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Jung Y Park, 58Greenwich, CT

Jung Park Phones & Addresses

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Beverly Hills, CA   

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San Diego, CA   

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Career records & work history

Lawyers & Attorneys

Jung Park Photo 1

Jung H. Park, New York NY - Lawyer

Office:
Ropers, Majeski, Kohn & Bentley A Professional Corporation
750 Third Avenue, 25Th Floor, New York, NY 10017
Phone:
646-4543241 (Phone)
Specialties:
Business and Commercial Litigation, Construction, Professional Liability, Class Action/Complex Litigation, Insurance Services, Antitrust, Automotive, Engineering, Professional Services, Insurance
ISLN:
915909085
Admitted:
1999, New York, 2000, California, 2010, New Jersey, USDC: Central District of California, USDC: Eastern District of California, USDC: Northern District of California, USDC: Southern District of California, USDC: Eastern District of New York, USDC: Southern District of New York
University:
Binghamton University, B.A., cum laude, 1995
Law School:
Boston University, J.D., 1998
Links:
Site
Biography:
Experience <br /><br />Ms. Park specializes in a broad range of commercial litigation and has extensive experience handling matters involving complex coverage litigation, antitrust, unfair business pr...
Jung Park Photo 2

Jung Hyun Park, New York NY - Lawyer

Address:
Ropers Majeski Kohn & Bentley
750 3Rd Ave 25Th Fl, New York, NY 10017
212-6685927 (Office)
Ropers Majeski Kohn & Bentley
750 3Rd Ave Fl 25, New York, NY 10017
212-6685927 (Office)
Licenses:
California - Active 2000
New York - Currently registered 1999
Education:
State University of New York, Binghamton
Boston University School of Law
Specialties:
Insurance - 34%
Class Action - 33%
Litigation - 33%
Jung Park Photo 3

Jung Sung Park - Lawyer

Licenses:
New Jersey - Active 2006
Jung Park Photo 4

Jung H Park, New York NY - Lawyer

Address:
Ropers Majeski Kohn & Bentley
750 3Rd Ave # 25, New York, NY 10017
646-4543241 (Office), 212-6685929 (Fax)
Licenses:
New Jersey - Active 2010
Specialties:
Antitrust / Trade Law - 34%
Class Action - 33%
Litigation - 33%
Jung Park Photo 5

Jung Sung Park - Lawyer

Address:
Robot Division, Ministry of Knowledge Economy
221-105619x (Office)
Licenses:
New York - Currently registered 2008
Education:
Nova Southeastern University - Shepard Broad Law Center
Jung Park Photo 6

Jung Eun Park, Pasadena CA - Lawyer

Address:
1278 E Colorado Blvd, Pasadena, CA 91106
310-7700755 (Office)
Licenses:
California - Active 1998
Education:
Harvard University
University of California at Davis School of Law
Jung Park Photo 7

Jung Park - Lawyer

Office:
Federico Castelan Sayre
Specialties:
Torts, Civil Rights, Medical Malpractice, Employment Law, Insurance Bad Faith
ISLN:
913966509
Admitted:
1998
University:
Harvard College, B.A.; Harvard College, B.A.
Law School:
University of California at Davis, J.D., 1996
Jung Park Photo 8

Jung Park - Lawyer

ISLN:
915737930
Admitted:
1997

Medicine Doctors

Jung Park Photo 9

Dr. Jung M Park, Downey CA - MD (Doctor of Medicine)

Specialties:
Obstetrics & Gynecology
Address:
11401 Patton Rd, Downey, CA 90241
4476 Tweedy Blvd, South Gate, CA 90280
323-5639499 (Phone)
Certifications:
Obstetrics & Gynecology, 2009
Awards:
Healthgrades Honor Roll
Languages:
English
Chinese
Spanish
Hospitals:
11401 Patton Rd, Downey, CA 90241
4476 Tweedy Blvd, South Gate, CA 90280
Downey Regional Medical Center
11500 Brookshire Avenue, Downey, CA 90241
Saint Francis Medical Center
3630 East Imperial Highway, Lynwood, CA 90262
Beverly Hospital
309 West Beverly Boulevard, Montebello, CA 90640
Education:
Medical School
University Of Sao Paulo School Of Med
Graduated: 1983
Medical School
Hospital Das Clinicas
Graduated: 1986
Medical School
Martin Luther King Drew Med Center
Graduated: 1996
Jung Park Photo 10

Dr. Jung Ki Park, Bronx NY - MD (Doctor of Medicine)

Specialties:
Obstetrics & Gynecology
Address:
Montefiore Medical Center OBGYN
1825 Eastchester Rd Suite 6, Bronx, NY 10461
718-9042767 (Phone)
Certifications:
Obstetrics & Gynecology, 2011
Awards:
Healthgrades Honor Roll
Languages:
English
Education:
Medical School
Case Western Reserve University
Jung Park Photo 11

Dr. Jung E Park, New York NY - MD (Doctor of Medicine)

Specialties:
Anesthesiology
Address:
525 E 68Th St, New York, NY 10065
212-7462941 (Phone)
Languages:
English
Education:
Medical School
Wake Forest University
Graduated: 2010
Jung Park Photo 12

Jung O Park, Santee CA - RN (Registered Nurse)

Specialties:
Nursing (Registered Nurse)
Address:
655 Park Center Dr, Santee, CA 92071
619-9562898 (Phone)
Languages:
English
Jung Park Photo 13

Jung Ryeol Park, Flushing NY - RPT

Specialties:
Physical Therapy
Address:
12610 25Th Rd Suite 1, Flushing, NY 11354
Languages:
English

Jung Park

Specialties:
Obstetrics & Gynecology
Work:
Pioneer Medical Group
11480 Brookshire Ave STE 204, Downey, CA 90241
562-8622775 (phone) 562-9048095 (fax)
Site
Education:
Medical School
Univ Do Sao Paulo, Fac De Med Ribeirao Preto, Ribeirao Preto, Sp, Brazil
Graduated: 1983
Procedures:
D & C Dilation and Curettage, Hysterectomy, Vaginal Repair
Conditions:
Breast Disorders, Candidiasis of Vulva and Vagina, Endometriosis, Female Infertility, Pelvic Inflammatory Disease (PID), Polycystic Ovarian Syndrome (PCOS), Spontaneous Abortion, Uterine Leiomyoma, Abnormal Vaginal Bleeding, Complicating Pregnancy or Childbirth, Conditions of Pregnancy and Delivery, Diabetes Mellitus Complicating Pregnancy or Birth, Ectopic Pregnancy, Follicular Cyst of the Ovary, Genital HPV, Hemorrhoids, Herpes Genitalis, Hypertension (HTN), Menopausal and Postmenopausal Disorders, Pregnancy-Induced Hypertension, Premenstrual Syndrome (PMS), Uncomplicated or Low Risk Pregnancy and Delivery
Languages:
Chinese, English, German, Korean, Portuguese, Spanish
Description:
Dr. Park graduated from the Univ Do Sao Paulo, Fac De Med Ribeirao Preto, Ribeirao Preto, Sp, Brazil in 1983. He works in Downey, CA and specializes in Obstetrics & Gynecology. Dr. Park is affiliated with Lakewood Regional Medical Center, Los Alamitos Medical Center, Miller Childrens & Womens Hospital Long Beach and PIH Health Hospital Downey.

Jung H. Park

Specialties:
Hand Surgery, Orthopaedic Surgery
Work:
Bucks County Orthopedic Specialists
800 W State St STE 201, Doylestown, PA 18901
215-3482022 (phone) 215-3487428 (fax)
Site
Education:
Medical School
University of Pennsylvania School of Medicine
Graduated: 2007
Procedures:
Carpal Tunnel Decompression, Lower Arm/Elbow/Wrist Fractures and Dislocations, Arthrocentesis, Hip/Femur Fractures and Dislocations, Joint Arthroscopy, Knee Arthroscopy, Knee Replacement, Lower Leg/Ankle Fractures and Dislocations, Shoulder Surgery
Conditions:
Lateral Epicondylitis, Fractures, Dislocations, Derangement, and Sprains, Osteoarthritis, Plantar Fascitis, Rotator Cuff Syndrome and Allied Disorders
Languages:
English, Spanish
Description:
Dr. Park graduated from the University of Pennsylvania School of Medicine in 2007. He works in Doylestown, PA and specializes in Hand Surgery and Orthopaedic Surgery. Dr. Park is affiliated with Doylestown Hospital.

Jung T. Park

Specialties:
Family Medicine
Work:
Whitwell Medical Plaza
13851 Hwy 28, Whitwell, TN 37397
423-6589200 (phone) 423-6582195 (fax)
Education:
Medical School
Kyungpook Natl Univ, Coll of Med, Taegu, So Korea
Graduated: 1966
Procedures:
Electrocardiogram (EKG or ECG), Pulmonary Function Tests, Vaccine Administration
Conditions:
Candidiasis, Diabetes Mellitus (DM), Acute Bronchitis, Acute Pharyngitis, Acute Renal Failure, Acute Sinusitis, Acute Upper Respiratory Tract Infections, Allergic Rhinitis, Alzheimer's Disease, Anemia, Anxiety Dissociative and Somatoform Disorders, Anxiety Phobic Disorders, Aortic Valvular Disease, Atherosclerosis, Atrial Fibrillation and Atrial Flutter, Attention Deficit Disorder (ADD), Bacterial Pneumonia, Benign Polyps of the Colon, Bipolar Disorder, Bronchial Asthma, Calculus of the Urinary System, Cholelethiasis or Cholecystitis, Chronic Bronchitis, Contact Dermatitis, Dehydration, Dementia, Depressive Disorders, Dermatitis, Diabetic Peripheral Neuropathy, Disorders of Lipoid Metabolism, Erectile Dysfunction (ED), Esophagitis, Fractures, Dislocations, Derangement, and Sprains, Gastroesophageal Reflux Disease (GERD), Gastrointestinal Hemorrhage, Heart Failure, Herpes Zoster, Hypertension (HTN), Hypothyroidism, Intervertebral Disc Degeneration, Iron Deficiency Anemia, Menopausal and Postmenopausal Disorders, Migraine Headache, Non-Toxic Goiter, Osteoarthritis, Osteoporosis, Otitis Media, Overweight and Obesity, Parkinson's Disease, Peripheral Nerve Disorders, Pneumonia, Post Traumatic Stress Disorder (PTSD), Restless Leg Syndrome, Sciatica, Septicemia, Skin and Subcutaneous Infections, Urinary Incontinence, Urinary Tract Infection (UT), Venous Embolism and Thrombosis, Ventral Hernia, Vitamin D Deficiency
Languages:
English, Korean
Description:
Dr. Park graduated from the Kyungpook Natl Univ, Coll of Med, Taegu, So Korea in 1966. He works in Whitwell, TN and specializes in Family Medicine.

License Records

Jung Jae Park

Licenses:
License #: 2705089858 - Expired
Category: Contractor
Issued Date: Nov 8, 2004
Expiration Date: Nov 30, 2012
Type: Class A

Jung Su Park

Licenses:
License #: MT00975 - Expired
Category: Massage
Issued Date: Mar 27, 2003
Expiration Date: Jun 30, 2004
Type: Massage Therapist

Jung Park resumes & CV records

Resumes

Jung Park Photo 31

Jung Park - Los Angeles, CA

Work:
Sylvan Dental Care & Branford Medical/Dental - Los Angeles, CA
General Dentist (DMD)
Education:
University of Pennsylvania School of Dental Medicine - Philadelphia, PA 2009 to 2013
Doctor of Dental Medicine
Emory University - Atlanta, GA 2005 to 2009
Bachelor of Science in Biology
Skills:
Competent in all phases of dentistry 1. Fixed (Operative, Crown and Bridge), Removable Prosthodontics 2. Endodontics (Molar Root Canal Therapy, Rotary instrumentation) 3. Oral Surgery; 3rd Molar Extraction, Surgical Extraction 4. Implant Restoration
Jung Park Photo 32

Jung Park - Boston, MA

Work:
HTNS America, Inc 2010 to 2000
Operations Coordinator
JFK International Air Terminal LLC - New York, NY 2008 to 2009
Intern
Republic of Korea Army - Seoul, KR 2004 to 2006
Sergeant/Office Manager
Education:
Vaughn College of Aeronautics & Technology - Flushing, NY 2010
B.S. in Airport Management
Pusan National University 2002
Mechanical Engineering Coursework
Jung Park Photo 33

Jung Park - New York, NY

Work:
Reina Bijoux - Manhattan, NY Apr 2012 to Jun 2013
Technical Jewerly Designer
Chain & Fantasia, INC - Manhattan, NY Oct 2009 to Mar 2012
Technical Jewerly Designer
Asset International - Stamford, CT Dec 2008 to May 2009
Design and Production Intern
Y Communications - Seoul, KR May 2006 to Apr 2007
Advertising Design Intern
Education:
School of Visual Arts - New York, NY May 2009
Bachelor of Fine Arts in Illustration
SI Korea Illustration institute - Seoul, KR Feb 2007 Hong-ik University - Seoul, KR 2002 to 2007
Bachelor of Design in Graphic Design
Skills:
Graphic Design, Inventory Management, Photography Lighting
Jung Park Photo 34

Jung Park - Ithaca, NY

Work:
Student Center at Cornell University 2008 to 2013
Cultural, Social, and Family Fellow at the Big Red Barn Graduate
Student Center at Cornell University 2009 to 2009
Program Assistant
Skills:
Legal research, copy editing, writing, grant writing, quantitative analysis, qualitative analysis, JMP, R, Stata, ArcGIS

Publications & IP owners

Us Patents

Cpl Mask And A Method And Program Product For Generating The Same

US Patent:
7892703, Feb 22, 2011
Filed:
Aug 10, 2006
Appl. No.:
11/501916
Inventors:
Jang Fung Chen - Cupertino CA, US
Douglas Van Den Broeke - Sunnyvale CA, US
Jung Chul Park - Pleasanton CA, US
Thomas Laidig - Point Richmond CA, US
Assignee:
ASML Masktools B.V. - AH Veldhoven
International Classification:
G03F 1/00
G03F 7/00
US Classification:
430 5, 430322, 430323
Abstract:
A method of generating a mask for printing a pattern including a plurality of features. The method includes the steps of obtaining data representing the plurality of features; and forming at least one of the plurality of features by etching a substrate to form a mesa and depositing a chrome layer over the entire upper surface of the mesa, where said mesa has a predetermined height.

Method For Performing Pattern Decomposition Based On Feature Pitch

US Patent:
7970198, Jun 28, 2011
Filed:
Sep 13, 2007
Appl. No.:
11/898648
Inventors:
Jung Chul Park - Pleasanton CA, US
Assignee:
ASML Masktools B.V. - Veldhoven
International Classification:
G06K 9/00
G06K 9/46
US Classification:
382144, 382145, 382190, 382199, 382203, 382260, 382261, 382263, 382264, 382276
Abstract:
A method for decomposing a target pattern containing features to be printed on a wafer. The method includes the steps of: (a) defining a kernel representing a function having positive values within an inner radius and negative values in an outer radius; (b) defining the features utilizing a plurality of pixels; (c) disposing the kernel over a first pixel of the plurality of pixels; (d) determining the value of the kernel at location of each of the plurality of pixels, storing the value for each of the plurality of pixels so as to define a pixel value for each of the plurality of pixels; (e) adding a previously stored value associated with a given pixel of the plurality of pixels with the pixel value of the given pixel determined in step (d); (f) disposing the kernel over another pixel of the plurality of pixels, and repeating steps (d)-(f) until each of the plurality of pixels has been processed; and (g) determining placement of the pixel in a first pattern or a second pattern based on the pixel value of the given pixel.

Method And Apparatus For Performing Model-Based Opc For Pattern Decomposed Features

US Patent:
8111921, Feb 7, 2012
Filed:
Sep 13, 2007
Appl. No.:
11/898646
Inventors:
Jung Chul Park - Pleasanton CA, US
Douglas Van Den Broeke - Sunnyvale CA, US
Jang Fung Chen - Cupertino CA, US
Assignee:
ASML Masktools B.V. - Veldhoven
International Classification:
G06K 9/00
G06F 17/50
H04N 7/16
US Classification:
382181, 716 53, 725 19
Abstract:
A method for decomposing a target circuit pattern containing features to be imaged into multiple patterns. The process includes the steps of separating the features to be printed into a first pattern and a second pattern; performing a first optical proximity correction process on the first pattern and the second pattern; determining an imaging performance of the first pattern and the second pattern; determining a first error between the first pattern and the imaging performance of the first pattern, and a second error between the second pattern and the imaging performance of said second pattern; utilizing the first error to adjust the first pattern to generate a modified first pattern; utilizing the second error to adjust the second pattern to generate a modified second pattern; and applying a second optical proximity correction process to the modified first pattern and the modified second pattern.

Method And Apparatus For Performing Model-Based Opc For Pattern Decomposed Features

US Patent:
8391605, Mar 5, 2013
Filed:
Jan 25, 2012
Appl. No.:
13/358497
Inventors:
Jung Chul Park - Pleasanton CA, US
Douglas Van Den Broeke - Sunnyvale CA, US
Jang Fung Chen - Cupertino CA, US
Assignee:
ASML Masktools B.V. - Veldhoven
International Classification:
G06K 9/00
G06F 17/50
US Classification:
382181, 716 53, 716 55
Abstract:
A method for decomposing a target circuit pattern containing features to be imaged into multiple patterns. The process includes the steps of separating the features to be printed into a first pattern and a second pattern; performing a first optical proximity correction process on the first pattern and the second pattern; determining an imaging performance of the first pattern and the second pattern; determining a first error between the first pattern and the imaging performance of the first pattern, and a second error between the second pattern and the imaging performance of said second pattern; utilizing the first error to adjust the first pattern to generate a modified first pattern; utilizing the second error to adjust the second pattern to generate a modified second pattern; and applying a second optical proximity correction process to the modified first pattern and the modified second pattern.

Method For Performing Pattern Decomposition Based On Feature Pitch

US Patent:
8615126, Dec 24, 2013
Filed:
Jun 27, 2011
Appl. No.:
13/170126
Inventors:
Jung Chul Park - Pleasanton CA, US
Assignee:
ASML Masktools B.V. - Veldhoven
International Classification:
G06K 9/00
US Classification:
382144, 382145, 382190, 382199, 382203, 382260, 382261, 382263, 382264, 382276
Abstract:
The present invention discloses a method for decomposing a target pattern containing features to be printed on a wafer, into multiple patterns, the features having a plurality of patterns within a minimum pitch for processes utilized to image the target pattern. The method includes superposing a predefined kernel over a pixel, and moving the kernel from one pixel to another, the pixels representing the sub-patterns of the target pattern. Polarity of the kernel may be reversed when the pixel has a stored intensity value that is negative.

Load/Unload Ramp Spoiler For A Hard Disk Drive

US Patent:
2009003, Feb 5, 2009
Filed:
Jul 31, 2007
Appl. No.:
11/888417
Inventors:
Andre S. Chan - Milpitas CA, US
Ferdinand Hendriks - Morgan Hill CA, US
Brad V. Johnson - Santa Clara CA, US
Jung Seo Park - San Jose CA, US
International Classification:
G11B 5/60
US Classification:
3602354
Abstract:
A load/unload ramp spoiler for a hard disk drive is disclosed. One embodiment provides a load/unload ramp body having at least one load/unload ramp associated therewith, the at least one load/unload ramp for receiving at least one slider coupled with an actuator assembly. In addition, at least one spoiler is integrated with the load/unload ramp body to reduce detrimental local excitation of an airflow encountering the load/unload ramp body.

Electrical Accessory And Method Of Providing Same

US Patent:
2013011, May 9, 2013
Filed:
Dec 28, 2012
Appl. No.:
13/730430
Inventors:
BELKIN INTERNATIONAL, INC. - Playa Vista CA, US
Vincent Razo - Granada Hills CA, US
Thorben Neu - Los Angeles CA, US
Chad DeJong - Los Angeles CA, US
David A. Kleeman - Marina del Rey CA, US
Vijendra Nalwad - Newbury Park CA, US
Jung Man Park - Altadena CA, US
Steven Lane - Orange CA, US
Assignee:
BELKIN INTERNATIONAL, INC. - Playa Vista CA
International Classification:
F16M 13/02
US Classification:
248542, 2482059
Abstract:
Some embodiments disclose a coupling device configured to couple to a surface. The coupling device including: (a) a first housing; (b) a rotational dial with a first aperture and mechanically coupled to the first housing, the rotational dial comprising a cam mechanism adjacent to the first aperture; (c) a support base comprising a first stem with a second aperture, the first stem is located inside the first aperture, the stem having a second aperture; (d) a suction cup coupled to at least one of the rotational dial or the support base, the suction cup having: (1) a suction portion; and (2) a second stem located inside of the second aperture; and (e) an elastic mechanism located at least partially between the support base and the second stem of the suction cup. The coupling device is configured such that the suction cup can be rotated relative to at least the rotational dial to create a vacuum between the suction portion and the surface. Other embodiments are disclosed herein.

Method And Apparatus For Performing Model-Based Opc For Pattern Decomposed Features

US Patent:
2013018, Jul 18, 2013
Filed:
Mar 5, 2013
Appl. No.:
13/786249
Inventors:
Jung Chul Park - Pleasanton CA, US
Douglas Van Den Broeke - Sunnyvale CA, US
Jang Fung Chen - Cupertino CA, US
Assignee:
ASML NETHERLANDS B.V. - Veldhoven
International Classification:
G06T 7/00
US Classification:
382144
Abstract:
A method for decomposing a target circuit pattern containing features to be imaged into multiple patterns. The process includes the steps of separating the features to be printed into a first pattern and a second pattern; performing a first optical proximity correction process on the first pattern and the second pattern; determining an imaging performance of the first pattern and the second pattern; determining a first error between the first pattern and the imaging performance of the first pattern, and a second error between the second pattern and the imaging performance of said second pattern; utilizing the first error to adjust the first pattern to generate a modified first pattern; utilizing the second error to adjust the second pattern to generate a modified second pattern; and applying a second optical proximity correction process to the modified first pattern and the modified second pattern.

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