Nan Zhao resumes & CV records
Resumes
Nan Zhao
Nan Zhao
Nan Zhao
Nan Zhao
Nan Zhao
Location:
United States
Nan J Zhao, 5332478 Capitola Ct, Union City, CA 94587
Nan Zhao Phones & Addresses
Union City, CA
3842 Howe Ct, Fremont, CA 94538 510-6573836
Reno, NV
Sunnyvale, CA
Manhattan, KS
Santa Clara, CA
39669 Wall Cmn, Fremont, CA 94538
Work
Position:
Service Occupations
Education
Degree:
Bachelor's degree or higher
Mentions for Nan J Zhao
Publications & IP owners
Us Patents
Systems And Methods Of Optimal Metrology Guidance
US Patent:
2022023, Jul 28, 2022
Filed:
Jan 3, 2022
Appl. No.:
17/567847
Inventors:
- Veldhoven, NL
Wei FANG - Milpitas CA, US
Nan ZHAO - San Jose CA, US
Wentian ZHOU - San Jose CA, US
Teng WANG - San Jose CA, US
Ming XU - San Jose CA, US
Wei FANG - Milpitas CA, US
Nan ZHAO - San Jose CA, US
Wentian ZHOU - San Jose CA, US
Teng WANG - San Jose CA, US
Ming XU - San Jose CA, US
Assignee:
ASML Netherlands B.V. - Veldhoven
International Classification:
G06T 7/00
G06T 7/60
G06T 7/60
Abstract:
Systems and methods for optimal electron beam metrology guidance are disclosed. According to certain embodiments, the method may include receiving an acquired image of a sample, determining a set of image parameters based on an analysis of the acquired image, determining a set of model parameters based on the set of image parameters, generating a set of simulated images based on the set of model parameters. The method may further comprise performing measurement of critical dimensions on the set of simulated images and comparing critical dimension measurements with the set of model parameters to provide a set of guidance parameters based on comparison of information from the set of simulated images and the set of model parameters. The method may further comprise receiving auxiliary information associated with target parameters including critical dimension uniformity.
Systems And Methods Of Optimal Metrology Guidance
US Patent:
2020007, Mar 5, 2020
Filed:
Aug 28, 2019
Appl. No.:
16/554110
Inventors:
- AH Veldhoven, NL
Wei FANG - Milpitas CA, US
Nan ZHAO - San Jose CA, US
Wentian ZHOU - San Jose CA, US
Teng WANG - San Jose CA, US
Ming XU - San Jose CA, US
Wei FANG - Milpitas CA, US
Nan ZHAO - San Jose CA, US
Wentian ZHOU - San Jose CA, US
Teng WANG - San Jose CA, US
Ming XU - San Jose CA, US
International Classification:
G06T 7/00
G06T 7/60
G06T 7/60
Abstract:
Systems and methods for optimal electron beam metrology guidance are disclosed. According to certain embodiments, the method may include receiving an acquired image of a sample, determining a set of image parameters based on an analysis of the acquired image, determining a set of model parameters based on the set of image parameters, generating a set of simulated images based on the set of model parameters. The method may further comprise performing measurement of critical dimensions on the set of simulated images and comparing critical dimension measurements with the set of model parameters to provide a set of guidance parameters based on comparison of information from the set of simulated images and the set of model parameters. The method may further comprise receiving auxiliary information associated with target parameters including critical dimension uniformity.
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