetic fixed layer having an invariable magnetization direction, disposed adjacent the tunnel barrier such that the tunnel barrier is located between the free layer and the fixed layer; wherein the free layer and the fixed layer have perpendicular magnetic anisotropy and are magnetically coupled through the tunnel barrier.

Magnetic Stacks With Perpendicular Magnetic Anisotropy For Spin Momentum Transfer Magnetoresistive Random Access Memory

US Patent:
2012026, Oct 25, 2012
Filed:
Apr 25, 2011
Appl. No.:
13/093287
Inventors:
Guohan Hu - Yorktown Heights NY, US
Janusz J. Nowak - Highland Mills NY, US
Daniel C. Worledge - Cortlandt Manor NY, US
Assignee:
INTERNATIONAL BUSINESS MACHINES CORPORATION - Armonk NY
International Classification:
H01L 29/82
H01L 21/8239
US Classification:
257421, 438 3, 257E29323, 257E21665
Abstract:
A magnetic tunnel junction (MTJ) includes a magnetic free layer, having a variable magnetization direction; an insulating tunnel barrier located adjacent to the free layer; a magnetic fixed layer having an invariable magnetization direction, the fixed layer disposed adjacent the tunnel barrier such that the tunnel barrier is located between the free layer and the fixed layer, wherein the free layer and the fixed layer have perpendicular magnetic anisotropy; and one or more of: a composite fixed layer, the composite fixed layer comprising a dusting layer, a spacer layer, and a reference layer; a synthetic antiferromagnetic (SAF) fixed layer structure, the SAF fixed layer structure comprising a SAF spacer located between the fixed layer and a second fixed magnetic layer; and a dipole layer, wherein the free layer is located between the dipole layer and the tunnel barrier.

Spin-Torque Based Memory Device With Read And Write Current Paths Modulated With A Non-Linear Shunt Resistor

US Patent:
2012028, Nov 15, 2012
Filed:
Jul 18, 2012
Appl. No.:
13/552033
Inventors:
Michael C. Gaidis - Yorktown Heights NY, US
Janusz J. Nowak - Hopewell Junction NY, US
Jonathan Z. Sun - Yorktown Heights NY, US
Assignee:
INTERNATIONAL BUSINESS MACHINES CORPORATION - Armonk NY
International Classification:
H01L 21/8246
US Classification:
438 3, 257E21665
Abstract:
A fabrication method includes forming a spin-polarizing layer, a spin transport layer on the spin polarizing layer on a substrate, a free layer magnet on the spin transport layer, a non-magnetic layer on the spin polarizing layer, a reference layer on the non-magnetic layer, and a hard mask layer on the reference layer, etching the hard mask layer and forming a read portion including the reference layer, the nonmagnetic layer and the free layer magnet, forming a nonlinear resistor layer on surfaces of the spin transport layer, the spacers, and the hard mask layer, etching the nonlinear resistor layer, the spin transport layer, and the spin polarizing layer and forming a write portion including the spin transport layer and the spin polarizing layer, forming an interlevel dielectric layer, forming a trench, exposing an upper surface of the reference layer of the read and write portions.

Isbn (Books And Publications)

Porosty (Lichenes)

Author:
Janusz Nowak
ISBN #:
8301049898

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