Peter Aaron Heimann, 741 Richmond St, New Brunswick, NJ 08901

2005019, Sep 8, 2005

Jan 14, 2004

10/757297

Jon Barry - Odessa FL, US
Johannes Gutter - Palm Harbor FL, US
Peter Heimann - Clifton NJ, US
John Jensen - Cambridge MA, US
Maria Spieler - Tampa FL, US
Christopher Wu - Tampa FL, US

G06F015/173
G06F015/16

709224000, 709228000

A method and apparatus for providing quality of service (QoS) measurements for remote-access users of a virtual private network (VPN) utilizes hardware/software at the remote VPN client to collect information related to the remote client's ability to connect to the VPN and remain connected. A centralized server is configured to query each remote client and upload the collected connection data, the server functioning to analyze the collected data to determine QoS information in terms of, for example, “VPN accessibility” (defined as success rate for connection to VPN servers), “VPN sustainability” (defined as the ability to maintain a network connection), and “VPN availability” (defined as the ability of a persistent remote-access location to maintain its network connect). The QoS measurements allow the VPN service provider to improve the experience of remote access users, generate alarms and reports, and may also be used to form service level agreements (SLAs) with such users.

4614433, Sep 30, 1986

Jul 9, 1984

6/629056

Martin Feldman - Berkeley Heights NJ
Peter A. Heimann - Clifton NJ
William A. Johnson - Fanwood NJ
Theodore F. Retajczyk - Clinton NJ
Donald L. White - Bernardsville NJ

AT&T Bell Laboratories - Murray Hill NJ

G01B 1127

356401

Mask-to-wafer alignment in X-ray lithography is advantageously carried out utilizing zone plate marks formed on the mask and wafer. In practice, it has been observed that the intensity and in some cases even the location of the centroid of the light spot formed by a zone plate mask can vary during alignment as the mask-to-wafer spacing is changed. The present invention is based on the discovery and analysis of the causes of such variations. Based thereon, applicants have devised a modified mask structure which, when used with a wafer in a zone plate alignment system, enables mask-to-wafer alignment to be made more easily and more reliably than was possible heretofore. The modified mask structure includes a localized blocking layer over each zone plate on the mask. This layer allows only a negligible portion of the light employed to illuminate the zone plates on the mask to propagate into the mask-to-wafer space. Also, the modified mask structure includes an antireflection layer that reduces interference effects between light spots imaged by the wafer zone plates and light reflected from the mask.

4680084, Jul 14, 1987

Aug 21, 1984

6/642931

Peter A. Heimann - Clifton NJ
Joseph M. Moran - Berkeley Heights NJ
Ronald J. Schutz - Warren NJ

American Telephone and Telegraph Company, AT&T Bell Laboratories - Murray Hill NJ

H01L 21306
B44C 122
C03C 1500
C03C 2506

156626

The invention involves new etch monitoring and thickness measurement techniques which are more accurate than previous techniques. In accordance with the invention, the etch depth of a substrate region undergoing etching is monitored, or the thickness of the region is measured, by impinging the region with light and detecting the intensity of the reflected light. In contrast to the previous techniques, the incident light is chosen so that a substrate region underlying, and/or a patterned substrate region overlying the substrate region of interest is substantially opaque to the incident light, which precludes the formation of signals unrelated to etch depth or thickness.