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Peter L Filosi, 72West Upton, MA

Peter Filosi Phones & Addresses

Upton, MA   

East Lyme, CT   

24 Chimney Dr, Bethel, CT 06801    203-7436207   

Old Lyme, CT   

24 Chimney Dr, Bethel, CT 06801    203-7881178   

Work

Position: Administration/Managerial

Mentions for Peter L Filosi

Peter Filosi resumes & CV records

Resumes

Peter Filosi Photo 7

Peter Filosi

Location:
Upton, MA
Industry:
Semiconductors
Work:
Keeping Busy
Retired
Asml 2003 - Mar 2018
System Integration - Development and Engineering
Silicon Valley Group Jan 2000 - Dec 2002
Vice President Design Engineering
Silicon Valley Group Dec 1991 - Dec 2000
Senior Director of Software and Technology
Octocom Systems Apr 1991 - Dec 1991
Director
Gdc 1977 - 1991
Director Network Management
Education:
Western Connecticut State University 1970 - 1974
Bachelors, Psychology, Computer Science
Skills:
Integration, Leadership, Software Development, Software Engineering, Engineering Management, R&D, Cross Functional Team Leadership, Team Building, Management, Outsourcing, Networking, Product Management, Architectures, System Architecture, Product Development, Cloud Computing, Embedded Systems, Architecture
Peter Filosi Photo 8

Peter Filosi

Publications & IP owners

Us Patents

Method And Systems For Improving Focus Accuracy In A Lithography System

US Patent:
7053984, May 30, 2006
Filed:
Feb 7, 2005
Appl. No.:
11/050694
Inventors:
Michael L. Nelson - West Redding CT, US
Justin L. Kreuzer - Trumbull CT, US
Peter L. Filosi - Bethel CT, US
Christopher J. Mason - Newtown CT, US
Assignee:
ASML Holding N.V. - Veldhoven
International Classification:
G03B 27/72
G03B 27/42
G03B 27/32
US Classification:
355 55, 355 53, 355 77
Abstract:
A focus system that includes a calibration subsystem and a control subsystem. The control subsystem, which includes a control sensor, is in close proximity to the exposing of an image. The calibration subsystem, which includes a calibration sensor and a control sensor, is located remotely from, or off-axis with respect to, the exposing of an image. By separating calibration and control functions, the functional requirements can be separated into two (or more) types of sensors.

Method And System For Improving Focus Accuracy In A Lithography System

US Patent:
7248336, Jul 24, 2007
Filed:
Apr 24, 2006
Appl. No.:
11/408956
Inventors:
Michael L. Nelson - West Redding CT, US
Justin L. Kreuzer - Trumbull CT, US
Peter L. Filosi - Bethel CT, US
Christopher J. Mason - Newtown CT, US
Assignee:
ASML Holding N.V. - Veldhoven
International Classification:
G03B 27/72
G03B 27/42
G03B 27/32
US Classification:
355 55, 355 53, 355 77
Abstract:
A focus system that includes a calibration subsystem and a control subsystem. The control subsystem, which includes a control sensor, is in close proximity to the exposing of an image. The calibration subsystem, which includes a calibration sensor and a control sensor, is located remotely from, or off-axis with respect to, the exposing of an image. By separating calibration and control functions, the functional requirements can be separated into two (or more) types of sensors.

Method And System For Improving Focus Accuracy In A Lithography System

US Patent:
2002015, Oct 31, 2002
Filed:
Apr 25, 2001
Appl. No.:
09/841187
Inventors:
Michael Nelson - West Redding CT, US
Justin Kreuzer - Trumbull CT, US
Peter Filosi - Bethel CT, US
Christopher Mason - Newtown CT, US
Assignee:
Silicon Valley Group, Inc.
International Classification:
G02B007/04
US Classification:
250/201200
Abstract:
A focus system that includes a calibration subsystem and a control subsystem. The control subsystem, which includes a control sensor, is in close proximity to the exposing of an image. The calibration subsystem, which includes a calibration sensor and a control sensor, is located remotely from, or off-axis with respect to, the exposing of an image. By separating calibration and control functions, the functional requirements can be separated into two (or more) types of sensors.

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