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Pablo R Rojas, 433425 Knox Pl UNIT 4G, Bronx, NY 10467

Pablo Rojas Phones & Addresses

Bergenfield, NJ   

Bronx, NY   

Englewood, NJ   

Work

Company: Assouline publishing inc May 2014 Position: Sr. accountant

Education

School / High School: Katherine Gibbs- New York, NY 2003 Specialities: Associates in Computer Network Operations

Mentions for Pablo R Rojas

Career records & work history

Medicine Doctors

Pablo G. Rojas

Specialties:
Internal Medicine
Work:
Santa Ynez Valley Medical Associates
2030 Viborg Rd STE 205, Solvang, CA 93463
805-6882600 (phone) 805-6884119 (fax)
Languages:
English, Spanish
Description:
Mr. Rojas works in Solvang, CA and specializes in Internal Medicine. Mr. Rojas is affiliated with Santa Ynez Valley Cottage Hospital.

Pablo Rojas resumes & CV records

Resumes

Pablo Rojas Photo 50

Pablo Rojas - Bronx, NY

Work:
Assouline Publishing Inc May 2014 to 2000
Sr. Accountant
L'Occitane, Inc - New York, NY 2006 to May 2014
Staff Accountant - Responsible for Treasury Operations & Accounts Receivable
L'Occitane, Inc 2006 to 2010
Senior Cash Reconciler
Citigroup Global Markets Inc - New York, NY 1999 to 2006
Senior Cash Reconciliation Clerk
Education:
Katherine Gibbs - New York, NY 2003 to 2005
Associates in Computer Network Operations

Publications & IP owners

Us Patents

Verification Of Complex Workflows Through Internal Assessment Or Community Based Assessment

US Patent:
2013025, Sep 26, 2013
Filed:
Mar 21, 2012
Appl. No.:
13/426104
Inventors:
Stephanie M. Corthesy - Zurich, CH
Pablo Meyer Rojas - Brooklyn NY, US
Raquel Norel - New York NY, US
John J. Rice - Mohegan Lake NY, US
Ajay K. Royyuru - Congers NY, US
Joerg J. Sprengel - Baden, DE
Gustavo A. Stolovitzky - Riverdale NY, US
Thomas Bonk - KoIn, DE
Julia Hoeng - Neuchatel, CH
Manuel Peitsch - Peseux, CH
Katrin Stolle - Koln, DE
Assignee:
PHILLIP MORRIS INTERNATIONAL - Neuchatel
INTERNATIONAL BUSINESS MACHINES CORPORATION - Armonk NY
International Classification:
G06F 9/46
US Classification:
718102
Abstract:
A method of implementing verification of a complex workflow includes partitioning the workflow into modules, wherein the modules have inputs, processing steps and outputs; selecting, from the workflow, one of the partitioned modules for independent verification by challenge thereof; running, with a computing device, a challenge of the selected module, the challenge comprising comparing reference outputs to outputs of the selected module, wherein reference inputs are received by the selected module and the reference outputs are generated using the reference inputs and one of an ideal performing module or a well-established module; determining whether outputs of the selected module meet verification criteria with respect to the reference outputs, and based on the determining, implementing one of: declaring the selected module verified; subdividing the selected module into smaller modules and repeating the challenge on the smaller modules; or declaring the selected module not verified.

Predicting Human Discriminability Of Odor Mixtures

US Patent:
2020007, Mar 5, 2020
Filed:
Sep 4, 2018
Appl. No.:
16/121100
Inventors:
- Armonk NY, US
Guillermo Cecchi - New York NY, US
Pablo Meyer Rojas - Brooklyn NY, US
International Classification:
G01N 33/00
Abstract:
A system for compressing data during neural network training, comprising of memory that stores computer executable components; a processor that executes computer executable components stored in the memory, wherein the computer executable components comprise of a compilation component that compiles respective molecular descriptors regarding a first set of molecules; a perception component that learns human perception information related to olfactory perceptions of the first set of molecules, and generates predictions of human olfactory perceptions of a second set of molecules; a fitting component that fits distance predictions from the perception component regarding the second set of molecules against measured correct classifications regarding the second set of molecules; and a vector component that generates a perceptual vector distance between two olfactory targets.

Nanostructures Fabricated By Metal Asisted Chemical Etching For Antibacterial Applications

US Patent:
2019020, Jul 4, 2019
Filed:
Mar 11, 2019
Appl. No.:
16/298101
Inventors:
- Armonk NY, US
HUAN HU - Yorktown Heights NY, US
PABLO M. ROJAS - Brooklyn NY, US
GUSTAVO A. STOLOVITZKY - Riverdale NY, US
International Classification:
A01N 25/34
B81C 1/00
C30B 33/10
A01N 59/16
B81C 99/00
C09K 13/08
Abstract:
The method comprises contacting a silicon substrate with a silver salt and an acid for a time effective to produce spikes having a first end disposed on the silicon substrate and a second end extending away from the silicon substrate. The spikes have a second end diameter of about 10 nm to about 200 nm, a height of about 100 nm to 10 micrometers, and a density of about 10 to 100 per square microns. The nanostructures provide antimicrobial properties and can be transferred to the surface of various materials such as polymers.

Lateral Silicon Nanospikes Fabricated Using Metal-Assisted Chemical Etching

US Patent:
2019004, Feb 14, 2019
Filed:
Oct 17, 2018
Appl. No.:
16/162669
Inventors:
- Armonk NY, US
HUAN HU - YORKTOWN HEIGHTS NY, US
PABLO MEYER ROJAS - BROOKLYN NY, US
JOSHUA T. SMITH - CROTON-ON-HUDSON NY, US
International Classification:
A01N 25/00
A01N 25/34
B82Y 40/00
H01L 21/31
B82Y 30/00
Abstract:
The present disclosure relates to methods for forming an antimicrobial nanostructure and antimicrobial articles. The methods may include: providing a master template of a layout of the antimicrobial nanostructure on a silicon substrate, depositing a silicon nitride layer on a top surface of the silicon substrate, forming a patterned lithographic resist mask layer on a top surface of the silicon nitride layer, generating certain silicon pillars according to the patterned lithographic resist mask using a resist and reactive ion etching, forming certain lateral silicon nanospikes on the silicon pillars by performing metal assisted chemical etching (MacEtch), and removing the silicon nitride layer and bonding a top cover glass on the silicon pillars to form the antimicrobial nanostructure having lateral silicon nanospikes. The antimicrobial article may include a component of an electronic device, a biomedical article, a household product, a food grade article, a transportation component, or a public building component.

Correlating Olfactory Perception With Molecular Structure

US Patent:
2018010, Apr 19, 2018
Filed:
Oct 18, 2016
Appl. No.:
15/296597
Inventors:
- ARMONK NY, US
Amit Dhurandhar - Yorktown Heights NY, US
Pablo Meyer rojas - YORKTOWN HEIGHTS NY, US
International Classification:
G06F 19/00
Abstract:
Predicting human olfactory perception based on molecular structure is described. Molecular descriptor data indicative of molecular descriptors associated with a group of molecular samples can be obtained. Olfactory perception indicator (OPI) data for a set of OPIs can also be obtained with respect to the molecular samples. A training model can be executed on the molecular descriptor data and the OPI data to yield an output model that correlates molecular attributes with OPIs for a single individual or across an aggregate of individuals. The output model can be used to predict olfactory perception for a particular compound or mixture based on which OPIs are correlated with molecular descriptors of the compound or mixture in the output model. The output model can also be inverted and used to identify molecular descriptors that are correlated with a desired set of OPIs. A molecular construct having the molecular descriptors can then be generated.

Lateral Silicon Nanospikes Fabricated Using Metal-Assisted Chemical Etching

US Patent:
2017035, Dec 14, 2017
Filed:
Jun 26, 2017
Appl. No.:
15/632947
Inventors:
- ARMONK NY, US
HUAN HU - YORKTOWN HEIGHTS NY, US
PABLO MEYER ROJAS - BROOKLYN NY, US
JOSHUA T. SMITH - CROTON-ON-HUDSON NY, US
International Classification:
A01N 25/00
B82Y 40/00
B82Y 30/00
H01L 21/31
Abstract:
The present disclosure relates to methods for forming an antimicrobial nanostructure and antimicrobial articles. The methods may include: providing a master template of a layout of the antimicrobial nanostructure on a silicon substrate, depositing a silicon nitride layer on a top surface of the silicon substrate, forming a patterned lithographic resist mask layer on a top surface of the silicon nitride layer, generating certain silicon pillars according to the patterned lithographic resist mask using a resist and reactive ion etching, forming certain lateral silicon nanospikes on the silicon pillars by performing metal assisted chemical etching (MacEtch), and removing the silicon nitride layer and bonding a top cover glass on the silicon pillars to form the antimicrobial nanostructure having lateral silicon nanospikes. The antimicrobial article may include a component of an electronic device, a biomedical article, a household product, a food grade article, a transportation component, or a public building component.

Lateral Silicon Nanospikes Fabricated Using Metal-Assisted Chemical Etching

US Patent:
2017028, Oct 5, 2017
Filed:
Apr 5, 2016
Appl. No.:
15/091074
Inventors:
- ARMONK NY, US
HUAN HU - YORKTOWN HEIGHTS NY, US
PABLO MEYER ROJAS - BROOKLYN NY, US
JOSHUA T. SMITH - CROTON-ON-HUDSON NY, US
International Classification:
A01N 25/00
Abstract:
The present disclosure relates to methods for forming an antimicrobial nanostructure and antimicrobial articles. The methods may include: providing a master template of a layout of the antimicrobial nanostructure on a silicon substrate, depositing a silicon nitride layer on a top surface of the silicon substrate, forming a patterned lithographic resist mask layer on a top surface of the silicon nitride layer, generating certain silicon pillars according to the patterned lithographic resist mask using a resist and reactive ion etching, forming certain lateral silicon nanospikes on the silicon pillars by performing metal assisted chemical etching (MacEtch), and removing the silicon nitride layer and bonding a top cover glass on the silicon pillars to form the antimicrobial nanostructure having lateral silicon nanospikes. The antimicrobial article may include a component of an electronic device, a biomedical article, a household product, a food grade article, a transportation component, or a public building component.

Nanostructures Fabricated By Metal Asisted Chemical Etching For Antibacterial Applications

US Patent:
2017017, Jun 22, 2017
Filed:
Dec 18, 2015
Appl. No.:
14/973984
Inventors:
- Armonk NY, US
HUAN HU - YORKTOWN HEIGHTS NY, US
PABLO M. ROJAS - BROOKLYN NY, US
GUSTAVO A. STOLOVITZKY - RIVERDALE NY, US
International Classification:
C08J 5/00
C08J 5/18
C30B 33/10
Abstract:
The method comprises contacting a silicon substrate with a silver salt and an acid for a time effective to produce spikes having a first end disposed on the silicon substrate and a second end extending away from the silicon substrate. The spikes have a second end diameter of about 10 nm to about 200 nm, a height of about 100 nm to 10 micrometers, and a density of about 10 to 100 per square microns. The nanostructures provide antimicrobial properties and can be transferred to the surface of various materials such as polymers.

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