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Joseph E MclellanUxbridge, MA

Joseph Mclellan Phones & Addresses

Uxbridge, MA   

108 West St, Woonsocket, RI 02895   

Brimfield, MA   

Framingham, MA   

40 Anzio Rd, Framingham, MA 01702   

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Position: Production Occupations

Education

Degree: High school graduate or higher

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Joseph Mclellan

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Joseph Mclellan

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Wikipedia

Joseph Mclellan Photo 29

Joseph Mclellan

Joseph Duncan McLellan was The Washington Post's music critic for more than three decades as well as a chess and book reviewer. ...

Us Patents

Structured Smudge-Resistant Coatings And Methods Of Making And Using The Same

US Patent:
2009004, Feb 12, 2009
Filed:
Aug 11, 2008
Appl. No.:
12/189485
Inventors:
Brian T. Mayers - Somerville MA, US
Joseph M. McLellan - Somerville MA, US
Karan Chauhan - Cambridge MA, US
Wajeeh Saadi - Cambridge MA, US
Kimberly Dickey - Cambridge MA, US
Sandip Agarwal - Cambridge MA, US
David Christopher Coffey - Allston MA, US
Kevin Randall Stewart - Niskayuna NY, US
Assignee:
Nano Terra Inc. - Cambridge MA
International Classification:
B05D 5/02
B32B 5/00
US Classification:
428141, 427256
Abstract:
The present invention is directed to smudge-resistant coatings, methods to prepare the coatings, and products prepared by the methods.

Stencils With Removable Backings For Forming Micron-Sized Features On Surfaces And Methods Of Making And Using The Same

US Patent:
2009019, Aug 6, 2009
Filed:
Sep 25, 2008
Appl. No.:
12/237754
Inventors:
Karan CHAUHAN - Cambridge MA, US
Joseph M. MCLELLAN - Somerville MA, US
Sandip Agarwal - Somerville MA, US
Brian T. MAYERS - Somerville MA, US
Jeffrey Carbeck - Belmont MA, US
Ralf Kugler - Cambridge MA, US
Monika Kursawe - Seeheim-Jugenheim, DE
Assignee:
Nano Terra Inc. - Cambridge MA
Merck Patent GmbH - Darmstadt
International Classification:
B32B 3/10
B32B 37/02
B41M 1/12
US Classification:
4281951, 156247, 101129, 10112821
Abstract:
The present invention is directed to methods for patterning substrates using elastomeric stencils having removable backings and methods of preparing the stencils.

Molecular Resist Compositions, Methods Of Patterning Substrates Using The Compositions And Process Products Prepared Therefrom

US Patent:
2009031, Dec 17, 2009
Filed:
May 6, 2009
Appl. No.:
12/436436
Inventors:
Joseph M. MCLELLAN - Somerville MA, US
Brian T. Mayers - Somerville MA, US
Karan Chauhan - Punjab, IN
Wajeeh Saadi - Cambridge MA, US
Assignee:
Nano Terra Inc. - Cambridge MA
International Classification:
B32B 3/10
C09K 3/00
B44C 1/22
US Classification:
428172, 25218229, 2521823, 25218212, 216 43, 4281951
Abstract:
The present invention is directed to molecular resist compositions comprising an organic amine, methods of forming features on substrates using the molecular resists compositions and process products prepared therefrom.

Methods For Reducing The Sensory Effects Of Odorous Compounds

US Patent:
2009032, Dec 31, 2009
Filed:
Jun 26, 2009
Appl. No.:
12/492860
Inventors:
Joseph M. MCLELLAN - Somerville MA, US
Brian T. Mayers - Somerville MA, US
Karan Chauhan - Cambridge MA, US
Assignee:
Nano Terra, Inc. - Cambridge MA
International Classification:
B65D 85/72
B65B 55/00
US Classification:
426124, 426271
Abstract:
The present invention is directed to compositions containing a food product capable of developing a volatile, malodorous sulfur-containing and/or nitrogen-containing compound after packaging, and a pristine metal in an amount sufficient to minimize the sensory effects of the volatile, malodorous compounds at a time of use.

Methods Of Patterning Substrates Using Microcontact Printed Polymer Resists And Articles Prepared Therefrom

US Patent:
2010025, Oct 7, 2010
Filed:
Apr 1, 2010
Appl. No.:
12/752540
Inventors:
Sandip AGARWAL - Somerville MA, US
Brian T. Mayers - Arlington MA, US
Joseph M. McLellan - Quincy MA, US
Ralf Kügler - Cambridge MA, US
Monika Kursawe - Seeheim-Jugenheim, DE
Assignee:
Nano Terra Inc. - Cambridge MA
Merck Patent GmbH - Darmstadt
International Classification:
B29C 59/02
C08L 41/00
C08L 37/00
C08L 39/00
C08L 55/00
C08L 25/08
C08L 33/12
US Classification:
264293, 524547, 524549, 524555, 524565, 524578, 524560, 425385
Abstract:
The present invention is directed to methods for patterning substrates using contact printing to form patterns comprising a polymer, using the patterns formed therefrom as resists, and process products formed by the process.

Methods For Patterning Substrates Using Heterogeneous Stamps And Stencils And Methods Of Making The Stamps And Stencils

US Patent:
2011007, Mar 31, 2011
Filed:
Aug 20, 2010
Appl. No.:
12/859953
Inventors:
Sandip AGARWAL - Somerville MA, US
Graciela Beatriz BLANCHET - Boston MA, US
Brian T. MAYERS - Arlington MA, US
Joseph M. MCLELLAN - Quincy MA, US
Patrick REUST - Allston MA, US
Eric STERN - Cambridge MA, US
Jennifer GILLIES - Cambridge MA, US
Ralf KÜGLER - Cambridge MA, US
Assignee:
Nano Terra Inc. - Cambridge MA
Merck Patent GmbH - Darmstadt
International Classification:
B41N 1/24
G03F 7/20
B05D 1/32
B32B 3/24
US Classification:
428138, 430325, 427282
Abstract:
The present invention is directed to heterogeneous stamp and stencil compositions, methods for patterning substrates using contact printing processes employing the heterogeneous stamps and stencils, and products formed by the contact printing processes.

Stencils For High-Throughput Micron-Scale Etching Of Substrates And Processes Of Making And Using The Same

US Patent:
2012009, Apr 26, 2012
Filed:
May 20, 2011
Appl. No.:
13/112166
Inventors:
Eric STERN - Cambridge MA, US
Graciela Beatriz BLANCHET - Boston MA, US
Lindsay HUNTING - Cambridge MA, US
Brian T. MAYERS - Arlington MA, US
Joseph M. MCLELLAN - Quincy MA, US
Patrick REUST - Somerville MA, US
Ralf KÜGLER - Cambridge MA, US
Jennifer GILLIES - Cambridge MA, US
Assignee:
Merck Patent Gesellschaft - Darmstadt
Nano Terra Inc. - Brighton MA
International Classification:
H01L 21/308
B29C 59/16
US Classification:
1563453, 264447
Abstract:
The present invention is directed to stencils for high-throughput, high-resolution etching of substrates and processes of making and using the same.

Structured Smudge-Resistant Anti-Reflective Coatings And Methods Of Making And Using The Same

US Patent:
2013018, Jul 18, 2013
Filed:
Dec 10, 2010
Appl. No.:
13/515145
Inventors:
Matthew Stewart - Somerville MA, US
Joseph M. McLellan - Quincy MA, US
Graciela B. Blanchet - Boston MA, US
Brian T. Mayers - Arlington MA, US
Adam Winkleman - Brookline MA, US
Sandip Agarwal - Medford MA, US
George M. Whitesides - Newton MA, US
Assignee:
Nano Terra Inc. - Brighton MA
International Classification:
G02B 1/11
US Classification:
359580, 428156, 428172, 428141, 977902
Abstract:
The present invention is directed to articles comprising smudge-resistant anti-reflective surfaces, and products and devices comprising the articles.

Isbn (Books And Publications)

Birth Of Nanabosho

Author:
Joseph McLellan
ISBN #:
0921827008

Nanabosho Steals Fire

Author:
Joseph McLellan
ISBN #:
0921827059

Nanabosho Dances

Author:
Joseph McLellan
ISBN #:
0921827148

How The Turtle Got Its Shell: A Nanabosho Legend

Author:
Joseph McLellan
ISBN #:
0921827407

Nanabosho And The Cranberries

Author:
Joseph McLellan
ISBN #:
0921827636

Nanabosho Grants A Wish

Author:
Joseph McLellan
ISBN #:
0921827660

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