Inventors:
- Santa Clara CA, US
Lin ZHANG - San Jose CA, US
Jiyong HUANG - Rockwall TX, US
Joseph C. WERNER - Santa Clara CA, US
Stanley WU - San Ramon CA, US
Mahesh Adinath KANAWADE - Santa Clara CA, US
Yikai CHEN - San Jose CA, US
Yixing LIN - Saratoga CA, US
Ying MA - Castro Valley CA, US
International Classification:
C23C 16/44
C01F 17/265
Abstract:
Embodiments of the present disclosure generally relate to an apparatus and a method for cleaning a processing chamber. In one embodiment, a substrate support cover includes a bulk member coated with a fluoride coating. The substrate support cover is placed on a substrate support disposed in the processing chamber during a cleaning process. The fluoride coating does not react with the cleaning species. The substrate support cover protects the substrate support from reacting with the cleaning species, leading to reduced condensation formed on chamber components, which in turn leads to reduced contamination of the substrate in subsequent processes.