BackgroundCheck.run
Search For

Paulina P Garcia, 98147 Oakland Ave, Arlington, MA 02476

Known as:
Paulinia P Garcia
Related to:
Domingo P Garcia 66 Domingo P Garcia 86

Paulina Garcia Phones & Addresses

147 Oakland Ave, Arlington, MA 02476   

Yellville, AR   

Work

Company: Harvard law school library - Cambridge, MA Oct 2010 Position: Student casual worker

Education

School / High School: Harvard Divinity School- Cambridge, MA 2010 Specialities: MTS in Theology, Women and Gender Studies
Get Report
Control this profile

Mentions for Paulina P Garcia

Paulina Garcia resumes & CV records

Resumes

Paulina Garcia Photo 36

Paulina Garcia

Location:
Estados Unidos
Paulina Garcia Photo 37

Paulina Garcia

Location:
Estados Unidos
Paulina Garcia Photo 38

Public Relations Director At Integra

Position:
Public Relations Director at Integra, Relaciones Públicas y Organización de Eventos at Creativo 33
Location:
Naucalpan de Juárez Area, Mexico
Industry:
Public Relations and Communications
Work:
Integra - Mexico since Jul 2013
Public Relations Director Creativo 33 - Mexico since Jun 2004
Relaciones Públicas y Organización de Eventos Les Elfes international Camp - Suiza Nov 2011 - May 2012
Relaciones Públicas El Cole Montessori - Mexico Aug 2007 - Jul 2011
Relaciones Públicas y Maestra de Inglés Movimiento social apartidista "Colosio por México" - Mexico May 2006 - Dec 2010
Vocera Oficial / Coordinadora de Comunicación Interna y Relaciones Públicas Locución en Radio Agencia “SPOT” y Cámara de Diputados y Senadores - Mexico Sep 2006 - Dec 2009
Locución
Education:
Rennert School NY 2009 - 2010
TESOL Universidad Anáhuac 2002 - 2007
Comunications, Journalism and Radio Miraflores 1987 - 2002
Interests:
Travel
Paulina Garcia Photo 39

Profesional Independiente En El Sector Artesanía

Location:
Cincinnati y alrededores, Estados Unidos
Industry:
Arts and Crafts
Paulina Garcia Photo 40

Paulina Garcia

Location:
United States
Paulina Garcia Photo 41

Customer Service

Location:
Beaverton, Oregon
Industry:
Information Services
Work:
Vesta corporation Mar 2009 - Nov 2011
Customer service
Paulina Garcia Photo 42

Student At Harvard University

Location:
Greater Boston Area
Industry:
Writing and Editing
Paulina Garcia Photo 43

Graduate Student At Harvard University

Location:
Greater Boston Area
Industry:
Higher Education

Publications & IP owners

Us Patents

Squarylium Compounds, And Processes And Intermediates For The Synthesis Of These Compounds

US Patent:
6482950, Nov 19, 2002
Filed:
Jun 6, 1995
Appl. No.:
08/479077
Inventors:
Paulina P. Garcia - Arlington MA
John W. Lee - Still River MA
John L. Marshall - Somerville MA
Donald A. McGowan - Bedford MA
Anthony J. Puttick - Arlington MA
Thomas K. Spencer - Lexena KS
Stephen G. Stroud - Medford MA
Stephen J. Telfer - Arlington MA
Michael J. Zuraw - Arlington MA
Assignee:
Polaroid Corporation - Cambridge MA
International Classification:
C07D47100
US Classification:
546 66, 549 13, 549 23, 549407, 549427, 562899
Abstract:
Squarylium compounds of the formula: wherein Q and Q are each independently a pyrylium, thiopyrylium, selenopyrylium, benzpyrylium, benzthiopyrylium or benzselenopyrylium nucleus, and R and R are each independently an aliphatic or cycloaliphatic group, can be prepared by reacting a squaric acid derivative of the formula: with a compound of the formula Q CH R in the presence of a base. The derivatives of Formula II may be prepared by condensing a 2,3,4,4-tetrahalocyclobut-2-en-1-one with a compound of the formula Q CH R in the presence of a base to produce a compound of the formula: wherein Q and R are as defined above, and X represents chlorine or bromine, and hydrolyzing the compound of Formula III. Alternatively, the derivatives of Formula II may be prepared by reacting a diester, monoacid chloride monoester or diacid chloride of squaric acid with a compound of the formula Q CH R in the presence of a base, followed by hydrolysis of the resultant monoacid chloride or monoester derivative of the compound of Formula II to the parent compound.

3,3-Di-(Indolin-5-Yl)-Phthalides And Naphthalides

US Patent:
3931227, Jan 6, 1976
Filed:
Dec 26, 1973
Appl. No.:
5/427580
Inventors:
Alan L. Borror - Lexington MA
Paulina P. Garcia - Arlington MA
Assignee:
Polaroid Corporation - Cambridge MA
International Classification:
C07D20908
C07D20918
US Classification:
26032611R
Abstract:
This invention relates to a new class of phthalein dyes useful as the color-forming material in either pressure sensitive or heat sensitive mark-forming systems. Such dyes comprise 3,3-disubstituted phthalides and 3,3-disubstituted naphthalides wherein the 3,3 substituents are indolin-5-yl radicals.

Squarylium Compounds, And Processes And Intermediates For The Synthesis Of These Compounds

US Patent:
5231190, Jul 27, 1993
Filed:
May 6, 1991
Appl. No.:
7/696222
Inventors:
Donald A. McGowan - Bedford MA
Paulina P. Garcia - Arlington MA
John W. Lee - Still River MA
Thomas K. Spencer - Lexena KS
Stephen J. Telfer - Arlington MA
Michael J. Zuraw - Arlington MA
Assignee:
Polaroid Corporation - Cambridge MA
International Classification:
C07D33500
C07D33506
C07D34500
US Classification:
549 13
Abstract:
Squarylium compounds of the formula: ##STR1## wherein Q. sup. 1 and Q. sup. 2 are each independently a pyrylium, thiopyrylium, selenopyrylium, benzpyrylium, benzthiopyrylium or benzselenopyrylium nucleus, and R. sup. 1 and R. sup. 2 are each independently an aliphatic or cycloaliphatic group, can be prepared by reacting a squaric acid derivative of the formula: ##STR2## with a compound of the formula Q. sup. 2 CH. sub. 2 R. sup. 2 in the presence of a base. The derivatives of Formula II may be prepared by condensing a 2,3,4,4-tetrahalocyclobut-2-en-1-one with a compound of the formula Q. sup. 1 CH. sub. 2 R. sup. 1 in the presence of a base to produce a compound of the formula: ##STR3## wherein Q. sup. 1 and R. sup. 1 are as defined above, and X represents chlorine or bromine, and hydrolyzing the compound of Formula III. Alternatively, the derivatives of Formula II may be prepared by reacting a diester, monoacid chloride monoester or diacid chloride of squaric acid with a compound of the formula Q. sup. 1 CH. sub. 2 R. sup.

Squarylium Compounds, And Processes And Intermediates For The Synthesis Of These Compounds

US Patent:
5919950, Jul 6, 1999
Filed:
Apr 23, 1993
Appl. No.:
8/052212
Inventors:
Paulina P. Garcia - Arlington MA
John W. Lee - Still River MA
John L. Marshall - Somerville MA
Donald A. McGowan - Bedford MA
Anthony J. Puttick - Arlington MA
Thomas K. Spencer - Lexena KS
Stephen G. Stroud - Medford MA
Stephen J. Telfer - Arlington MA
Michael J. Zuraw - Arlington MA
Assignee:
Polaroid Corporation - Cambridge MA
International Classification:
C07D33500
US Classification:
549 13
Abstract:
Squarylium compounds of the formula: ##STR1## wherein Q. sup. 1 and Q. sup. 2 are each independently a pyrylium, thiopyrylium, selenopyrylium, benzpyrylium, benzthiopyrylium or benzselenopyrylium nucleus, and R. sup. 1 and R. sup. 2 are each independently an aliphatic or cycloaliphatic group, can be prepared by reacting a squaric acid derivative of the formula: ##STR2## with a compound of the formula Q. sup. 2 CH. sub. 2 R. sup. 2 in the presence of a base.

Possible Relatives

Cynthia S Garcia  David Garcia  A Garcia  Cyril A Garcia  Dayna M Garcia  Dayra Y Garcia  Paulina Jones  Paulina W Mcgrath  Paulina H Jordan 

NOTICE: You may not use BackgroundCheck or the information it provides to make decisions about employment, credit, housing or any other purpose that would require Fair Credit Reporting Act (FCRA) compliance. BackgroundCheck is not a Consumer Reporting Agency (CRA) as defined by the FCRA and does not provide consumer reports.