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Leon M Dean, 342325 Harding St NE, Minneapolis, MN 55418

Related to:
Jennifer S Dean 56 Bobby R Raper 89 Lacy D Davis 44

Leon Dean Phones & Addresses

Minneapolis, MN   

Urbana, IL   

Anaheim, CA   

Austin, TX   

6703 N Drumheller St, Spokane, WA 99208    509-3288207   

17025 Ennis Trl, Austin, TX 78717    512-6336121   

Work

Position: Sales Occupations

Education

Degree: Associate degree or higher
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Leon Dean resumes & CV records

Resumes

Leon Dean Photo 29

Graduate Research Assistant, Sottos Group

Location:
Urbana, IL
Work:
University of Illinois at Urbana-Champaign Aug 2016 - Dec 2018
Teaching Assistant Aug 2016 - Dec 2018
Graduate Research Assistant, Sottos Group
Education:
University of Illinois at Urbana - Champaign
Doctorates, Doctor of Philosophy, Philosophy
Leon Dean Photo 30

Graduate Research Assistant

Location:
Urbana, IL
Industry:
Plastics
Work:
Beckman Institute For Advanced Science and Technology
Graduate Research Assistant Seagate Technology May 2013 - Aug 2013
Engineering Intern The University of Texas at Austin Sep 2010 - May 2013
Undergraduate Research Assistant University of Minnesota Jun 2012 - Aug 2012
Reu Intern Ministry Conference Center Jun 2010 - Aug 2010
Construction Worker
Education:
The University of Texas at Austin 2009 - 2013
Bachelors, Bachelor of Science, Chemical Engineering
Skills:
Afm, Scanning Electron Microscopy, Nanotechnology, Matlab, Materials Science, Electron Beam Lithography, Photolithography, Labview, Rheology, Raman Spectroscopy, Nanoindentation, Nmr Spectroscopy, Additive Manufacturing, Chromatography, Differential Scanning Calorimetry, Dynamic Mechanical Analysis, Fatigue Testing, Jmp, Autocad, Originlab, Imagej, Ir Spectroscopy, Experimentation
Languages:
Spanish
Leon Dean Photo 31

Greater Minneapolis-St Paul Area

Location:
Minneapolis, MN
Industry:
Accounting
Work:

Greater Minneapolis-St Paul Area
Business Owner
Leon Dean Photo 32

Leon Dean

Leon Dean Photo 33

Leon Dean

Leon Dean Photo 34

Leon Dean

Leon Dean Photo 35

Field Marketing Manager, Tele-Lead Team, Ann Arbor, Mi

Location:
United States
Leon Dean Photo 36

Leon Dean

Publications & IP owners

Us Patents

Anhydride Copolymer Top Coats For Orientation Control Of Thin Film Block Copolymers

US Patent:
2013028, Oct 24, 2013
Filed:
Feb 7, 2013
Appl. No.:
13/761918
Inventors:
Carlton Grant Wilson - Austin TX, US
Christopher John Ellison - Austin TX, US
Takehiro Seshimo - Austin TX, US
Julia Cushen - Austin TX, US
Christopher M. Bates - Austin TX, US
Leon Dean - Spokane WA, US
Logan J. Santos - Austin TX, US
Erica L. Rausch - Austin TX, US
International Classification:
C09D 137/00
US Classification:
4281951, 4274071, 216 58, 4273855, 428500
Abstract:
The present invention involves the use of random copolymer top coats that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films. Top coats potentially allow for the facile orientation control of block copolymers which would otherwise be quite challenging.

Anhydride Copolymer Top Coats For Orientation Control Of Thin Film Block Copolymers

US Patent:
2013034, Dec 26, 2013
Filed:
Jun 19, 2013
Appl. No.:
13/922011
Inventors:
Christopher John Ellison - Austin TX, US
Takehiro Seshimo - Austin, JP
Julia Cushen - Austin TX, US
Christopher M. Bates - Austin TX, US
Leon Dean - Spokane WA, US
Logan J. Santos - Austin TX, US
Erica L. Rausch - Austin TX, US
Michael Maher - Austin TX, US
International Classification:
C09D 137/00
US Classification:
427240, 4274071, 427258, 427261, 4274072
Abstract:
The use of self-assembled block copolymer structures to produce advanced lithographic patterns relies on control of the orientation of these structures in thin films. In particular, orientation of cylinders and lamellae perpendicular to the plane of the block copolymer film is required for most applications. The preferred method to achieve orientation is by heating. The present invention involves the use of polarity-switching top coats to control block copolymer thin film orientation by heating. The top coats can be spin coated onto block copolymer thin films from polar casting solvents and they change composition upon thermal annealing to become “neutral”. Top coats allow for the facile orientation control of block copolymers which would otherwise not be possible by heating alone.

Using Chemical Vapor Deposited Films To Control Domain Orientation In Block Copolymer Thin Films

US Patent:
2013020, Aug 15, 2013
Filed:
Feb 7, 2013
Appl. No.:
13/761324
Inventors:
Carlton Grant Willson - Austin TX, US
William J. Durand - Austin TX, US
Christopher John Ellison - Austin TX, US
Christopher M. Bates - Austin TX, US
Takehiro Seshimo - Austin TX, US
Julia Cushen - Austin TX, US
Logan J. Santos - Austin TX, US
Leon Dean - Spokane WA, US
Erica L. Rausch - Austin TX, US
International Classification:
C23C 16/44
B29C 43/32
US Classification:
4281951, 4272481, 4272556, 216 58, 427240, 4284111
Abstract:
The present invention uses vacuum deposited thin films of material to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nanostructured features in a block copolymer film that can serve as lithographic patterns.

Elastomer With Tunable Properties And Method Of Rapidly Forming The Elastomer

US Patent:
2023009, Mar 30, 2023
Filed:
Mar 10, 2021
Appl. No.:
17/910132
Inventors:
- Urbana IL, US
Jeffrey S. Moore - Savoy IL, US
Leon M. Dean - Minneapolis MN, US
Qiong Wu - Champaign IL, US
Omar Alshangiti - Urbana IL, US
Assignee:
The Board of Trustees of the University of Illinois - Urbana IL
International Classification:
A61L 27/22
C08G 61/08
Abstract:
A method of rapidly forming an elastomer with tunable properties is described herein. The method includes preparing a monomer solution comprising a catalyst and one or more monomers including 1,5-cyclooctadiene (COD). The one or more monomers may further include dicyclopentadiene (DCPD), and each of the COD and the DCPD may be present in the monomer solution at a predetermined volume percentage. A region of the monomer solution is activated to initiate an exothermic polymerization reaction and generate a self-propagating polymerization front, which moves through the monomer solution and polymerizes the one or more monomers. Thus, an elastomer having predetermined properties is rapidly formed.

Anhydride Copolymer Top Coats For Orientation Control Of Thin Film Block Copolymers

US Patent:
2015037, Dec 24, 2015
Filed:
Aug 28, 2015
Appl. No.:
14/839147
Inventors:
- Austin TX, US
Christopher John Ellison - Austin TX, US
Julia Cushen - Austin TX, US
Christopher M. Bates - Austin TX, US
Leon Dean - Spokane WA, US
Logan J. Santos - Austin TX, US
Erica L. Rausch - Austin TX, US
International Classification:
G03F 1/50
C09D 167/00
Abstract:
The present invention involves the use of random copolymer top coats that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films. Top coats potentially allow for the facile orientation control of block copolymers which would otherwise be quite challenging.

Using Chemical Vapor Deposited Films To Control Domain Orientation In Block Copolymer Thin Films

US Patent:
2015023, Aug 20, 2015
Filed:
Apr 28, 2015
Appl. No.:
14/698253
Inventors:
- Austin TX, US
William J. Durand - Austin TX, US
Christopher John Ellison - Austin TX, US
Christopher M. Bates - Austin TX, US
Takehiro Seshimo - Austin TX, US
Julia Cushen - Austin TX, US
Logan J. Santos - Austin TX, US
Leon Dean - Spokane WA, US
Erica L. Rausch - Austin TX, US
International Classification:
C09D 153/00
C03C 17/30
C03C 17/34
Abstract:
The present invention uses vacuum deposited thin films of material to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nanostructured features in a block copolymer film that can serve as lithographic patterns.

Possible Relatives

Cynthia K Dean  David Dean  Dawn M Dean  Deanne Dean  Debbie C Dean  Dallas Dean  Dallin D Dean  Leon R Johnson  Leon Stamps  Leon V White 

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