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Merrill W Shafer Deceased56 View Crest Dr, Falmouth, MA 02540

Merrill Shafer Phones & Addresses

56 View Crest Dr, Falmouth, MA 02540    508-5484418   

Jackson, NH   

Yorktown Heights, NY   

Bartlett, NH   

Somers, NY   

Briarcliff Manor, NY   

Work

Position: Sales/Service

Mentions for Merrill W Shafer

Merrill Shafer resumes & CV records

Resumes

Merrill Shafer Photo 10

Merrill Shafer

Location:
United States
Work:
IBM 1956 - 1989
Mgr. Solid State Chem.
Education:
Penn State University 1952 - 1956
Ph.D, Mat. Science
Susquehanna University 1947 - 1951
B.A., Chemistry
Merrill Shafer Photo 11

Merrill Shafer

Publications & IP owners

Us Patents

Electrolytic Printing Process With Wear Resistant Electrode

US Patent:
4415905, Nov 15, 1983
Filed:
Feb 10, 1983
Appl. No.:
6/465236
Inventors:
Joseph W. Mitchell - Montrose NY
Merrill W. Shafer - Yorktown Heights NY
Carlos J. Sambucetti - Croton-on-Hudson NY
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
C25B 1110
C25B 1108
US Classification:
346 11
Abstract:
The present invention provides a process for electrolytic printing using an improved electrode. The electrode has a region which is an oxide of a metal from the group of ruthenium, iridium, platinum or an alloy thereof. The oxide region is at the extremity of the electrode which during the printing is in close proximity to the printing medium. This oxide region provides an increase in wear resistance of about two orders of magnitude over non-oxidized electrodes. Method for fabricating the described electrode is also set forth.

Stable Surface Coating For Ink Jet Nozzles

US Patent:
4623906, Nov 18, 1986
Filed:
Oct 31, 1985
Appl. No.:
6/793378
Inventors:
G. V. Chandrashekhar - Mahopac NY
Merrill W. Shafer - Peekskill NY
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G01D 1518
US Classification:
346140R
Abstract:
An improved glass or silicon ink jet nozzle is described having a three-layer coating that provides improved mechanical and chemical properties. The coating includes a first layer of silicon nitride, an intermediate layer graded in composition, and a top-most layer of aluminum nitride. The intermediate layer is typically a solid solution of silicon and aluminum nitrides being silicon-rich at the interface with the silicon nitride layer, and aluminum-rich at the interface with the overlying aluminum nitride layer. This three-layer coating provides the required dielectric properties, displays very low wettability, and is extremely corrosion resistant to all types of inks.

Manganese Doped Zinc Silicate Luminescent Phosphors With Iii-V Oxide Substitutions

US Patent:
4231892, Nov 4, 1980
Filed:
Mar 5, 1979
Appl. No.:
6/017521
Inventors:
Ifay F. Chang - Chappaqua NY
Merrill W. Shafer - Yorktown Heights NY
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
C09K 1144
US Classification:
2523016F
Abstract:
A series of solid solutions in the systems Zn. sub. 2 SiO. sub. 4 -Zn. sub. 2 M. sup. +3. sub. 5 M. sup. +5. sub. 5 O. sub. 4, is synthesized by practice of this disclosure. Solid reaction technique is used where M. sup. +3 and M. sup. +5 signify ions from Groups III and V of the periodic table. Large increases in the efficiency compared to the prior art P1 phosphor (Zn. sub. 2 SiO. sub. 4 :Mn) are achieved by substituting various combinations of Group III and V oxides for SiO. sub. 2, e. g. , Al and P to provide Zn. sub. 2-y Mn. sub. y Si. sub. 1-2x Al. sub. x P. sub. x O. sub. 4. The photoluminescence efficiency of the phosphors of this disclosure exhibit strong dependence on the III-V substitution concentration, x, having highest efficiency for the approximate range of x=0. 25% to 1. 5%.

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