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John Rice Swyers, 658602 Hathaway Dr, Austin, TX 78757

Known as:
John R Swyers John Swyers Rice
Related to:
Dana E Lyon 70

John Swyers Phones & Addresses

Austin, TX   

Fort Worth, TX   

Mansfield, MA   

Work

Company: Millennium community services Apr 2013 Position: Psychotherapist

Education

School / High School: CalSouthern University PsyD program in process- Irvine, CA 2010 Specialities: PsyD in Psychology
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John Swyers resumes & CV records

Resumes

John Swyers Photo 15

Co-Founder

Location:
4517 Colorado Xing, Austin, TX 78731
Industry:
Semiconductors
Work:
Applied Materials - Austin, Texas Area Mar 2008 - Jun 2011
Technical Support Engineer Principal Applied Materials - Austin, Texas Area Sep 2000 - Mar 2008
Field Process Support Technologist Fourth State Technology, Inc. - Austin, Texas Area Sep 1993 - Sep 1998
Sr Applications Engineer AMD 1983 - 1993
Sr. Process Engineer Sematech 1988 - 1991
Member Technical Staff
Education:
The University of Texas at Austin 2011 - 2012
Business Foundations Certification, McCombs School of Business The University of Texas at Austin 1978 - 1983
Bachelor of Science, Physics
Skills:
Automation, Continuous Improvement, Cvd, Design of Experiments, Cross Functional Team Leadership, Characterization, Analog, Manufacturing, Lithography, Ic, Failure Analysis, Engineering Management, Engineering, Electronics, Leadership, Metrology, Photovoltaics, Plasma Etch, Project Management, Nanotechnology, Manufacturing Engineering, Materials Science, Product Development, Rf, Spc, Photolithography, Statistical Data Analysis, Data Mining, Sensors, Troubleshooting, Data Analysis, Scanning Electron Microscopy, Semiconductors, Machine Learning, Web Development, Python, Sql, Nosql, Problem Solving, Etching, Plasma Diagnostics, Predictive Maintenance, Predictive Analytics, Analytics, Microsoft Excel, Microsoft Word, Microsoft Office, Project Management Body of Knowledge, Microsoft Powerpoint
Interests:
Resource Optimization Methodology
Remote Sensors
Datamining
Factory Automation
Marketing and Mes
Landscape Architecture and Design
Predictive Maintenance
Native and Adaptable Plants of Texas
Sustainable Design
Horticulture
John Swyers Photo 16

Patrol Agent

Work:
Us Border Patrol
Patrol Agent
John Swyers Photo 17

John Swyers - Talihina, OK

Work:
Millennium Community Services Apr 2013 to 2000
Psychotherapist John Swyers Counseling - Sitka, AK Mar 2011 to Feb 2013
Owner Sitka Counseling and Prevention Services - Sitka, AK Sep 2010 to Mar 2011
Manager outpatient services Varangon - Norman, OK Feb 2008 to Aug 2010
Therapist Grace Church of the Nazarene - Norman, OK Aug 2006 to Nov 2007
Senior Pastor Sundance Counseling Services Sep 2006 to Oct 2006
Therapist Arkansas Counseling Associates - Walnut Ridge, IN Nov 2004 to Jun 2006
Therapist and Counselor Life Strategies Sep 2004 to Nov 2004
Therapist and counselor The Salvation Army I Jun 1990 to Jun 2004
Commanding Officer
Education:
CalSouthern University PsyD program in process - Irvine, CA 2010 to 2013
PsyD in Psychology Light University 2010 Supervising therapists 6 CEU's ZUR institute 2010 The University of Oklahoma - Norman, OK 1999 to 2003
MHR in Psychological Counseling Texas Wesleyan University - Fort Worth, TX 1971 East Texas State University - Commerce, TX 1970

Publications & IP owners

Us Patents

Predictive Maintenance For Third Party Support Equipment

US Patent:
8560106, Oct 15, 2013
Filed:
Nov 29, 2011
Appl. No.:
13/306646
Inventors:
John R. Swyers - Austin TX, US
Manjunath Yedatore - Austin TX, US
Tony L. Davis - Austin TX, US
Donn Turner - Malta NY, US
Michael W. Johnson - Austin TX, US
Assignee:
Applied Materials, Inc. - Santa Clara CA
International Classification:
G05B 23/00
US Classification:
700106, 700 49, 700 79, 700108, 700121, 700 96
Abstract:
A server receives equipment data from third party support equipment during operation of the third party support equipment in a manufacturing environment. The server receives the equipment data via a first port on the third party support equipment. The third party support equipment communicates with a process tool via a second port on third party support equipment. The server determines a future state of the third party support equipment based on the equipment data and notifies a user of the future state of the third party support equipment.

Method And System For Conducting Races

US Patent:
6293548, Sep 25, 2001
Filed:
Mar 31, 2000
Appl. No.:
9/542043
Inventors:
John Swyers - Mansfield MA
Patrick F. McGinnis - Goleta CA
International Classification:
A63F 914
US Classification:
273236
Abstract:
A method of conducting a racing competition among a plurality of racers comprising the steps of conducting qualifying races among the plurality of racers; awarding qualifying (Q) credits based on a predetermined formula and the results of each of the plurality of racers' qualifying races; arranging the racers in a reverse-qualifying order arrangement for the start of the race and assigning passing (P) credit values to the plurality of racers based on a predetermined formula and the racer's position in the reverse-qualifying starting order arrangement. The race is then started with the plurality of racers arranged in the reverse-qualifying order arrangement, the plurality of the racers are then awarded P credits during the course of the race based on a predetermined formula and the other racers each of the plurality of racers passes. At the finish of the race, the finish time and position of each of the plurality of racers is determined. Finishing (F) credits are then awarded to the plurality of racers finishing the race based a predetermined formula and the finish time and position of each of the plurality of racers.

Plasma Monitoring And Control Method And System

US Patent:
5939886, Aug 17, 1999
Filed:
Nov 18, 1996
Appl. No.:
8/751636
Inventors:
Terry Richard Turner - Austin TX
James Douglas Spain - Georgetown TX
John Rice Swyers - Austin TX
Assignee:
Advanced Energy Industries, Inc.
International Classification:
G01N 2766
G01N 2702
G01R 2704
US Classification:
324464
Abstract:
A plasma monitoring and control method and system monitor and control plasma in an electronic device fabrication reactor by sensing the voltage of the radio frequency power that is directed into the plasma producing gas at the input to the plasma producing environment of the electronic device fabrication reactor. The method and system further sense the current and phase angle of the radio frequency power directed to the plasma producing gas at the input to the plasma producing environment. Full load impedance is measured and used in determining characteristics of the plasma environment, including not only discharge and sheath impedances, but also chuck and wafer impedances, primary ground path impedance, and a secondary ground path impedance associated with the plasma environment. This permits end point detection of both deposition and etch processes, as well as advanced process control for electronic device fabrication. The invention also provides automatic gain control features for applying necessary signal gain control functions during the end point and advanced process control operations.

Plasma Monitoring And Control Method And System

US Patent:
5576629, Nov 19, 1996
Filed:
Oct 24, 1994
Appl. No.:
8/328069
Inventors:
Terry R. Turner - Austin TX
James D. Spain - Georgetown TX
John R. Swyers - Austin TX
Assignee:
Fourth State Technology, Inc. - Austin TX
International Classification:
C23C 1400
C23C 1434
H01L 21306
US Classification:
324709
Abstract:
A plasma monitoring and control method and system monitor and control plasma in an electronic device fabrication reactor by sensing the voltage of the radio frequency power that is directed into the plasma producing gas at the input to the plasma producing environment of the electronic device fabrication reactor. The method and system further senses the current and phase angle of the radio frequency power directed to the plasma producing gas at the input to the plasma producing environment. Full load impedance is measured and used in determining characteristics of the plasma environment, including not only discharge and sheath impedances, but also chuck and wafer impedances, primary ground path impedance, and a secondary ground path impedance associated with the plasma environment. This permits end point detection of both deposition and etch processes, as well as advanced process control for electronic device fabrication. The invention also provides automatic gain control features for applying necessary signal gain control functions during the end point and advanced process control operations.

Method And System For Controlling Auto Races

US Patent:
2019038, Dec 19, 2019
Filed:
Jun 28, 2018
Appl. No.:
16/021376
Inventors:
John Swyers - Mansfield MA, US
International Classification:
A63K 1/00
Abstract:
A method of conducting a racing competition among a plurality of race cars including conducting qualifying trials among the plurality race cars, arranging the race cars in qualifying order arrangement for the start of the race, altering at least one of time, distance or speed parameters of one or more of the plurality of race cars during the race, and determining the winner and order of race finish at the completion of the race based on the parameters

Method And System For Controlling Auto Races

US Patent:
2019027, Sep 12, 2019
Filed:
May 29, 2019
Appl. No.:
16/424778
Inventors:
John Swyers - Mansfield MA, US
International Classification:
A63F 3/00
A63K 1/00
A63K 3/00
Abstract:
A method of conducting a racing competition among a plurality of race cars including conducting qualifying trials among the plurality race cars, arranging the race cars in qualifying order arrangement for the start of the race, altering at least one of time, distance or speed parameters of one or more of the plurality of race cars during the race, and determining the winner and order of race finish at the completion of the race based on the parameters

Method And System For Controlling Auto Races

US Patent:
2018033, Nov 29, 2018
Filed:
Jun 28, 2018
Appl. No.:
16/021434
Inventors:
John Swyers - Mansfield MA, US
International Classification:
A63F 3/00
Abstract:
A method of conducting a racing competition among a plurality of race cars including conducting qualifying trials among the plurality race cars, arranging the race cars in qualifying order arrangement for the start of the race, altering at least one of time, distance or speed parameters of one or more of the plurality of race cars during the race, and determining the winner and order of race finish at the completion of the race based on the parameters

Continuous Entrance/Exit Port For Chambers Of Different Pressure And/Or Gases

US Patent:
2015025, Sep 17, 2015
Filed:
Mar 12, 2014
Appl. No.:
14/206057
Inventors:
John Swyers - Mansfield MA, US
International Classification:
B65G 49/00
H01J 37/32
B08B 13/00
F27B 9/04
B65H 20/00
Abstract:
An improved port, for chambers of different pressures or gases, that permits continuous material to enter and exit a processing chamber with greatly reduced leakage between adjacent chambers or the atmosphere. The dimensions of the gap between the material and port and the length of the port will reduce air leakage into the processing chambers due to the flow characteristics of gases. The elongated port will improve conditions in chambers that utilize reduced pressure or controlled atmosphere to isolate the product and process from the degrading effects caused by air in the process zone. Thus, the reduced air leakage will improve product quality and can also reduce equipment costs required in building and maintaining the machine.

Possible Relatives

Donna K Swyers  Eric S Swyers  Howard B Swyers  Adam M Swyers  James A Swyers  Judy Swyers  Kenneth R Swyers  John M Johnson  John Stamps  John R Stan 

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