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Keith A Hirsch, 55384 Sherwood Rd, Union, NJ 07083

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Union, NJ   

Parsippany, NJ   

7291 Burgundy St, Canton, MI 48187    734-6675453   

902 Marlboro Cmn, Somerville, NJ 08876    908-3590229   

Hillsborough, NJ   

202 Steeplechase Dr, North Wales, PA 19454    215-3617543    215-3617544   

Novi, MI   

New Castle, DE   

Bear, DE   

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Us Patents

Method For Inhibiting The Deposition Of Silica And/Or Silicate Compounds In Aqueous Systems

US Patent:
2011004, Mar 3, 2011
Filed:
Sep 2, 2009
Appl. No.:
12/552964
Inventors:
Keith A. Hirsch - Canton MI, US
Chacko Thankachan - West Bloomfield MI, US
International Classification:
C02F 1/68
B01D 61/02
US Classification:
210652, 210698
Abstract:
A method inhibits the deposition of silica and/or silicate compounds on a surface in an aqueous system. The method includes the step of adding a polymer to the aqueous system. The polymer comprises the reaction product of a natural oil component and an alkylene oxide. The polymer of the subject invention has a core, comprising a fatty acid or an ester thereof, and a plurality of polymeric side chains bonded to the core. The plurality of polymeric side chains comprise alkyleneoxy groups selected from the group of ethyleneoxy groups, propyleneoxy groups, butyleneoxy groups, and combinations thereof.

Method For Inhibiting The Deposition Of Silica And/Or Silicate Compounds In Aqueous Systems

US Patent:
2011004, Mar 3, 2011
Filed:
Sep 2, 2009
Appl. No.:
12/552991
Inventors:
Keith A. Hirsch - Canton MI, US
International Classification:
C02F 1/68
C02F 1/44
US Classification:
210652, 210698
Abstract:
A method of inhibiting the deposition of silica and/or silicate compounds on a surface in an aqueous system is provided. The method comprises the step of adding a polymer to the aqueous system. The polymer comprises at least one constitutional unit (i) and at least one additional constitutional unit (ii). The constitutional unit (i) is represented by the formula:wherein R is an alkyl group having at least 2 carbon atoms; Ris selected from the group of a hydrogen atom, an alkyl group, an aryl group, an ester, an amide, and an imide; k is 2 to 4; and n is at least about 10. The additional constitutional unit (ii) contains at least one group selected from the group of carbonyl groups, sulfonate groups, and phosphate groups.

Encapsulated Chlorine Dioxide Generator

US Patent:
2013001, Jan 17, 2013
Filed:
Feb 1, 2011
Appl. No.:
13/576611
Inventors:
Kim Andrews - Ontario, CA
Shaukat Ali - Monmouth Juntion NJ, US
Jesse Jefferis - Wayne MI, US
James S. Dailey - Grosse Ile MI, US
Charles O. Onyiuke - Mt. Arlington NJ, US
Keith A. Hirsch - Canton MI, US
Assignee:
BASF SE - Ludwigshafen
International Classification:
A01N 25/26
A01P 1/00
B05D 1/02
A01N 59/00
US Classification:
424405, 424497, 424661, 424 761, 424 768, 427 214
Abstract:
An encapsulated chlorine dioxide generator is provided. The encapsulated generator includes a core particle that includes a metal chlorite and a solid acid. The encapsulated generator also includes a protective layer that is disposed about at least a portion of the core particle. The protective layer includes a copolymer of polyvinyl alcohol and a polyalkylene glycol. The encapsulated generator is formed in a method including the steps of forming the core particle and disposing the protective layer about the core particle. The encapsulated generator is also used in a method of cleaning an environment. The method of cleaning the environment includes the steps of providing the encapsulated generator and forming chlorine dioxide from the encapsulated chlorine dioxide generator to clean the environment.

Composition For Dissolving And/Or Inhibiting Deposition Of Scale On A Surface Of A System

US Patent:
2013013, May 30, 2013
Filed:
Nov 29, 2012
Appl. No.:
13/688819
Inventors:
BASF SE - LUDWIGSHAFEN, DE
Keith Hirsch - Canton MI, US
Stephen F Gross - Rockwood MI, US
Assignee:
BASF SE - Ludwigshafen
International Classification:
C11D 3/34
US Classification:
510253, 510109, 252180, 422 40
Abstract:
A composition for dissolving and/or inhibiting deposition of scale on a surface of a system comprises an acidic component, a wetting agent, and a corrosion inhibitor. The composition may further comprise water. The acidic component comprises an alkanesulfonic acid, e.g. methanesulfonic acid (MSA). The wetting agent comprises a surfactant. The corrosion inhibitor comprises an amphoteric surfactant. The alkanesulfonic acid is present in an amount of at least about 50 weight percent (wt %), the surfactant is present in an amount of from about 0.1 to about 30 wt %, and the amphoteric surfactant is present in an amount of from about 0.025 to about 20 wt %, each based on 100 wt % of the alkanesulfonic acid, the surfactant, and the amphoteric surfactant combined. A method of dissolving and/or inhibiting deposition of scale on the surface of the system comprises the step of contacting the surface of the system with the composition.

Stable Ethylsilicate Polymers And Method Of Making The Same

US Patent:
2020001, Jan 9, 2020
Filed:
Sep 17, 2019
Appl. No.:
16/573794
Inventors:
- Weston MI, US
Tyler Haber - Marietta GA, US
Peter Rau - Morenci MI, US
Keith Hirsch - Union NJ, US
Assignee:
Silbond Corporation - Weston MI
International Classification:
C08J 3/09
C08K 3/08
Abstract:
Ethylsilicate polymers and a method of making, specifically ethylsilicate polymer binders with reduced levels of regulated volatile organic compounds (VOCs) for use in the coatings industry and casting industry, and more specifically to stable, fast cure ethylsilicate polymer binders with low levels of regulated VOCs.

Stable Ethylsilicate Polymers And Method Of Making The Same

US Patent:
2016013, May 19, 2016
Filed:
Nov 13, 2015
Appl. No.:
14/941107
Inventors:
Kenneth Warnshuis - Adrian MI, US
Tyler Haber - Weston MI, US
Peter Rau - Morenci MI, US
Keith Hirsch - Canton MI, US
International Classification:
C08L 83/04
C08J 3/09
C08J 3/11
C08K 3/08
Abstract:
Ethylsilicate polymers and a method of making, specifically ethylsilicate polymer binders with reduced levels of regulated volatile organic compounds (VOCs) for use in the coatings industry and casting industry, and more specifically to stable, fast cure ethylsilicate polymer binders with low levels of regulated VOCs.

Colloidal Sol And Method Of Making Same

US Patent:
2014031, Oct 23, 2014
Filed:
Apr 17, 2014
Appl. No.:
14/255447
Inventors:
Kenneth Warnshuis - Adrian MI, US
George Haag - Manitou Beach MI, US
Peter Rau - Morenci MI, US
Keith Hirsch - Canton MI, US
International Classification:
C09G 1/02
US Classification:
252 791
Abstract:
A colloidal sol and a method of making colloidal sol that is capable of controlling the resulting particle size and more specifically, using a potassium hydroxide process to obtain a colloidal sol having a single peak of average particle sizes.

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