Joyce Lowes resumes & CV records
Resumes
Joyce A Lowes, 463312 Danz Forest Dr, Rosebud, MO 63091
Joyce Lowes Phones & Addresses
3312 Danz Forest Dr, Rosebud, MO 63091 573-7645296
Gerald, MO
Cuba, MO
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Joyce A Lowes
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Mentions for Joyce A Lowes
Publications & IP owners
Us Patents
Acid-Sensitive, Developer-Soluble Bottom Anti-Reflective Coatings
US Patent:
2010021, Aug 26, 2010
Filed:
Feb 19, 2010
Appl. No.:
12/708630
Inventors:
Jim D. Meador - Manchester MO, US
Joyce A. Lowes - Gerald MO, US
Joyce A. Lowes - Gerald MO, US
Assignee:
BREWER SCIENCE INC. - Rolla MO
International Classification:
H01L 29/00
G03F 7/20
C08L 67/00
G03F 7/20
C08L 67/00
US Classification:
257629, 430311, 524553, 257E29001
Abstract:
Acid-sensitive, developer-soluble bottom anti-reflective coating compositions are provided, along with methods of using such compositions and microelectronic structures formed thereof. The compositions preferably comprise a crosslinkable polymer dissolved or dispersed in a solvent system. The polymer preferably comprises recurring monomeric units having adamantyl groups. The compositions also preferably comprise a crosslinker, such as a vinyl ether crosslinking agent, dispersed or dissolved in the solvent system with the polymer. In some embodiments, the composition can also comprise a photoacid generator (PAG) and/or a quencher. The bottom anti-reflective coating compositions are thermally crosslinkable, but can be decrosslinked in the presence of an acid to be rendered developer soluble.
Selective Liquiphobic Surface Modification Of Substrates
US Patent:
2022018, Jun 9, 2022
Filed:
Feb 28, 2022
Appl. No.:
17/682175
Inventors:
- Rolla MO, US
Joyce A. Lowes - Rosebud MO, US
Reuben Chacko - Rolla MO, US
Joyce A. Lowes - Rosebud MO, US
Reuben Chacko - Rolla MO, US
International Classification:
H01L 21/02
C08F 220/68
H01L 23/31
H01L 23/29
C09D 133/16
C08F 220/68
H01L 23/31
H01L 23/29
C09D 133/16
Abstract:
Materials and methods for modifying semiconducting substrate surfaces in order to dramatically change surface energy are provided. Preferred materials include perfluorocarbon molecules or polymers with various functional groups. The functional groups (carboxylic acids, hydroxyls, epoxies, aldehydes, and/or thiols) attach materials to the substrate surface by physical adsorption or chemical bonding, while the perfluorocarbon components contribute to low surface energy. Utilization of the disclosed materials and methods allows rapid transformation of surface properties from hydrophilic to hydrophobic (water contact angle 120 and PGMEA contact angle) 70. Selective liquiphobic modifications of copper over Si/SiOx, TiOx over Si/SiOx, and SiN over SiOx are also demonstrated.
Selective Liquiphobic Surface Modification Of Substrates
US Patent:
2021008, Mar 18, 2021
Filed:
May 1, 2020
Appl. No.:
16/865159
Inventors:
- Rolla MO, US
Joyce A. Lowes - Rosebud MO, US
Reuben Chacko - Rolla MO, US
Joyce A. Lowes - Rosebud MO, US
Reuben Chacko - Rolla MO, US
International Classification:
H01L 21/02
C08F 220/68
C09D 133/16
H01L 23/29
H01L 23/31
C08F 220/68
C09D 133/16
H01L 23/29
H01L 23/31
Abstract:
Materials and methods for modifying semiconducting substrate surfaces in order to dramatically change surface energy are provided. Preferred materials include perfluorocarbon molecules or polymers with various functional groups. The functional groups (carboxylic acids, hydroxyls, epoxies, aldehydes, and/or thiols) attach materials to the substrate surface by physical adsorption or chemical bonding, while the perfluorocarbon components contribute to low surface energy. Utilization of the disclosed materials and methods allows rapid transformation of surface properties from hydrophilic to hydrophobic (water contact angle 120 and PGMEA contact angle) 70. Selective liquiphobic modifications of copper over Si/SiOx, TiOx over Si/SiOx, and SiN over SiOx are also demonstrated.
Bottom-Up Conformal Coating And Photopatterning On Pag-Immobilized Surfaces
US Patent:
2020014, May 7, 2020
Filed:
Nov 1, 2019
Appl. No.:
16/671426
Inventors:
- Rolla MO, US
Joyce A. Lowes - Rosebud MO, US
Carissa Jones - Springfield MO, US
Joyce A. Lowes - Rosebud MO, US
Carissa Jones - Springfield MO, US
International Classification:
G03F 7/095
G03F 7/004
G03F 7/16
G03F 7/34
C08F 212/08
C08F 220/28
C08F 220/38
G03F 7/004
G03F 7/16
G03F 7/34
C08F 212/08
C08F 220/28
C08F 220/38
Abstract:
Materials and methods to immobilize photoacid generators on semiconducting substrates are provided. PAG-containing monomers are copolymerized with monomers to allow the polymer to bind to a surface, and optionally copolymerized with monomers to enhance solubility to generate PAG-containing polymers. The PAG-containing monomers can be coated onto a surface, where the immobilized PAGs can then be used to pattern materials coated on top of the immobilized PAGs, allowing direct patterning without the use of a photoresist, thereby reducing process steps and cost. The disclosed materials and processes can be used to produce conformal coatings of controlled thicknesses.
Chemically Patterned Guide Layers For Use In Chemoepitaxy Directing Of Block Co-Polymers
US Patent:
2018009, Apr 5, 2018
Filed:
Oct 4, 2017
Appl. No.:
15/724662
Inventors:
- Rolla MO, US
Joyce Lowes - Rosebud MO, US
Joyce Lowes - Rosebud MO, US
International Classification:
H01L 21/027
C08F 120/68
C08F 120/18
B05D 1/00
H01L 21/02
C08F 120/68
C08F 120/18
B05D 1/00
H01L 21/02
Abstract:
The present invention is broadly concerned with materials, processes, and structures that allow an underlayer to be imaged directly using conventional lithography, thus avoiding the photoresist processing steps required by prior art directed self-assembly (DSA) processes. The underlayers can be tailored to favor a selected block of the DSA block co-polymers (BCP), depending on the pattern, and can be formulated either to initially be neutral to the BCP and switch to non-neutral after photoexposure, or can initially be non-neutral to the BCP and switch to neutral after exposure. These materials allow fast crosslinking to achieve solvent resistance and possess good thermal stability.
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