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Jian F Ma, 588627 NE 24Th St, Clyde Hill, WA 98004

Known as:
Jian Feng Ma Jian F Zhu Jian Feng
Related to:
Hsiao K Ma 69

Jian Ma Phones & Addresses

8627 NE 24Th St, Bellevue, WA 98004    425-4550759   

10037 23Rd St, Bellevue, WA 98004    425-4550759   

11100 11Th St, Bellevue, WA 98004    425-4550759   

Clyde Hill, WA   

Palo Alto, CA   

New York, NY   

San Bernardino, CA   

Kiona, WA   

Work

Company: GROUP HEALTH COOPERATIVE Address: 2700 152Nd Ave Ne, Redmond, WA 98052 Phones: 425-8835500 (Phone) 425-8835649 (Fax)

Education

School / High School: Columbia University / College of Physicians And Surgeons 1999

Languages

English

Awards

Healthgrades Honor Roll

Ranks

Certificate: Urology, 2007
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Mentions for Jian F Ma

Career records & work history

Lawyers & Attorneys

Jian Ma Photo 1

Jian Ma - Lawyer

Address:
The Law Offices of Jiahe
108-5865188 (Office)
Licenses:
New York - Currently registered 2002
Education:
Franklin Pierce
Peking University
Jian Ma Photo 2

Jian Ma - Lawyer

ISLN:
924295330
Admitted:
2002

Medicine Doctors

Jian Ma Photo 3

Dr. Jian F Ma, Redmond WA - MD (Doctor of Medicine)

Specialties:
Urology
Address:
GROUP HEALTH COOPERATIVE
2700 152Nd Ave Ne, Redmond, WA 98052
425-8835500 (Phone) 425-8835649 (Fax)
Certifications:
Urology, 2007
Awards:
Healthgrades Honor Roll
Languages:
English
Education:
Medical School
Columbia University / College of Physicians And Surgeons
Graduated: 1999
Jian Ma Photo 4

Jian Ma

Specialties:
Internal Medicine
Rheumatology
Education:
Shanghai Railway Medical University (1982)
Jian Ma Photo 5

Jian F Ma, Redmond WA

Specialties:
Urologist
Address:
2700 152Nd Ave Ne, Redmond, WA 98052
11511 Ne 10Th St, Bellevue, WA 98004
Board certifications:
American Board of Urology Certification in Urology

License Records

Jian Ma

Licenses:
License #: 065037359 - Expired
Issued Date: Jul 12, 2010
Expiration Date: Sep 30, 2015
Type: Licensed Certified Public Accountant
License #: 239025348 - Expired
Issued Date: Feb 18, 2011
Expiration Date: Sep 30, 2015
Type: Registered Certified Public Accountant

Jian Ma

Licenses:
License #: 239025348 - Expired
Issued Date: Feb 18, 2011
Expiration Date: Sep 30, 2015
Type: Registered Certified Public Accountant
License #: 065037359 - Expired
Issued Date: Jul 12, 2010
Expiration Date: Sep 30, 2015
Type: Licensed Certified Public Accountant

Jian Ma

Licenses:
License #: DH13136 - Expired
Category: DENTISTRY
Issued Date: Sep 12, 2004
Renew Date: Mar 31, 2007
Expiration Date: Mar 31, 2007
Type: Dental Hygienist

Jian Ma resumes & CV records

Resumes

Jian Ma Photo 41

Senior Director, Patent Licensing

Location:
Bellevue, WA
Industry:
Computer Hardware
Work:
Intellectual Ventures Jun 2008 - Sep 2013
Principal Patent Engineer Microsoft Jun 2008 - Sep 2013
Senior Director, Patent Licensing Qualcomm 2004 - 2008
Senior Patent Agent
Education:
University of Washington
Skills:
Intellectual Property, Licensing, Technology Transfer, Software Development, Integration, Patents, Rf, Invention, Ic, Digital Signal Processors, Strategic Partnerships, System Architecture, Ip, Mobile Communications, Cmos, Mobile Devices, Business Strategy, Entrepreneurship, Software Engineering, Systems Engineering, Cross Functional Team Leadership, Wireless, Patent Prosecution, Project Management, Medical Devices, Due Diligence, R&D, Patent Litigation, Lte, Product Development, Cloud Computing, Engineering Management, Start Ups, Embedded Systems, Mobile Technology, Optics, Business Development, Mergers and Acquisitions, Venture Capital, Semiconductors, Technology Evaluation, Telecommunications, Asic, Soc, Strategy, Algorithms, Program Management, Wireless Communications Systems, Perl, Commercialization
Jian Ma Photo 42

Jian Ma

Jian Ma Photo 43

Jian Ma

Location:
United States
Jian Ma Photo 44

Manager At Edt

Location:
United States

Publications & IP owners

Us Patents

Advanced Mask Patterning With Patterning Layer

US Patent:
7460209, Dec 2, 2008
Filed:
Mar 28, 2005
Appl. No.:
11/092993
Inventors:
Jian Ma - San Jose CA, US
Phil Freiberger - Santa Clara CA, US
Karmen Yung - Sunnyvale CA, US
Frederick Chen - Cupertino CA, US
Chaoyang Li - San Jose CA, US
Steve Mak - Pleasanton CA, US
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
G03B 27/42
G03F 1/00
US Classification:
355 53, 430 5
Abstract:
An imaging structure such as a mask or reticle may be fabricated using a patterning layer on an imaging layer. The patterning layer may have substantially different etch properties than the imaging layer. A first etch process may be selective of the patterning layer with respect to a resist layer. A second etch process may be selective of the imaging layer with respect to the patterning layer.

High Precision Compact Rotation Angle Absolute Encoder

US Patent:
7615737, Nov 10, 2009
Filed:
May 8, 2007
Appl. No.:
11/745693
Inventors:
Jonathan M. Saint Clair - Seattle WA, US
Bing Wen - Camarillo CA, US
Jian Ma - Thousand Oaks CA, US
Mitchell D. Voth - Lake Tapps WA, US
Assignee:
The Boeing Company - Chicago IL
International Classification:
G01D 5/34
US Classification:
25023113, 25023118
Abstract:
An angle absolute encoder comprises a code rod encoded with code marks configured in segments, such that each successive segment has an increasing number of code marks, arranged at an angle to the rotation axis depending on the number of code marks in each segment. The angle of the code mark is determined by the number of code marks in the respective segment, the width of the segment parallel to the rotation axis of the code rod and the radius of the code rod. The angular resolution increases according to the number of code marks in each segment. Light is reflected from or transmitted through the code marks and detected by a light detector to determine absolute angle position.

Advanced Mask Patterning With Patterning Layer

US Patent:
2008030, Dec 18, 2008
Filed:
Aug 20, 2008
Appl. No.:
12/194689
Inventors:
JIAN MA - San Jose CA, US
Phil Freiberger - Santa Clara CA, US
Karmen Yung - Sunnyvale CA, US
Frederick Chen - Cupertino CA, US
Chaoyang Li - San Jose CA, US
Steve Mak - Pleasanton CA, US
Assignee:
INTEL CORPORATION - SANTA CLARA CA
International Classification:
B44C 1/22
B32B 7/02
US Classification:
216 47, 428212
Abstract:
An imaging structure such as a mask or reticle may be fabricated using a patterning layer on an imaging layer. The patterning layer may have substantially different etch properties than the imaging layer. A first etch process may be selective of the patterning layer with respect to a resist layer. A second etch process may be selective of the imaging layer with respect to the patterning layer.

Phase-Shift Photomask And Patterning Method

US Patent:
2011015, Jun 30, 2011
Filed:
Dec 30, 2009
Appl. No.:
12/655460
Inventors:
Bennett Olson - Livermore CA, US
Max Lau - San Ramon CA, US
Cheng-hsin Ma - San Jose CA, US
Jian Ma - San Jose CA, US
Andrew T. Jamieson - San Jose CA, US
International Classification:
G03F 1/00
G03F 7/20
US Classification:
430 5, 430322, 430323, 430324
Abstract:
A phase shift photomask blank has a quartz substrate, a lower chrome layer, a light-absorbing MoSi layer, and an upper chrome layer. This mask can be patterned in various ways to form a patterned photomask with both phase shift and binary areas.

Solid State Image Sensor With On-Chip Filter And Extended Spectral Response

US Patent:
2019009, Mar 28, 2019
Filed:
Sep 22, 2017
Appl. No.:
15/713217
Inventors:
- San Diego CA, US
Todor Georgiev GEORGIEV - Sunnyvale CA, US
Jian MA - San Diego CA, US
Sergiu GOMA - San Diego CA, US
International Classification:
H01L 27/146
H01L 31/0216
H04N 5/374
Abstract:
Various embodiments are directed to an image sensor that includes a first sensor portion and a second sensor portion. The second sensor portion may be positioned relative to the first sensor portion such that the second sensor portion may initially detect light entering the image sensor, and some of that light passes through the second sensor portion and may be detected by the first sensor portion. In some embodiments, one more optical filters may be disposed within the image sensor. The one or more optical filters may include at least one of a dual bandpass filter disposed above the second photodetector or a narrow bandpass filter disposed between the first photodetector and the second photodetector.

Protection Of Thin Film Transistors In A Display Element Array From Visible And Ultraviolet Light

US Patent:
2015034, Dec 3, 2015
Filed:
Sep 29, 2014
Appl. No.:
14/500690
Inventors:
- San Diego CA, US
Tsongming Kao - Sunnyvale CA, US
Jian Ma - Carlsbad CA, US
Lixia Zhou - Milpitas CA, US
Tallis Young Chang - San Diego CA, US
Shu-Jhih Chen - Taoyuan County, TW
John Hyunchul Hong - San Clemente CA, US
International Classification:
G02B 26/00
G02B 5/00
G02B 5/20
H01L 27/12
Abstract:
A display assembly includes an array of display elements disposed between a first substrate and a second substrate, the array of display elements including one or more thin film transistors (TFTs). A black mask arrangement is disposed between the first substrate and the second substrate, the black mask arrangement being configured to prevent light entering the display assembly from reaching the TFTs.

Embedded Surface Diffuser

US Patent:
2015010, Apr 23, 2015
Filed:
Oct 18, 2013
Appl. No.:
14/057975
Inventors:
- San Diego CA, US
Ion Bita - San Jose CA, US
Jian J. Ma - Carlsbad CA, US
Sapna Patel - Fremont CA, US
Lai Wang - Milpitas CA, US
Assignee:
QUALCOMM MEMS Technologies, Inc. - San Diego CA
International Classification:
G02B 3/00
G02B 1/12
G02B 1/11
US Classification:
359619, 216 26
Abstract:
A diffuser stack may include a first film with a first index of refraction and a second film proximate the first film. The second film may have a second index of refraction that is higher than the first index of refraction. An interface between the first film and the second film may include an array of microlenses of substantially randomized sizes. The microlenses may include sections of features that are substantially spherical, polygonal, conical, etc. The first and second films may be disposed between an array of pixels and a substantially transparent substrate. An anti-reflective layer may be disposed between the first film and the second film.

Illumination Device With Spaced-Apart Diffractive Media

US Patent:
2015009, Apr 9, 2015
Filed:
Oct 9, 2013
Appl. No.:
14/050030
Inventors:
- San Diego CA, US
Zhengwu Li - Milpitas CA, US
Jian J. Ma - Carlsbad CA, US
John H. Hong - San Clemente CA, US
Assignee:
QUALCOMM Mems Technologies, Inc. - San Diego CA
International Classification:
F21V 8/00
US Classification:
362606, 362611, 295272
Abstract:
This disclosure provides systems, methods and apparatus for an illumination system. In one aspect, the illumination system is a light guide that includes spaced-apart regions of medium containing diffractive features. For example, the medium may include holographic medium having holograms that are configured to redirect light, propagating through the light guide, out of the light guide. The spaces between the spaced-apart regions of media may be filled with a material having a lower refractive index than the light guide, thereby functioning as a reflective cladding in those spaces.

Isbn (Books And Publications)

Soil, Fertilizer, And Plant Silicon Research In Japan

Author:
Jian Feng Ma
ISBN #:
0444511660

The Noodle Maker

Author:
Jian Ma
ISBN #:
0374223076

Stick Out Your Tongue

Author:
Jian Ma
ISBN #:
0374269882

The Noodle Maker

Author:
Jian Ma
ISBN #:
0701176059

Possible Relatives

David V Ma  D C Ma  Debbie N Ma  Danny K Ma  Dao N Ma  Derek T Ma  Dat J Ma  Jian H Lee  Jian M Li  Jian Q Lin 

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