Michael L Lam, 483380 Narod St, Las Vegas, NV 89121

7418693, Aug 26, 2008

Aug 18, 2005

11/207267

Frank E. Gennari - Berkeley CA, US
Ya-Chieh Lai - Antioch CA, US
Matthew W. Moskewicz - Berkeley CA, US
Michael C. Lam - Rancho Cucamonga CA, US
Gregory R. McIntyre - El Cerrito CA, US

Cadence Design Systems, Inc. - San Jose CA

G06F 17/50

716 19, 716 12, 716 13, 716 14

Systems, methodologies and technologies for the analysis and transformation of integrated circuit layouts using situations are disclosed. A method for transforming an integrated circuit (IC) layout includes recognizing shapes within the IC layout, identifying features for each of the shapes and extracting situations for the respective features. Extracted situations can be used to improve optical proximity correction (OPC) of the IC layout. This improved OPC includes extracting the situations, simulating the situations to determine a set of the situations identified for modification based on failing to satisfy a desired OPC tolerance level, modifying the set of situations to improve satisfaction of the desired OPC tolerance level, and reintegrating the modified set of situations into the IC layout. Extracted situations can also be used to improve aerial image simulation of the IC layout. This improved aerial image simulation includes extracting the situations, simulating a subset of the situations to determine aerial images of the subset, and tiling the subset of situations to form a larger aerial image.

7653892, Jan 26, 2010

Aug 18, 2005

11/207266

Frank E. Gennari - Berkeley CA, US
Ya-Chieh Lai - Antioch CA, US
Matthew W. Moskewicz - Berkeley CA, US
Michael C. Lam - Rancho Cucamonga CA, US
Gregory R. McIntyre - El Cerrito CA, US

Cadence Design Systems, Inc. - San Jose CA

G06F 17/50

716 19, 716 20, 716 21

Systems and methods for creating and implementing two-dimensional (2D), image-based design rules (IBDRs) are disclosed. Techniques for creating 2D IBDR can include identifying a search pattern that is representative of a 2D pattern of interest of a design, creating a pattern representation based on the search pattern, defining an anchor point for the pattern representation, and assigning weights to elements of the pattern representation. The 2D IBDR can be used in systems and method for searching a design by comparing the 2D IBDR to the design. A number of 2D IBDRs can be merged into a subset of similar 2D IBDRs by characterizing desired rule geometries, sorting the 2D IBDRs into groups according to the desired rule geometries, merging the groups of 2D IBDRs into a single representative search pattern. Additionally, standard design rules can be created from the disclosed 2D IBDRs. The standard design rule can be created from a 2D pattern of interest by defining an origin of a shape within the 2D pattern of interest, identifying features within the 2D pattern of interest, deriving parameters relative to the origin for each of the identified features, and writing the standard design rule script using the derived parameters.

7661087, Feb 9, 2010

Dec 12, 2006

11/609903

Frank E. Gennari - Berkeley CA, US
Ya-Chieh Lai - Antioch CA, US
Matthew W. Moskewicz - Berkeley CA, US
Michael C. Lam - Rancho Cucamonga CA, US
Gregory R. McIntyre - El Cerrito CA, US

Cadence Design Systems, Inc. - San Jose CA

G06F 17/50
G06F 9/45

716 18, 716 19, 716 10

Systems, methodologies and technologies for the analysis and transformation of integrated circuit layouts using situations are disclosed. A method for transforming an integrated circuit (IC) layout includes recognizing shapes within the IC layout, identifying features for each of the shapes and extracting situations for the respective features. Extracted situations can be used to improve optical proximity correction (OPC) of the IC layout. This improved OPC includes extracting the situations, simulating the situations to determine a set of the situations identified for modification based on failing to satisfy a desired OPC tolerance level, modifying the set of situations to improve satisfaction of the desired OPC tolerance level, and reintegrating the modified set of situations into the IC layout. Extracted situations can also be used to improve aerial image simulation of the IC layout. This improved aerial image simulation includes extracting the situations, simulating a subset of the situations to determine aerial images of the subset, and tiling the subset of situations to form a larger aerial image.

7707542, Apr 27, 2010

Dec 12, 2006

11/609904

Frank E. Gennari - Berkeley CA, US
Ya-Chieh Lai - Antioch CA, US
Matthew W. Moskewicz - Berkeley CA, US
Michael C. Lam - Rancho Cucamonga CA, US
Gregory R. McIntyre - El Cerrito CA, US

Cadence Design Systems, Inc. - San Jose CA

G06F 17/50
G03F 9/00
G03F 1/00

716 21, 716 19, 430 5

Systems, methodologies and technologies for the analysis and transformation of integrated circuit layouts using situations are disclosed. A method for transforming an integrated circuit (IC) layout includes recognizing shapes within the IC layout, identifying features for each of the shapes and extracting situations for the respective features. Extracted situations can be used to improve optical proximity correction (OPC) of the IC layout. This improved OPC includes extracting the situations, simulating the situations to determine a set of the situations identified for modification based on failing to satisfy a desired OPC tolerance level, modifying the set of situations to improve satisfaction of the desired OPC tolerance level, and reintegrating the modified set of situations into the IC layout. Extracted situations can also be used to improve aerial image simulation of the IC layout. This improved aerial image simulation includes extracting the situations, simulating a subset of the situations to determine aerial images of the subset, and tiling the subset of situations to form a larger aerial image.

7752577, Jul 6, 2010

Dec 12, 2006

11/609895

Frank E. Gennari - Berkeley CA, US
Ya-Chieh Lai - Antioch CA, US
Matthew W. Moskewicz - Berkeley CA, US
Michael C. Lam - Rancho Cucamonga CA, US
Gregory R. McIntyre - El Cerrito CA, US

Cadence Design Systems, Inc. - San Jose CA

G06F 17/50

716 1, 716 19, 716 21

Systems and methods for creating and implementing two-dimensional (2D), image-based design rules (IBDRs) are disclosed. Techniques for creating 2D IBDR can include identifying a search pattern that is representative of a 2D pattern of interest of a design, creating a pattern representation based on the search pattern, defining an anchor point for the pattern representation, and assigning weights to elements of the pattern representation. The 2D IBDR can be used in systems and method for searching a design by comparing the 2D IBDR to the design. A number of 2D IBDRs can be merged into a subset of similar 2D IBDRs by characterizing desired rule geometries, sorting the 2D IBDRs into groups according to the desired rule geometries, merging the groups of 2D IBDRs into a single representative search pattern. Additionally, standard design rules can be created from the disclosed 2D IBDRs. The standard design rule can be created from a 2D pattern of interest by defining an origin of a shape within the 2D pattern of interest, identifying features within the 2D pattern of interest, deriving parameters relative to the origin for each of the identified features, and writing the standard design rule script using the derived parameters.

7818707, Oct 19, 2010

Dec 12, 2006

11/609901

Frank E. Gennari - Berkeley CA, US
Ya-Chieh Lai - Antioch CA, US
Matthew W. Moskewicz - Berkeley CA, US
Michael C. Lam - Rancho Cucamonga CA, US
Gregory R. McIntyre - El Cerrito CA, US

Cadence Design Systems, Inc. - San Jose CA

G06F 17/50

716 19, 716 2, 716 11, 716 18

Systems, methodologies and technologies for the analysis and transformation of integrated circuit layouts using situations are disclosed. A method for transforming an integrated circuit (IC) layout includes recognizing shapes within the IC layout, identifying features for each of the shapes and extracting situations for the respective features. Extracted situations can be used to improve optical proximity correction (OPC) of the IC layout. This improved OPC includes extracting the situations, simulating the situations to determine a set of the situations identified for modification based on failing to satisfy a desired OPC tolerance level, modifying the set of situations to improve satisfaction of the desired OPC tolerance level, and reintegrating the modified set of situations into the IC layout. Extracted situations can also be used to improve aerial image simulation of the IC layout. This improved aerial image simulation includes extracting the situations, simulating a subset of the situations to determine aerial images of the subset, and tiling the subset of situations to form a larger aerial image.

7831942, Nov 9, 2010

Dec 12, 2006

11/609892

Frank E. Gennari - Berkeley CA, US
Ya-Chieh Lai - Antioch CA, US
Matthew W. Moskewicz - Berkeley CA, US
Michael C. Lam - Rancho Cucamonga CA, US
Gregory R. McIntyre - El Cerrito CA, US

Cadence Design Systems, Inc. - San Jose CA

G06F 17/50
G06F 9/45
G03C 5/00

716 5, 716 19, 716 21, 430 30

Systems and methods for creating and implementing two-dimensional (2D), image-based design rules (IBDRs) are disclosed. Techniques for creating 2D IBDR can include identifying a search pattern that is representative of a 2D pattern of interest of a design, creating a pattern representation based on the search pattern, defining an anchor point for the pattern representation, and assigning weights to elements of the pattern representation. The 2D IBDR can be used in systems and method for searching a design by comparing the 2D IBDR to the design. A number of 2D IBDRs can be merged into a subset of similar 2D IBDRs by characterizing desired rule geometries, sorting the 2D IBDRs into groups according to the desired rule geometries, merging the groups of 2D IBDRs into a single representative search pattern. Additionally, standard design rules can be created from the disclosed 2D IBDRs. The standard design rule can be created from a 2D pattern of interest by defining an origin of a shape within the 2D pattern of interest, identifying features within the 2D pattern of interest, deriving parameters relative to the origin for each of the identified features, and writing the standard design rule script using the derived parameters.

8091047, Jan 3, 2012

Dec 22, 2009

12/644742

Frank E. Gennari - Berkeley CA, US
Ya-Chieh Lai - Antioch CA, US
Matthew W. Moskewicz - Berkeley CA, US
Michael C. Lam - Rancho Cucamonga CA, US
Gregory R. McIntyre - El Cerrito CA, US

Cadence Design Systems, Inc. - San Jose CA

G06F 17/50

716 50, 716 54, 716 55

Systems and methods for creating and implementing two-dimensional (2D), image-based design rules (IBDRs) are disclosed. Techniques for creating 2D IBDR can include identifying a search pattern that is representative of a 2D pattern of interest of a design, creating a pattern representation based on the search pattern, defining an anchor point for the pattern representation, and assigning weights to elements of the pattern representation. The 2D MDR can be used in systems and method for searching a design by comparing the 2D IBDR to the design. A number of 2D IBDRs can be merged into a subset of similar 2D IBDRs by characterizing desired rule geometries, sorting the 2D IBDRs into groups according to the desired rule geometries, merging the groups of 2D IBDRs into a single representative search pattern. Additionally, standard design rules can be created from the disclosed 2D IBDRs. The standard design rule can be created from a 2D pattern of interest by defining an origin of a shape within the 2D pattern of interest, identifying features within the 2D pattern of interest, deriving parameters relative to the origin for each of the identified features, and writing the standard design rule script using the derived parameters.