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Peng Bei ZhangStroudsburg, PA

Related to:
Chiyen Chang

Peng Zhang Phones & Addresses

Stroudsburg, PA   

East Stroudsburg, PA   

Dayton, OH   

Columbus, OH   

Monroeton, PA   

Work

Company: New oriental english school - Wuhan China Jun 2011 Position: Teaching assistant (ta)

Education

School / High School: The Ohio State University- Columbus, OH Dec 2013 Specialities: B.S. in Mechanical Engineering

Skills

SolidWorks ; MATLAB/Simulink; LabVIEW; Microsoft Office • BASIC Programming: Machining (Mill • Lathe • Basic hand tools • sheet metal fabrication • CNC operations); bilingual in Chinese and English
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Mentions for Peng Bei Zhang

Peng Zhang resumes & CV records

Resumes

Peng Zhang Photo 35

Peng Zhang - Columbus, OH

Work:
New Oriental English School - Wuhan China Jun 2011 to Aug 2011
Teaching Assistant (TA)
Education:
The Ohio State University - Columbus, OH Dec 2013
B.S. in Mechanical Engineering The Ohio State University - Columbus, OH 2013 to 2013
BS in Catapult Design Project The Ohio State University - Columbus, OH 2013 to 2013
BS in Air Engine Design Project Wuhan University of Technology - Wuhan, CN Jun 2011
B.S. in Automobile Engineering
Skills:
SolidWorks ; MATLAB/Simulink; LabVIEW; Microsoft Office, BASIC Programming: Machining (Mill, Lathe, Basic hand tools, sheet metal fabrication, CNC operations); bilingual in Chinese and English

Publications & IP owners

Us Patents

Cationic-Anionic Blends For Dynamic Surface Tension Reduction

US Patent:
7097705, Aug 29, 2006
Filed:
Mar 29, 2002
Appl. No.:
10/112537
Inventors:
Carrington Duane Smith - Slatington PA, US
Evelyn Jennifer Lin Paulsen - Macungie PA, US
Peng Zhang - Whitehall PA, US
Assignee:
Air Products and Chemicals, Inc. - Allentown PA
International Classification:
C09K 3/00
C09K 101/00
C08K 5/17
C08K 5/3462
C09D 11/10
US Classification:
1062873, 524186, 524236, 523160
Abstract:
This invention provides water-based compositions, particularly coating, ink, adhesive, fountain solution and agricultural compositions, manifesting reduced equilibrium and dynamic surface tension by the incorporation of a surface tension reducing amount of a mixture of a non-fluorinated anionic compound and a non-fluorinated weak base cationic compound, the mixture demonstrating a dynamic surface tension (DST) which is less than the DST of the individual anionic and cationic compounds and less than 45 dynes/cm, at a concentration of ≦5 wt % in water at 23 C. and 20 bubbles/second or less than 40 dynes/cm at a concentration of ≦0. 03M in water at 23 C. and 0. 1 bubbles/second according to the maximum-bubble pressure method.

Hydrogen Sensitive Films And Sensors Produced Therefrom

US Patent:
2019009, Mar 28, 2019
Filed:
Sep 27, 2018
Appl. No.:
16/143992
Inventors:
- Cincinnati OH, US
John A. Lynch - Dayton OH, US
Daniel P. Rose - Cincinnati OH, US
Julia Kuhlmann - Cincinnati OH, US
Daoli Zhao - North Brunswick NJ, US
Peng Zhang - Cincinnati OH, US
Michael E. Smith - Cincinnati OH, US
International Classification:
G01N 21/78
G01N 21/31
G01N 21/89
C08L 27/18
C08K 5/46
C08K 5/357
C08L 5/12
Abstract:
Described are sensors and methods of detecting hydrogen gas. The sensor includes a polymer matrix and a dye molecule in an amount sufficient such that exposure of the polymer matrix to hydrogen gas causes a change in a spectroscopic property of the dye molecule wherein the spectroscopic property includes at least one of color, absorbance, or luminescence. The polymer matrix may further include a catalyst, such as a transition metal, sulfonated Wilkinson's catalyst, colloidal Pt, sulfonated iridium cyclooctadiene triphenylphosphine, sulfonated rhodium cyclooctadiene triphenylphosphine, sulfonated ruthenium triphenylphosphine, or combinations thereof. Embodiments of the sensor may further include a gas permeable, water impermeable membrane, an outer covering, or combinations thereof.

Short Inorganic Trisilylamine-Based Polysilazanes For Thin Film Deposition

US Patent:
2017032, Nov 9, 2017
Filed:
Jul 27, 2017
Appl. No.:
15/661576
Inventors:
- Branchburg NJ, US
- Paris, FR
Reno PESARESI - Easton PA, US
Jean-Marc GIRARD - Versailles, FR
Peng ZHANG - Montvale NJ, US
Manish KHANDELWAL - Somerset NJ, US
International Classification:
H01L 21/02
H01L 21/02
H01L 21/02
H01L 21/02
H01L 21/02
Abstract:
Disclosed are Si—C free and volatile silazane precursors for high purity thin film deposition.

Possible Relatives

David Zhang  Dawei Zhang  Dazhi Zhang  De K Zhang  Da Q Zhang  Dachuan Zhang  Daijun Zhang  Peng Lee  Peng Lin  Peng Liu 

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