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John A Defranco, 46730 Sunset Dr, San Carlos, CA 94070

Known as:
John Andrew Defranco John Andrrw Defranco John A John John Franco John De John Defrance

John Defranco Phones & Addresses

730 Sunset Dr, San Carlos, CA 94070   

Redwood City, CA   

Rochester, NY   

206 Quarry St, Ithaca, NY 14850   

Freeville, NY   

Goleta, CA   

426 E Buffalo St APT 6, Ithaca, NY 14850    607-2722367   

Work

Position: Sales Occupations

Education

Degree: Associate degree or higher
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Mentions for John A Defranco

Career records & work history

Medicine Doctors

John N. Defranco

Specialties:
Urology
Work:
Specialized Urological ConsultantsAssociated Urological Specialists LLC
10400 Southwest Hwy, Chicago Ridge, IL 60415
708-4238706 (phone) 708-4238659 (fax)
Site
Specialized Urological Consultants
16632 107 St, Orland Park, IL 60467
708-3496350 (phone) 708-3499153 (fax)
Site
Specialized Urological Consultants
10400 Southwest Hwy, Chicago Ridge, IL 60415
708-4238706 (phone) 708-4238659 (fax)
Site
Education:
Medical School
Rosalind Franklin University/ Chicago Medical School
Graduated: 1990
Procedures:
Circumcision, Cystourethroscopy, Bladder Repair, Cystoscopy, Kidney Stone Lithotripsy, Nephrectomy, Prostate Biopsy, Transurethral Resection of Prostate, Urinary Flow Tests, Vasectomy
Conditions:
Male Infertility, Prostate Cancer, Benign Prostatic Hypertrophy, Bladder Cancer, Calculus of the Urinary System, Erectile Dysfunction (ED), Kidney Cancer, Prostatitis, Testicular Cancer, Undescended and Retractile Testicle, Urinary Incontinence, Urinary Tract Infection (UT)
Languages:
Arabic, English
Description:
Dr. Defranco graduated from the Rosalind Franklin University/ Chicago Medical School in 1990. He works in Orland Park, IL and 2 other locations and specializes in Urology. Dr. Defranco is affiliated with Advocate Christ Medical Center, Advocate South Suburban Hospital, Advocate Trinity Hospital and Palos Community Hospital.

John Defranco resumes & CV records

Resumes

John Defranco Photo 33

John Andrew Defranco

Location:
730 Sunset Dr, San Carlos, CA 94070
Industry:
Research
Work:
Orthogonal, Inc. Jan 2013 - Jan 2019
Chief Executive Officer at Orthogonal Inc Cornell University 2003 - 2009
Graduate Researcher
Education:
Cornell University 2002 - 2008
Doctorates, Doctor of Philosophy, Applied Physics Uc Santa Barbara 1997 - 2002
Master of Science, Masters, Physics
Skills:
Thin Films, Nanotechnology, Afm, Nanofabrication, Mems, Optics, Microfabrication, Photolithography, Cvd, Pecvd, Microfluidics, Sputtering
Languages:
English
John Defranco Photo 34

John Defranco

John Defranco Photo 35

John Defranco

John Defranco Photo 36

John Defranco

John Defranco Photo 37

John Defranco

Skills:
Microsoft Office, Microsoft Word, Process Improvement
John Defranco Photo 38

John Defranco

Publications & IP owners

Us Patents

Method For Forming A Multicolor Oled Device

US Patent:
2013023, Sep 12, 2013
Filed:
Apr 27, 2011
Appl. No.:
13/638062
Inventors:
Jin-Kyun Lee - Incheon, KR
Alexander Zakhidov - Ithaca NY, US
John Defranco - Ithaca NY, US
Assignee:
ORTHOGONAL, INC. - Ithaca NY
International Classification:
H01L 51/56
US Classification:
438 35
Abstract:
A method is provided for forming a multi-color OLED device that includes providing a substrate, coating the substrate with a fluorinated photoresist solution to form a first photo-patternable layer and exposing it to produce a first pattern of exposed fluorinated photoresist material and a second pattern of unexposed fluorinated photoresist material, developing the photo-patternable layer with a fluorinated solvent to remove the second pattern of unexposed fluorinated photoresist material without removing the first pattern of exposed fluorinated photoresist material, depositing a first organic light-emitting material over the substrate to form a first organic light-emitting layer for emitting a first color of light and applying the first pattern of exposed fluorinated photoresist material to control the removal of a portion of the first organic light-emitting layer. A second fluorinated photoresist solution is then coated over the first patterened organic light-emitting layer and exposed to form a third pattern of exposed fluorinated photoresist material having a pattern different from the first pattern and a fourth pattern of unexposed fluorinated photoresist material, and developing the photo-patternable layer in a fluorinated solvent to remove the fourth pattern of unexposed fluorinated photoresist material without removing the third pattern of exposed fluorinated photoresist material, depositing at least a second light-emitting material to form a second light-emitting layer for emitting a second color of light that is different than the first color of light and applying the third pattern of exposed fluorinated photoresist material to control the removal of a portion of the second organic light-emitting layer.

Cross-Linkable Fluorinated Photopolymer

US Patent:
2020030, Sep 24, 2020
Filed:
Jun 5, 2020
Appl. No.:
16/893713
Inventors:
- Rochester NY, US
Douglas Robert ROBELLO - Webster NY, US
John Andrew DEFRANCO - Rochester NY, US
Diane Carol FREEMAN - Pittsford NY, US
Frank Xavier BYRNE - Webster NY, US
Assignee:
Orthogonal, Inc. - Rochester NY
International Classification:
G03F 7/038
G03F 7/40
G03F 7/20
G03F 7/30
H01L 21/027
C08F 220/34
G03F 7/004
G03F 7/075
H01L 21/3105
H01L 21/311
G03F 7/11
Abstract:
A photosensitive composition is disclosed including a fluorinated photo cross-linkable polymer provided in a fluorinated solvent such as a hydrofluoroether. The photo cross-linkable polymer includes a first repeating unit having a fluorine-containing group but not a cinnamate group, and a second repeating unit having a fluorine-containing cinnamate group. The polymer has a total fluorine content in a range of 30 to 60% by weight. The composition can be used to form patterned barrier or dielectric structures over substrates and devices such as organic electronic devices.

Cross-Linkable Fluorinated Photopolymer

US Patent:
2019022, Jul 25, 2019
Filed:
Apr 1, 2019
Appl. No.:
16/371372
Inventors:
- Rochester NY, US
Douglas Robert ROBELLO - Webster NY, US
John Andrew DEFRANCO - Rochester NY, US
Diane Carol FREEMAN - Pittsford NY, US
Frank Xavier BYRNE - Webster NY, US
Assignee:
Orthogonal, Inc. - Rochester NY
International Classification:
G03F 7/038
G03F 7/075
G03F 7/004
C08F 220/34
H01L 21/027
G03F 7/20
G03F 7/40
G03F 7/30
Abstract:
A photosensitive composition is disclosed including a fluorinated photo cross-linkable polymer provided in a fluorinated solvent such as a hydrofluoroether. The photo cross-linkable polymer includes a first repeating unit having a fluorine-containing group but not a cinnamate group, and a second repeating unit having a fluorine-containing cinnamate group. The polymer has a total fluorine content in a range of 30 to 60% by weight. The composition can be used to form patterned barrier or dielectric structures over substrates and devices such as organic electronic devices.

Cross-Linkable Fluorinated Photopolymer

US Patent:
2018027, Sep 27, 2018
Filed:
Mar 19, 2018
Appl. No.:
15/924829
Inventors:
- Rochester NY, US
Douglas Robert ROBELLO - Webster NY, US
John Andrew DEFRANCO - Rochester NY, US
Diane Carol FREEMAN - Pittsford NY, US
Frank Xavier BYRNE - Webster NY, US
International Classification:
G03F 7/038
H01L 21/027
G03F 7/40
G03F 7/30
G03F 7/20
C08F 220/34
G03F 7/004
G03F 7/075
Abstract:
A photosensitive composition is disclosed including a fluorinated photo cross-linkable polymer provided in a fluorinated solvent such as a hydrofluoroether. The photo cross-linkable polymer includes a first repeating unit having a fluorine-containing group but not a cinnamate group, and a second repeating unit having a fluorine-containing cinnamate group. The polymer has a total fluorine content in a range of 30 to 60% by weight. The composition can be used to form patterned barrier or dielectric structures over substrates and devices such as organic electronic devices.

Patterning Devices Using Branched Fluorinated Photopolymers

US Patent:
2018003, Feb 1, 2018
Filed:
Oct 9, 2017
Appl. No.:
15/728017
Inventors:
- Rochester NY, US
Charles Warren Wright - Fairport NY, US
Diane Carol Freeman - Pittsford NY, US
Frank Xavier Byrne - Webster NY, US
John Andrew DeFranco - Rochester NY, US
Sandra Rubsam - Webster NY, US
Terrence Robert O'Toole - Webster NY, US
International Classification:
G03F 7/038
G03F 7/039
G03F 7/004
G03F 7/32
Abstract:
A fluorinated photopolymer composition is disclosed having a branched copolymer provided in a fluorinated solvent. The copolymer includes a branching unit, a first repeating unit having a fluorine-containing group, and a second repeating unit having a solubility-altering reactive group. The branched fluorinated photopolymer composition is particularly suited for the fabrication of organic electronic and bioelectronic devices, or other devices having sensitive active organic materials.

Photolithographic Patterning Of Devices

US Patent:
2017021, Aug 3, 2017
Filed:
Jul 31, 2015
Appl. No.:
15/501128
Inventors:
- Rochester NY, US
John Andrew DEFRANCO - Rochester NY, US
Frank Xavier BYRNE - Webster NY, US
International Classification:
G03F 7/00
C11D 7/50
G03F 7/004
H01L 51/00
Abstract:
A method of patterning a device is disclosed using a resist precursor structure having at least two fluoropolymer layers. A first fluoropolymer layer includes a first fluoropolymer material having a fluorine content of at least 50% by weight and is substantially soluble in a first hydrofluoroether solvent or in a first perfluorinated solvent, but substantially less soluble in a second hydrofluoroether solvent relative to both the first hydrofluoroether and the first perfluorinated solvent. The second fluoropolymer layer includes a second fluoropolymer material having a fluorine content less than that of the first fluoropolymer material and is substantially soluble in the first or second hydrofluoroether solvents, but substantially less soluble in the first perfluorinated solvent relative to both the first and second hydrofluoroether solvents.

Cross-Linkable Fluorinated Photopolymer

US Patent:
2016034, Dec 1, 2016
Filed:
Feb 4, 2015
Appl. No.:
15/117032
Inventors:
- Rochester NY, US
Douglas Robert ROBELLO - Webster NY, US
John Andrew DEFRANCO - Rochester NY, US
Diane Carol FREEMAN - Pittsford NY, US
Frank Xavier BYRNE - Webster NY, US
International Classification:
G03F 7/038
G03F 7/004
Abstract:
A photosensitive composition is disclosed including a fluorinated photo cross-linkable polymer provided in a fluorinated solvent such as a hydrofluoroether. The photo cross-linkable polymer includes a first repeating unit having a fluorine-containing group but not a cinnamate group, and a second repeating unit having a fluorine-containing cinnamate group. The polymer has a total fluorine content in a range of 30 to 60% by weight. The composition can be used to form patterned barrier or dielectric structures over substrates and devices such as organic electronic devices.

Process For Patterning Materials In Thin-Film Devices

US Patent:
2015036, Dec 17, 2015
Filed:
Feb 24, 2012
Appl. No.:
13/985194
Inventors:
John DeFranco - Rochester NY, US
Mike Miller - Xenia OH, US
Fox Holt - Dallas TX, US
Assignee:
Orthogonal, Inc. - Ithaca NY
International Classification:
H01L 51/00
H01L 23/50
H01L 51/52
H01L 51/10
H01L 51/05
H01L 51/56
Abstract:
A method for forming a device includes providing a substrate; depositing a single fluorinated photo-patternable layer over the substrate; forming a first and a second active layer over the substrate; and applying the photo-patternable layer to form a first pattern within the first active layer and a second, different pattern within the second active layer. Particular examples disclosed in the present disclosure can be employed to form thin film electronics devices, including OLED devices and TFTs with a reduced number of photolithographic steps.

Possible Relatives

Debra B Defranco  Daniel P Defranco  Dennis J Defranco  Diana L Defranco  Frank Defranco  Gary M Defranco  Jason R Defranco  John M Johnson  John Stamps  John R Stan 

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