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Mu U Zhang, 46San Jose, CA

Mu Zhang Phones & Addresses

San Jose, CA   

Sunnyvale, CA   

34935 Nova Ter, Fremont, CA 94555   

Redmond, WA   

Ames, IA   

Mentions for Mu U Zhang

Mu Zhang resumes & CV records

Resumes

Mu Zhang Photo 32

Beijing No.4 High School

Location:
Sunnyvale, CA
Industry:
Computer Software
Work:
Ericsson Mar 2016 - Mar 2018
Engineer Manager I
Ericsson Mar 2016 - Mar 2018
Engineer Manager Ii
Ericsson May 2014 - Mar 2016
Engineer Iii
Microsoft Nov 2006 - Apr 2014
Software Development Engineer In Test Ii and Sdet
Microsoft Jun 2005 - Nov 2006
Software Development Engineer In Test
Iowa State University Aug 2004 - May 2005
Software Developer
Sunnyvale California Aug 2004 - May 2005
Beijing No.4 High School
Education:
Iowa State University 2001 - 2004
Master of Science, Masters, Computer Science
Peking University 1997 - 2001
Bachelors, Bachelor of Science
Beijing No.4 High School
Skills:
Microsoft Exchange, Testing, Test Automation, Software Quality Assurance, Agile Methodologies, Software Engineering, Test Planning, Scrum, Programming, Test Cases
Mu Zhang Photo 33

Mu Zhang

Mu Zhang Photo 34

Mu Zhang

Mu Zhang Photo 35

Mu Zhang

Mu Zhang Photo 36

Mu Zhang

Publications & IP owners

Us Patents

Reactive Particulate Materials Useful For Additive Manufacturing

US Patent:
2021024, Aug 12, 2021
Filed:
May 9, 2019
Appl. No.:
17/053931
Inventors:
- Redwood City CA, US
Mu San Zhang - San Francisco CA, US
Xinyu Gu - San Mateo CA, US
Jason P. Rolland - San Carlos CA, US
Joseph M. DeSimone - Monte Sereno CA, US
International Classification:
C08L 55/00
C09D 175/16
C08J 3/12
C08G 18/80
C08G 18/75
C08G 18/48
C08G 18/32
C08G 18/10
C08G 18/08
C08F 290/06
C08K 5/00
B33Y 40/10
B33Y 10/00
B33Y 70/00
B29C 64/165
B29C 64/314
Abstract:
Provided herein are methods of making a reactive particulate material by free radically polymerizing a single-cure resin to produce a polymer, the resin comprising: a reactive blocked polyurethane prepolymer, a reactive blocked polyurea prepolymer, a reactive blocked polyurethane-polyurea copolymer, or a combination thereof, wherein said polymerizing is carried out by dispersive polymerization (e.g., an emulsion, suspension or dispersion polymerization process), to form said reactive particulate material. Methods of use of the reactive particulate material and material sets including the same are also provided.

Blocking Groups For Light Polymerizable Resins Useful In Additive Manufacturing

US Patent:
2020017, Jun 4, 2020
Filed:
Jun 7, 2018
Appl. No.:
16/615446
Inventors:
- Redwood City CA, US
Andrew Gordon Wright - Mountain View CA, US
Mu San Zhang - San Francisco CA, US
International Classification:
G03F 7/029
B33Y 10/00
B33Y 70/00
B29C 64/129
C09D 11/101
C09D 11/102
C08G 18/12
Abstract:
Provided herein is a method of forming a three-dimensional object in which the polymerizable liquid includes a mixture of (i) a light polymerizable first component, and (ii) a heat polymerizable second component; the heat polymerizable second component comprising (i) a first blocked reactive constituent that is blocked with a volatile blocking group, and optionally (ii) a curative. Upon heating a formed three-dimensional intermediate sufficiently, the volatile blocking group is cleaved and vaporizes out of the three-dimensional intermediate, to form the three-dimensional object. Also provided is a three-dimensional object produced by the method. Further provided is a polymerizable liquid composition useful for carrying out the method, and prepolymers and monomers useful for the polymerizable liquid composition.

Hydrophilic Polymers With Antimicrobial Functionalities

US Patent:
2019017, Jun 13, 2019
Filed:
Dec 12, 2017
Appl. No.:
15/839388
Inventors:
- Armonk NY, US
- Connexis, SG
Nathaniel H. Park - San Jose CA, US
Victoria A. Piunova - Los Gatos CA, US
Pang Kern Jeremy Tan - Singapore, SG
Yi Yan Yang - Singapore, SG
Mu San Zhang - San Francisco CA, US
International Classification:
A01N 37/18
C08G 69/40
Abstract:
Techniques regarding ionene and/or polyionene compositions with antimicrobial functionality and enhanced hydrophilicity are provided. For example, one or more embodiments can regard a chemical compound that can comprise an ionene unit, which can comprise a cation distributed along a degradable backbone. The degradable backbone can comprise a terephthalamide structure. The ionene unit can have antimicrobial functionality. Further, the chemical compound can comprise a hydrophilic functional group covalently bonded to the ionene unit. Also, the chemical compound can have carbohydrate mimetic functionality.

Monomer Compositions With Antimicrobial Functionality

US Patent:
2019017, Jun 13, 2019
Filed:
Dec 12, 2017
Appl. No.:
15/839199
Inventors:
- Armonk NY, US
- Connexis, SG
Nathaniel H. Park - San Jose CA, US
Victoria A. Piunova - Los Gatos CA, US
Pang Kern Jeremy Tan - Singapore, SG
Yi Yan Yang - Singapore, SG
Mu San Zhang - San Francisco CA, US
International Classification:
A01N 37/30
C07D 233/61
A01N 43/50
C07C 233/78
C07C 231/12
Abstract:
Techniques regarding ionene compositions with antimicrobial functionality are provided. For example, one or more embodiments can comprise a monomer, which can comprise a single ionene unit. The single ionene unit can comprise a cation distributed along a molecular backbone. Also, a hydrophobic functional group can be covalently bonded to the molecular backbone, and the single ionene unit can have antimicrobial functionality.

Polycarbonate Based Pi-Pi Stabilized Nano-Objects And Hydrogels

US Patent:
2018011, Apr 26, 2018
Filed:
Oct 24, 2016
Appl. No.:
15/332010
Inventors:
- ARMONK NY, US
MAREVA B. FEVRE - SAN JOSE CA, US
JEANNETTE M. GARCIA - SAN LEANDRO CA, US
JAMES L. HEDRICK - PLEASANTON CA, US
NATHANIEL H. PARK - SAN JOSE CA, US
RUDY J. WOJTECKI - SAN JOSE CA, US
MU SAN ZHANG - SAN JOSE CA, US
International Classification:
C08G 81/00
C08L 87/00
Abstract:
A block copolymer includes a water-soluble block that is bonded to one or more hydrophobic polycarbonate blocks that include pendant fluoroaryl substituents.

Tailorable Viscoelastic Properties Of Peg-Hemiaminal Organogel Networks

US Patent:
2017034, Nov 30, 2017
Filed:
Aug 18, 2017
Appl. No.:
15/681057
Inventors:
- Armonk NY, US
Mareva B. FEVRE - San Jose CA, US
Jeannette M. GARCIA - San Leandro CA, US
James L. HEDRICK - Pleasanton CA, US
Rudy J. WOJTECKI - San Jose CA, US
Mu San ZHANG - San Jose CA, US
International Classification:
C08G 65/48
C08L 71/00
C08L 39/06
Abstract:
Methods, compounds, and compositions described herein generally relate to hemiaminal organogel networks (HDCNs) and methods of forming HDCNs. In some embodiments, a hemiaminal organogel has a plurality of first polymers, each having a first end and a second end, a plurality of second polymers, each having a first end and a second end, and a plurality of trivalent aminal-hemiaminal linkages. The first end of each polymer of the plurality of first polymers may be covalently bonded to a first trivalent aminal-hemiaminal linkage. The second end of each polymer of the plurality of first polymers may be covalently bonded to a second trivalent aminal-hemiaminal linkage. The first end of each polymer of the plurality of second polymers may be covalently bonded to one of the plurality of trivalent aminal-hemiaminal linkages. The second end of each polymer of the plurality of second polymers may be non-covalently bonded.

Hydrogel Compositions For Direct-Write Printing Applications

US Patent:
2017026, Sep 21, 2017
Filed:
Mar 16, 2016
Appl. No.:
15/071787
Inventors:
- Armonk NY, US
Wei Han - San Jose CA, US
Hareem T. Maune - San Jose CA, US
Alshakim Nelson - Montlake WA, US
Ankit Vora - San Jose CA, US
Rudy J. Wojtecki - San Jose CA, US
Mu San Zhang - San Jose CA, US
International Classification:
C09D 11/102
A61L 27/18
B05B 17/06
C09D 11/101
Abstract:
A thermo-responsive shear-thinning photo-curable composition comprises water, a linear amphiphilic polyether ABA triblock copolymer comprising at least one pendent ene group (*—CH═CH) capable of undergoing a thiol-ene reaction, a water-soluble crosslinking agent comprising two or more methylenethiol groups (*—CHSH), and a photoinitiator. Under non-shear conditions and a triblock copolymer concentration suitable for direct-write printing, the composition is a viscoelastic solid (hydrogel) at a temperature of about 15 C. to about 45 C., and is a free-flowing liquid (sol) between 0 C. and about 10 C. The hydrogel form can be shear-thinned at about 15 C. to about 45 C. to form a sol suitable for a direct-write printer using an extruding print-head. The compositions covalently crosslink when flood-exposed to ultraviolet radiation. The compositions have utility in forming three-dimensional scaffolds for growing living cells.

Antimicrobial Polymers Formed By Bulk Polyaddition

US Patent:
2017009, Apr 6, 2017
Filed:
Dec 19, 2016
Appl. No.:
15/382865
Inventors:
- Armonk NY, US
- Singapore, SG
Robert J. Ono - San Jose CA, US
Jye Yng Teo - Singapore, SG
Yi Yan Yang - Singapore, SG
Mu San Zhang - San Jose CA, US
International Classification:
A01N 33/12
C08G 73/02
Abstract:
Cationic antimicrobial polymers have been synthesized by a bulk addition polymerization of a nucleophilic agent comprising two tertiary amines and an electrophilic agent that comprises two leaving groups and an aromatic ring between the leaving groups. The reaction solvent for the polymerization is chosen to allow precipitation of the cationic polymer at the polymerization temperature, thereby limiting molecular weight. Quaternization and polymerization occur concurrently. The cationic polymers can be highly active against Gram-negative and Gram-positive microbes, and/or fungi. The cationic polymers can also be non-hemolytic and non-cytotoxic at the effective concentration against the microbes.

Isbn (Books And Publications)

Monggol-Un Qosigu Nutug-Un Temdeglel (Dooradu)

Author:
Mu Zhang
ISBN #:
7105014067

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